loadpatents
name:-0.017057180404663
name:-0.01288890838623
name:-0.012408971786499
Prasad; Rajesh Patent Filings

Prasad; Rajesh

Patent Applications and Registrations

Patent applications and USPTO patent grants for Prasad; Rajesh.The latest application filed is for "sequential plasma and thermal treatment".

Company Profile
13.12.14
  • Prasad; Rajesh - Lexington MA
  • Prasad; Rajesh - Gloucester MA
  • Prasad; Rajesh - Sacramento CA
*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.
Patent Activity
PatentDate
Sequential Plasma And Thermal Treatment
App 20220262619 - Li; Ning ;   et al.
2022-08-18
Method Of Forming A 2-dimensional Channel Material Using Ion Implantation
App 20220108886 - Wong; Keith T. ;   et al.
2022-04-07
System And Technique For Profile Modulation Using High Tilt Angles
App 20220076915 - Chavva; Venkataramana R. ;   et al.
2022-03-10
Techniques for reducing tip to tip shorting and critical dimension variation during nanoscale patterning
Grant 11,114,299 - Zhang , et al. September 7, 2
2021-09-07
Techniques For Reducing Tip To Tip Shorting And Critical Dimension Variation During Nanoscale Patterning
App 20210005445 - Zhang; Qintao ;   et al.
2021-01-07
Highly Etch Selective Amorphous Carbon Film
App 20200357640 - PRASAD; Rajesh ;   et al.
2020-11-12
Techniques for forming low stress etch-resistant mask using implantation
Grant 10,811,257 - Prasad , et al. October 20, 2
2020-10-20
Techniques for forming dual epitaxial source/drain semiconductor device
Grant 10,804,156 - Sung , et al. October 13, 2
2020-10-13
Highly etch selective amorphous carbon film
Grant 10,727,059 - Bobek , et al.
2020-07-28
Techniques and structure for forming dynamic random-access device using angled ions
Grant 10,629,437 - Varghese , et al.
2020-04-21
Techniques For Forming Dual Epitaxial Source/drain Semiconductor Device
App 20190393094 - Sung; Min Gyu ;   et al.
2019-12-26
Techniques for forming low stress mask using implantation
Grant 10,515,802 - Prasad , et al. Dec
2019-12-24
Techniques And Structure For Forming Dynamic Random-access Device Using Angled Ions
App 20190348287 - Varghese; Sony ;   et al.
2019-11-14
Techniques For Forming Low Stress Mask Using Implantation
App 20190326116 - Prasad; Rajesh ;   et al.
2019-10-24
Techniques For Forming Low Stress Etch-resistant Mask Using Implantation
App 20190304783 - Prasad; Rajesh ;   et al.
2019-10-03
Techniques for improved spacer in nanosheet device
Grant 10,403,738 - Sung , et al. Sep
2019-09-03
Techniques for improved removal of sacrificial mask
Grant 10,354,875 - Prasad , et al. July 16, 2
2019-07-16
Techniques For Improved Removal Of Sacrificial Mask
App 20190214255 - Prasad; Rajesh ;   et al.
2019-07-11
Etch rate modulation through ion implantation
Grant 10,332,748 - Prasad , et al.
2019-06-25
Highly Etch Selective Amorphous Carbon Film
App 20190172714 - BOBEK; Sarah ;   et al.
2019-06-06
Etch Rate Modulation Through Ion Implantation
App 20180182636 - Prasad; Rajesh ;   et al.
2018-06-28
Etch rate modulation through ion implantation
Grant 9,934,982 - Prasad , et al. April 3, 2
2018-04-03
Etch Rate Modulation Through Ion Implantation
App 20170178914 - Prasad; Rajesh ;   et al.
2017-06-22
Method of doping a polycrystalline transistor channel for vertical NAND devices
Grant 9,018,064 - Waite , et al. April 28, 2
2015-04-28
Method Of Doping A Polycrystalline Transistor Channel For Vertical NAND Devices
App 20150017772 - Waite; Andrew M. ;   et al.
2015-01-15
Adjustable door barricade
Grant D453,470 - Prasad February 12, 2
2002-02-12

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