| Patent | Date |
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Use of a chemical mechanical polishing (CMP) composition for polishing of cobalt and / or cobalt alloy comprising substrates
Grant 11,286,402 - Reichardt , et al. March 29, 2 | 2022-03-29 |
Chemical Mechanical Polishing Of Substrates Containing Copper And Ruthenium
App 20220064485 - GUEVENC; Haci Osman ; et al. | 2022-03-03 |
Use of a chemical mechanical polishing (CMP) composition for polishing of cobalt and / or cobalt alloy comprising substrates
Grant 11,264,250 - Reichardt , et al. March 1, 2 | 2022-03-01 |
Chemical Mechanical Polishing Of Substrates Containing Copper And Ruthenium
App 20220056307 - GUEVENC; Haci Osman ; et al. | 2022-02-24 |
Chemical Mechanical Polishing Of Substrates Containing Copper And Ruthenium
App 20220049125 - GUEVENC; Haci Osman ; et al. | 2022-02-17 |
Use Of A Chemical Mechanical Polishing (cmp) Composition For Polishing Of Cobalt Comprising Substrates
App 20210102093 - REICHARDT; Robert ; et al. | 2021-04-08 |
Use of a chemical mechanical polishing (CMP) composition for polishing of cobalt comprising substrates
Grant 10,899,945 - Reichardt , et al. January 26, 2 | 2021-01-26 |
Composition for post chemical-mechanical-polishing cleaning
Grant 10,865,361 - Daeschlein , et al. December 15, 2 | 2020-12-15 |
Composition for post chemical-mechanical-polishing cleaning
Grant 10,844,325 - Daeschlein , et al. November 24, 2 | 2020-11-24 |
Composition for post chemical-mechanical-polishing cleaning
Grant 10,844,333 - Daeschlein , et al. November 24, 2 | 2020-11-24 |
Chemical Mechanical Polishing Composition
App 20200299547 - DAESCHLEIN; Christian ; et al. | 2020-09-24 |
Use Of A Chemical Mechanical Polishing (cmp) Composition For Polishing Of Cobalt And / Or Cobalt Alloy Comprising Substrates
App 20200294813 - REICHARDT; Robert ; et al. | 2020-09-17 |
Use of a chemical mechanical polishing (CMP) composition for polishing of cobalt and / or cobalt alloy comprising substrates
Grant 10,738,219 - Reichardt , et al. A | 2020-08-11 |
Chemical mechanical polishing (CMP) composition
Grant 10,570,316 - Reichardt , et al. Feb | 2020-02-25 |
Use of a chemical mechanical polishing (CMP) composition for polishing of cobalt and / or cobalt alloy comprising substrates
Grant 10,385,236 - Reichardt , et al. A | 2019-08-20 |
Composition For Post Chemical-mechanical-polishing Cleaning
App 20190144781 - DAESCHLEIN; Christian ; et al. | 2019-05-16 |
Composition For Post Chemical-mechanical-polishing Cleaning
App 20190002802 - DAESCHLEIN; Christian ; et al. | 2019-01-03 |
Composition For Post Chemical-mechanical-polishing Cleaning
App 20180371371 - DAESCHLEIN; Christian ; et al. | 2018-12-27 |
Use Of A Chemical Mechanical Polishing (cmp) Composition For Polishing Of Cobalt Comprising Substrates
App 20180230333 - REICHARDT; Robert ; et al. | 2018-08-16 |
Use Of A Chemical Mechanical Polishing (cmp) Composition For Polishing Of Cobalt And / Or Cobalt Alloy Comprising Substrates
App 20180016468 - REICHARDT; Robert ; et al. | 2018-01-18 |
Chemical-mechanical polishing compositions comprising polyethylene imine
Grant 9,862,862 - Lan , et al. January 9, 2 | 2018-01-09 |
Use Of A Chemical Mechanical Polishing (cmp) Composition For Polishing Of Cobalt And / Or Cobalt Alloy Comprising Substrates
App 20170369741 - REICHARDT; Robert ; et al. | 2017-12-28 |
Use Of A Chemical Mechanical Polishing (cmp) Composition For Polishing Of Cobalt And / Or Cobalt Alloy Comprising Substrates
App 20170362464 - REICHARDT; Robert ; et al. | 2017-12-21 |
Chemical-mechanical polishing compositions comprising N,N,N',N'-tetrakis-(2-hydroxypropyl)-ethylenediamine or methanesulfonic acid
Grant 9,828,527 - Lan , et al. November 28, 2 | 2017-11-28 |
Use of a chemical-mechanical polishing (CMP) composition for polishing a substrate or layer containing at least one III-V material
Grant 9,765,239 - Lan , et al. September 19, 2 | 2017-09-19 |
Chemical Mechanical Polishing (cmp) Composition
App 20170158913 - REICHARDT; Robert ; et al. | 2017-06-08 |
Chemical-mechanical Polishing Compositions Comprising N,n,n',n'-tetrakis-(2-hydroxypropyl)-ethylenediamine Or Methanesulfonic Acid
App 20170044402 - Lan; Yongqing ; et al. | 2017-02-16 |
Use Of A Chemical-mechanical Polishing (cmp) Composition For Polishing A Substrate Or Layer Containing At Least One Iii-v Material
App 20160096979 - LAN; Yongqing ; et al. | 2016-04-07 |
Chemical-mechanical Polishing Compositions Comprising Polyethylene Imine
App 20160068712 - LAN; Yongqing ; et al. | 2016-03-10 |
Chemical-mechanical Polishing Compositions Comprising N,n,n',n'-tetrakis-(2-hydroxypropyl)-ethylenediamine Or Methanesulfonic Acid
App 20160009955 - LAN; Yongqing ; et al. | 2016-01-14 |
Chemical-mechanical Polishing Compositions Comprising One Or More Polymers Selected From The Group Consisting Of N-vinyl-homopolymers And N-vinyl Copolymers
App 20150380263 - LAN; Yongqing ; et al. | 2015-12-31 |
Aqueous acidic etching solution and method for texturing the surface of single crystal and polycrystal silicon substrates
Grant 8,969,276 - Braun , et al. March 3, 2 | 2015-03-03 |
Aqueous Acidic Etching Solution And Method For Texturing The Surface Of Single Crystal And Polycrystal Silicon Substrates
App 20120160320 - Braun; Simon ; et al. | 2012-06-28 |
Method for producing nanoparticulate solid materials
Grant 8,119,097 - Kleine Jager , et al. February 21, 2 | 2012-02-21 |
Process For Preparing Lithium Vanadium Oxides And Their Use As Cathode Material
App 20110084238 - Hibst; Hartmut ; et al. | 2011-04-14 |
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