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Patent applications and USPTO patent grants for Rabello; Silvio J..The latest application filed is for "dark field diffraction based overlay".
Patent | Date |
---|---|
Diffraction based overlay linearity testing Grant 9,239,523 - Li , et al. January 19, 2 | 2016-01-19 |
Dark field diffraction based overlay Grant 8,817,273 - Jeong , et al. August 26, 2 | 2014-08-26 |
Dark Field Diffraction Based Overlay App 20130278942 - Jeong; Hwan J. ;   et al. | 2013-10-24 |
Scatterometry measurement of asymmetric structures Grant 8,525,993 - Rabello , et al. September 3, 2 | 2013-09-03 |
Simulating two-dimensional periodic patterns using compressed fourier space Grant 8,170,838 - Rabello , et al. May 1, 2 | 2012-05-01 |
Diffraction Based Overlay Linearity Testing App 20110238365 - Li; Jie ;   et al. | 2011-09-29 |
Scatterometry Measurement of Asymmetric Structures App 20110080585 - Rabello; Silvio J. ;   et al. | 2011-04-07 |
Simulating Two-Dimensional Periodic Patterns Using Compressed Fourier Space App 20100274521 - Rabello; Silvio J. ;   et al. | 2010-10-28 |
Imaging Diffraction Based Overlay App 20090296075 - Hu; Jiangtao ;   et al. | 2009-12-03 |
Local process variation correction for overlay measurement Grant 7,508,976 - Yang , et al. March 24, 2 | 2009-03-24 |
Measuring an alignment target with a single polarization state Grant 6,992,764 - Yang , et al. January 31, 2 | 2006-01-31 |
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