loadpatents
name:-0.013228178024292
name:-0.01452898979187
name:-0.0068840980529785
Raghunathan; Sudharshanan Patent Filings

Raghunathan; Sudharshanan

Patent Applications and Registrations

Patent applications and USPTO patent grants for Raghunathan; Sudharshanan.The latest application filed is for "lithographic method".

Company Profile
6.13.13
  • Raghunathan; Sudharshanan - Fremont CA
  • Raghunathan; Sudharshanan - Mechanicville NY
  • Raghunathan; Sudharshanan - Santa Clara CA
  • Raghunathan; Sudharshanan - Guilderland NY
  • Raghunathan; Sudharshanan - Mechanicsville NY
  • Raghunathan; Sudharshanan - Albany NY US
*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.
Patent Activity
PatentDate
Lithographic method
Grant 10,962,887 - Tinnemans , et al. March 30, 2
2021-03-30
Lithographic Method
App 20200081356 - TINNEMANS; Patricius Aloysius Jacobus ;   et al.
2020-03-12
Methods, apparatus and system for a passthrough-based architecture
Grant 10,559,503 - Bouche , et al. Feb
2020-02-11
Lithographic method
Grant 10,527,958 - Tinnemans , et al. J
2020-01-07
Lithographic Method
App 20190094721 - TINNEMANS; Patricius Aloysius Jacobus ;   et al.
2019-03-28
Method, apparatus and system for a high density middle of line flow
Grant 10,236,350 - Bouche , et al.
2019-03-19
Methods, Apparatus And System For A Passthrough-based Architecture
App 20180033701 - Bouche; Guillaume ;   et al.
2018-02-01
Cut first alternative for 2D self-aligned via
Grant 9,852,984 - Bouche , et al. December 26, 2
2017-12-26
Methods, apparatus and system for a passthrough-based architecture
Grant 9,818,651 - Bouche , et al. November 14, 2
2017-11-14
Method, Apparatus And System For A High Density Middle Of Line Flow
App 20170263715 - Bouche; Guillaume ;   et al.
2017-09-14
Methods, Apparatus And System For A Passthrough-based Architecture
App 20170263506 - Bouche; Guillaume ;   et al.
2017-09-14
2d Self-aligned Via First Process Flow
App 20160329278 - BOUCHE; Guillaume ;   et al.
2016-11-10
Cut First Alternative For 2d Self-aligned Via
App 20160322298 - BOUCHE; Guillaume ;   et al.
2016-11-03
Multilayer pattern transfer for chemical guides
Grant 9,478,506 - Farrell , et al. October 25, 2
2016-10-25
Cut first alternative for 2D self-aligned via
Grant 9,425,097 - Bouche , et al. August 23, 2
2016-08-23
2D self-aligned via first process flow
Grant 9,362,165 - Bouche , et al. June 7, 2
2016-06-07
Methods And Controllers For Controlling Focus Of Ultraviolet Light From A Lithographic Imaging System, And Apparatuses For Forming An Integrated Circuit Employing The Same
App 20160033879 - Raghunathan; Sudharshanan ;   et al.
2016-02-04
Methods for fabricating integrated circuits including multi-patterning of masks for extreme ultraviolet lithography
Grant 8,956,789 - Raghunathan February 17, 2
2015-02-17
Methods for fabricating EUV masks and methods for fabricating integrated circuits using such EUV masks
Grant 8,911,920 - Raghunathan , et al. December 16, 2
2014-12-16
Methods For Fabricating Euv Masks And Methods For Fabricating Integrated Circuits Using Such Euv Masks
App 20140272677 - Raghunathan; Sudharshanan ;   et al.
2014-09-18
Methods For Fabricating Integrated Circuits Including Multi-patterning Of Masks For Extreme Ultraviolet Lithography
App 20140273306 - Raghunathan; Sudharshanan
2014-09-18
Multilayer Pattern Transfer For Chemical Guides
App 20140252660 - Farrell; Richard A. ;   et al.
2014-09-11
Sidewall image transfer process with multiple critical dimensions
Grant 8,673,165 - Raghunathan , et al. March 18, 2
2014-03-18
Sidewall Image Transfer Process With Multiple Critical Dimensions
App 20130089984 - Raghunathan; Sudharshanan ;   et al.
2013-04-11

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