Preil; Moshe Patent Filings

Patent	Date
Wafer Distortion Measurement And Overlay Correction App 20200018709 - Hosler; Erik R. ; et al.	2020-01-16
System, method and computer program product for systematic and stochastic characterization of pattern defects identified from a semiconductor wafer Grant 10,262,408 - Park , et al.	2019-04-16
System, Method And Computer Program Product For Systematic And Stochastic Characterization Of Pattern Defects Identified From A Semiconductor Wafer App 20180300870 - Park; Allen ; et al.	2018-10-18
Methods for fabricating integrated circuits using directed self-assembly including a substantially periodic array of topographical features that includes etch resistant topographical features for transferability control Grant 9,530,662 - Latypov , et al. December 27, 2	2016-12-27
Methods For Fabricating Integrated Circuits Using Directed Self-assembly Including A Substantially Periodic Array Of Topographical Features That Includes Etch Resistant Topographical Features For Transferability Control App 20160247686 - Latypov; Azat ; et al.	2016-08-25
Co-optimization Of Scatterometry Mark Design And Process Monitor Mark Design App 20130325395 - Zhou; Wenzhan ; et al.	2013-12-05
Overlay metrology and control method Grant 7,804,994 - Adel , et al. September 28, 2	2010-09-28
Apparatus and methods for optically monitoring the fidelity of patterns produced by photolitographic tools Grant 7,557,921 - Adel , et al. July 7, 2	2009-07-07
Overlay metrology and control method App 20030223630 - Adel, Michael ; et al.	2003-12-04

Patent

Date

Wafer Distortion Measurement And Overlay Correction
App 20200018709 - Hosler; Erik R. ; et al.

2020-01-16

System, method and computer program product for systematic and stochastic characterization of pattern defects identified from a semiconductor wafer
Grant 10,262,408 - Park , et al.

2019-04-16

System, Method And Computer Program Product For Systematic And Stochastic Characterization Of Pattern Defects Identified From A Semiconductor Wafer
App 20180300870 - Park; Allen ; et al.

2018-10-18

Methods for fabricating integrated circuits using directed self-assembly including a substantially periodic array of topographical features that includes etch resistant topographical features for transferability control
Grant 9,530,662 - Latypov , et al. December 27, 2

2016-12-27

Methods For Fabricating Integrated Circuits Using Directed Self-assembly Including A Substantially Periodic Array Of Topographical Features That Includes Etch Resistant Topographical Features For Transferability Control
App 20160247686 - Latypov; Azat ; et al.

2016-08-25

Co-optimization Of Scatterometry Mark Design And Process Monitor Mark Design
App 20130325395 - Zhou; Wenzhan ; et al.

2013-12-05

Overlay metrology and control method
Grant 7,804,994 - Adel , et al. September 28, 2

2010-09-28

Apparatus and methods for optically monitoring the fidelity of patterns produced by photolitographic tools
Grant 7,557,921 - Adel , et al. July 7, 2

2009-07-07

Overlay metrology and control method
App 20030223630 - Adel, Michael ; et al.

2003-12-04

uspto.report is an independent third-party trademark research tool that is not affiliated, endorsed, or sponsored by the United States Patent and Trademark Office (USPTO) or any other governmental organization. The information provided by uspto.report is based on publicly available data at the time of writing and is intended for informational purposes only.

While we strive to provide accurate and up-to-date information, we do not guarantee the accuracy, completeness, reliability, or suitability of the information displayed on this site. The use of this site is at your own risk. Any reliance you place on such information is therefore strictly at your own risk.

All official trademark data, including owner information, should be verified by visiting the official USPTO website at www.uspto.gov. This site is not intended to replace professional legal advice and should not be used as a substitute for consulting with a legal professional who is knowledgeable about trademark law.

Preil; Moshe

Patent Applications and Registrations