Quevedo-Lopez; Manuel A.

Patent Applications and Registrations

Patent applications and USPTO patent grants for Quevedo-Lopez; Manuel A..The latest application filed is for "integration of high-k metal-gate stack into direct silicon bonding (dsb) hybrid orientation technology (hot) pmos process flow".

Company Profile

0.4.5

Quevedo-Lopez; Manuel A. - Richardson TX
Quevedo-Lopez; Manuel A. - Plano TX
Quevedo-Lopez; Manuel A. - Denton TX

*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.

Patent Activity

Patent	Date
Integration of high-k metal gate stack into direct silicon bonding (DSB) hybrid orientation technology (HOT) pMOS process flow Grant 7,943,479 - Pinto , et al. May 17, 2	2011-05-17
Integration Of High-k Metal-gate Stack Into Direct Silicon Bonding (dsb) Hybrid Orientation Technology (hot) Pmos Process Flow App 20100047993 - Pinto; Angelo ; et al.	2010-02-25
Methods and systems to mitigate etch stop clipping for shallow trench isolation fabrication Grant 7,625,807 - Quevedo-Lopez , et al. December 1, 2	2009-12-01
Method to test shallow trench isolation fill capability App 20060284173 - Quevedo-Lopez; Manuel A. ; et al.	2006-12-21
Top surface roughness reduction of high-k dielectric materials using plasma based processes Grant 7,115,530 - Quevedo-Lopez , et al. October 3, 2	2006-10-03
Top surface roughness reduction of high-k dielectric materials using plasma based processes App 20060121744 - Quevedo-Lopez; Manuel A. ; et al.	2006-06-08
Method for removing contaminants on a substrate Grant 6,933,235 - Quevedo-Lopez , et al. August 23, 2	2005-08-23
Top surface roughness reduction of high-k dielectric materials using plasma based processes App 20050124109 - Quevedo-Lopez, Manuel A. ; et al.	2005-06-09
Method for removing contaminants on a substrate App 20040102009 - Quevedo-Lopez, Manuel A. ; et al.	2004-05-27

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