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name:-0.026034116744995
name:-0.014365911483765
name:-0.0053210258483887
QIU; Huatan Patent Filings

QIU; Huatan

Patent Applications and Registrations

Patent applications and USPTO patent grants for QIU; Huatan.The latest application filed is for "ex situ coating of chamber components for semiconductor processing".

Company Profile
4.16.22
  • QIU; Huatan - Portland OR
  • Qiu; Huatan - Lake Oswego OR
  • Qiu; Huatan - Sunnyvale CA US
  • Qiu; Huatan - San Jose CA
  • Qiu; Huatan - Dublin CA
  • Qiu; Huatan - Urbana IL
*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.
Patent Activity
PatentDate
Ex Situ Coating Of Chamber Components For Semiconductor Processing
App 20220275504 - SHANBHAG; Damodar Rajaram ;   et al.
2022-09-01
Ex situ coating of chamber components for semiconductor processing
Grant 11,365,479 - Shanbhag , et al. June 21, 2
2022-06-21
Minimizing Radical Recombination Using Ald Silicon Oxide Surface Coating With Intermittent Restoration Plasma
App 20220145459 - VARADARAJAN; Bhadri N. ;   et al.
2022-05-12
Method Of Depositing Silicon Nitride Films
App 20210384028 - SIMS; James S. ;   et al.
2021-12-09
Integrated Showerhead With Thermal Control For Delivering Radical And Precursor Gas To A Downstream Chamber To Enable Remote Plasma Film Deposition
App 20210371982 - BATZER; Rachel ;   et al.
2021-12-02
Integrated showerhead with thermal control for delivering radical and precursor gas to a downstream chamber to enable remote plasma film deposition
Grant 11,101,164 - Batzer , et al. August 24, 2
2021-08-24
Radio Frequency (rf) Signal Source Supplying Rf Plasma Generator And Remote Plasma Generator
App 20210257188 - JUCO; Eller Y. ;   et al.
2021-08-19
Temperature controlled spacer for use in a substrate processing chamber
Grant 11,004,662 - Tan , et al. May 11, 2
2021-05-11
Ex Situ Coating Of Chamber Components For Semiconductor Processing
App 20200347497 - Shanbhag; Damodar ;   et al.
2020-11-05
Ex situ coating of chamber components for semiconductor processing
Grant 10,760,158 - Shanbhag , et al. Sep
2020-09-01
Integrated showerhead with thermal control for delivering radical and precursor gas to a downstream chamber to enable remote plasma film deposition
Grant 10,604,841 - Batzer , et al.
2020-03-31
Ex Situ Coating Of Chamber Components For Semiconductor Processing
App 20190185999 - Shanbhag; Damodar ;   et al.
2019-06-20
Wafer Level Uniformity Control In Remote Plasma Film Deposition
App 20180251893 - Hohn; Geoffrey ;   et al.
2018-09-06
Temperature Controlled Spacer For Use In A Substrate Processing Chamber
App 20180233326 - Tan; Taide ;   et al.
2018-08-16
Integrated Showerhead With Thermal Control For Delivering Radical And Precursor Gas To A Downstream Chamber To Enable Remote Plasma Film Deposition
App 20180163305 - Batzer; Rachel ;   et al.
2018-06-14
Minimizing Radical Recombination Using Ald Silicon Oxide Surface Coating With Intermittent Restoration Plasma
App 20180044791 - Varadarajan; Bhadri N. ;   et al.
2018-02-15
Minimizing radical recombination using ALD silicon oxide surface coating with intermittent restoration plasma
Grant 9,828,672 - Varadarajan , et al. November 28, 2
2017-11-28
Plasma generator systems and methods of forming plasma
Grant 9,591,738 - Qiu , et al. March 7, 2
2017-03-07
Minimizing Radical Recombination Using Ald Silicon Oxide Surface Coating With Intermittent Restoration Plasma
App 20160281230 - Varadarajan; Bhadri N. ;   et al.
2016-09-29
Gas flow distribution receptacles, plasma generator systems, and methods for performing plasma stripping processes
Grant 9,209,000 - Qiu , et al. December 8, 2
2015-12-08
Continuous plasma and RF bias to regulate damage in a substrate processing system
Grant 9,194,045 - Wu , et al. November 24, 2
2015-11-24
Plasma Process Etch-to-deposition Ratio Modulation Via Ground Surface Design
App 20140127912 - Wu; Liqi ;   et al.
2014-05-08
Continuous Plasma And Rf Bias To Regulate Damage In A Substrate Processing System
App 20130260057 - Wu; Liqi ;   et al.
2013-10-03
High density plasma etchback process for advanced metallization applications
Grant 8,431,033 - Zhou , et al. April 30, 2
2013-04-30
Ashing method
Grant 8,273,259 - Qiu , et al. September 25, 2
2012-09-25
Creation Of Magnetic Field (vector Potential) Well For Improved Plasma Deposition And Resputtering Uniformity
App 20120228125 - Wu; Liqi ;   et al.
2012-09-13
High Density Plasma Etchback Process For Advanced Metallization Applications
App 20120152896 - Zhou; Chunming ;   et al.
2012-06-21
Gas Flow Distribution Receptacles, Plasma Generator Systems, And Methods For Performing Plasma Stripping Processes
App 20120097331 - Qiu; Huatan ;   et al.
2012-04-26
Creation Of Magnetic Field (vector Potential) Well For Improved Plasma Deposition And Resputtering Uniformity
App 20120070589 - Wu; Liqi ;   et al.
2012-03-22
Gas flow distribution receptacles, plasma generator systems, and methods for performing plasma stripping processes
Grant 8,110,068 - Qiu , et al. February 7, 2
2012-02-07
Plasma Generator Systems And Methods Of Forming Plasma
App 20090250334 - Qiu; Huatan ;   et al.
2009-10-08
Gas Flow Distribution Receptacles, Plasma Generator Systems, And Methods For Performing Plasma Stripping Processes
App 20090236313 - QIU; Huatan ;   et al.
2009-09-24
Submicron particle removal
Grant 7,528,386 - Ruzic , et al. May 5, 2
2009-05-05
Submicron particle removal
App 20060237667 - Ruzic; David N. ;   et al.
2006-10-26

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