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name:-0.010463953018188
name:-0.0081160068511963
name:-0.1173779964447
Qi; Zhengqing John Patent Filings

Qi; Zhengqing John

Patent Applications and Registrations

Patent applications and USPTO patent grants for Qi; Zhengqing John.The latest application filed is for "scalable, printable, patterned sheet of high mobility graphene on flexible substrates".

Company Profile
3.5.8
  • Qi; Zhengqing John - Albany NY
  • Qi; Zhengqing John - Essex VT
*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.
Patent Activity
PatentDate
Scalable, Printable, Patterned Sheet Of High Mobility Graphene On Flexible Substrates
App 20220078908 - Johnson, Jr.; Alan T ;   et al.
2022-03-10
Scalable, Printable, Patterned Sheet Of High Mobility Graphene On Flexible Substrates
App 20200170108 - Johnson, JR.; Alan T. ;   et al.
2020-05-28
Dummy assist features for pattern support
Grant 10,332,745 - Sun , et al.
2019-06-25
Scalable, Printable, Patterned Sheet Of High Mobility Graphene On Flexible Substrates
App 20190116666 - Johnson, JR.; Alan T. ;   et al.
2019-04-18
Scalable, printable, patterned sheet of high mobility graphene on flexible substrates
Grant 10,165,679 - Johnson, Jr. , et al. Dec
2018-12-25
Dummy Assist Features For Pattern Support
App 20180337045 - Sun; Lei ;   et al.
2018-11-22
Scalable, Printable, Patterned Sheet of High Mobility Graphene On Flexible Substrates
App 20180160530 - JOHNSON, JR.; Alan T. ;   et al.
2018-06-07
Extreme ultraviolet lithography photomasks
Grant 9,946,152 - Qi , et al. April 17, 2
2018-04-17
Scalable, printable, patterned sheet of high mobility graphene on flexible substrates
Grant 9,930,777 - Johnson , et al. March 27, 2
2018-03-27
Extreme Ultraviolet Lithography Photomasks
App 20170315438 - Qi; Zhengqing John ;   et al.
2017-11-02
Photomask structure with an etch stop layer that enables repairs of detected defects therein and extreme ultraviolet(EUV) photolithograpy methods using the photomask structure
Grant 9,791,771 - Qi , et al. October 17, 2
2017-10-17
A Photomask Structure With An Etch Stop Layer That Enables Repairs Of Drtected Defects Therein And Extreme Ultraviolet(euv) Photolithograpy Methods Using The Photomask Structure
App 20170235217 - Qi; Zhengqing John ;   et al.
2017-08-17
Scalable, Printable, Patterned Sheet Of High Mobility Graphene On Flexible Substrates
App 20170048975 - JOHNSON; Alan T. ;   et al.
2017-02-16

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