loadpatents
name:-0.010676860809326
name:-0.006627082824707
name:-0.0038871765136719
Przybylski; Peter Patent Filings

Przybylski; Peter

Patent Applications and Registrations

Patent applications and USPTO patent grants for Przybylski; Peter.The latest application filed is for "composition for post chemical-mechanical-polishing cleaning".

Company Profile
4.5.8
  • Przybylski; Peter - Ludwigshafen DE
*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.
Patent Activity
PatentDate
Composition for post chemical-mechanical-polishing cleaning
Grant 10,865,361 - Daeschlein , et al. December 15, 2
2020-12-15
Composition for post chemical-mechanical-polishing cleaning
Grant 10,844,325 - Daeschlein , et al. November 24, 2
2020-11-24
Composition For Post Chemical-mechanical-polishing Cleaning
App 20190144781 - DAESCHLEIN; Christian ;   et al.
2019-05-16
Composition For Post Chemical-mechanical-polishing Cleaning
App 20180371371 - DAESCHLEIN; Christian ;   et al.
2018-12-27
Chemical-mechanical polishing compositions comprising polyethylene imine
Grant 9,862,862 - Lan , et al. January 9, 2
2018-01-09
Chemical-mechanical polishing compositions comprising N,N,N',N'-tetrakis-(2-hydroxypropyl)-ethylenediamine or methanesulfonic acid
Grant 9,828,527 - Lan , et al. November 28, 2
2017-11-28
Use of a chemical-mechanical polishing (CMP) composition for polishing a substrate or layer containing at least one III-V material
Grant 9,765,239 - Lan , et al. September 19, 2
2017-09-19
Chemical-mechanical Polishing Compositions Comprising N,n,n',n'-tetrakis-(2-hydroxypropyl)-ethylenediamine Or Methanesulfonic Acid
App 20170044402 - Lan; Yongqing ;   et al.
2017-02-16
Use Of A Chemical-mechanical Polishing (cmp) Composition For Polishing A Substrate Or Layer Containing At Least One Iii-v Material
App 20160096979 - LAN; Yongqing ;   et al.
2016-04-07
Chemical-mechanical Polishing Compositions Comprising Polyethylene Imine
App 20160068712 - LAN; Yongqing ;   et al.
2016-03-10
Chemical-mechanical Polishing Compositions Comprising N,n,n',n'-tetrakis-(2-hydroxypropyl)-ethylenediamine Or Methanesulfonic Acid
App 20160009955 - LAN; Yongqing ;   et al.
2016-01-14
Chemical-mechanical Polishing Compositions Comprising One Or More Polymers Selected From The Group Consisting Of N-vinyl-homopolymers And N-vinyl Copolymers
App 20150380263 - LAN; Yongqing ;   et al.
2015-12-31
Composite Materials For Lithium-sulfur Batteries
App 20140050992 - PANCHENKO; Alexander ;   et al.
2014-02-20

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