Prasad; Abaneshwar
Patent Applications and Registrations
Patent applications and USPTO patent grants for Prasad; Abaneshwar.The latest application filed is for "cellulose fiber polymer composites with high fiber dispersion and related methods of making".
Company Profile
1.20.31
- Prasad; Abaneshwar - Des Moines WA
- PRASAD; Abaneshwar - Naperville IL
- Prasad; Abaneshwar - Aurora IL US
- Prasad, Abaneshwar - US
Patent Activity
| Patent | Date |
|---|---|
| Cellulose Fiber Polymer Composites With High Fiber Dispersion And Related Methods Of Making App 20210024731 - Prasad; Abaneshwar ; et al. | 2021-01-28 |
| Cmp Polishing Pad With Columnar Structure And Methods Related Thereto App 20170036320 - PRASAD; Abaneshwar | 2017-02-09 |
| Polishing pad with light-stable light-transmitting region Grant 9,156,125 - Prasad October 13, 2 | 2015-10-13 |
| Polishing Pad With Light-stable Light-transmitting Region App 20130273813 - Prasad; Abaneshwar | 2013-10-17 |
| Polishing Pad Comprising Transmissive Region App 20130237136 - Newell; Kelly ; et al. | 2013-09-12 |
| Polishing pad with microporous regions Grant 8,075,372 - Prasad December 13, 2 | 2011-12-13 |
| CMP porous pad with component-filled pores Grant 7,699,684 - Prasad April 20, 2 | 2010-04-20 |
| Method of preparing a conductive film Grant 7,686,994 - Prasad , et al. March 30, 2 | 2010-03-30 |
| Stacked Polishing Pad For High Temperature Applications App 20080274674 - Prasad; Abaneshwar ; et al. | 2008-11-06 |
| Transparent microporous materials for CMP Grant 7,435,165 - Prasad October 14, 2 | 2008-10-14 |
| Multi-layer polishing pad material for CMP Grant 7,435,161 - Prasad , et al. October 14, 2 | 2008-10-14 |
| Method for manufacturing microporous CMP materials having controlled pore size App 20080057845 - Prasad; Abaneshwar | 2008-03-06 |
| Method for manufacturing microporous CMP materials having controlled pore size Grant 7,311,862 - Prasad December 25, 2 | 2007-12-25 |
| Transparent microporous materials for CMP Grant 7,267,607 - Prasad September 11, 2 | 2007-09-11 |
| Polishing pad comprising biodegradable polymer Grant 7,264,641 - Prasad September 4, 2 | 2007-09-04 |
| CMP Porous Pad with Component-Filled Pores App 20070180778 - Prasad; Abaneshwar | 2007-08-09 |
| Polishing pad comprising hydrophobic region and endpoint detection port Grant 7,204,742 - Prasad April 17, 2 | 2007-04-17 |
| CMP porous pad with component-filled pores Grant 7,195,544 - Prasad March 27, 2 | 2007-03-27 |
| Polishing pad comprising magnetically sensitive particles and method for the use thereof App 20060286906 - Myers; Ronald E. ; et al. | 2006-12-21 |
| Method of preparing a conductive film App 20060199002 - Prasad; Abaneshwar ; et al. | 2006-09-07 |
| Low surface energy CMP pad Grant 7,059,936 - Prasad June 13, 2 | 2006-06-13 |
| Method for manufacturing microporous CMP materials having controlled pore size App 20060052040 - Prasad; Abaneshwar | 2006-03-09 |
| Polishing pad with microporous regions App 20060046622 - Prasad; Abaneshwar | 2006-03-02 |
| Polishing pad with oriented pore structure Grant 6,998,166 - Prasad February 14, 2 | 2006-02-14 |
| Transparent microporous materials for CMP App 20050277371 - Prasad, Abaneshwar | 2005-12-15 |
| Surface textured microporous polishing pads App 20050276967 - Prasad, Abaneshwar | 2005-12-15 |
| CMP pad with composite transparent window Grant 6,960,120 - Prasad November 1, 2 | 2005-11-01 |
| CMC porous pad with component-filled pores App 20050215177 - Prasad, Abaneshwar | 2005-09-29 |
| Low surface energy CMP pad App 20050215179 - Prasad, Abaneshwar | 2005-09-29 |
| Polishing pad comprising hydrophobic region and endpoint detection port App 20050211376 - Prasad, Abaneshwar | 2005-09-29 |
| Multi-layer polishing pad material for CMP App 20050197050 - Prasad, Abaneshwar ; et al. | 2005-09-08 |
| Microporous polishing pads Grant 6,935,931 - Prasad August 30, 2 | 2005-08-30 |
| Negative poisson's ratio material-containing CMP polishing pad App 20050153634 - Prasad, Abaneshwar ; et al. | 2005-07-14 |
| Microporous polishing pads Grant 6,913,517 - Prasad July 5, 2 | 2005-07-05 |
| Microporous polishing pads Grant 6,899,598 - Prasad May 31, 2 | 2005-05-31 |
| Microporous polishing pads Grant 6,896,593 - Prasad May 24, 2 | 2005-05-24 |
| Polishing pad comprising biodegradable polymer App 20050101228 - Prasad, Abaneshwar | 2005-05-12 |
| Polishing pad comprising biodegradable polymer App 20050098540 - Prasad, Abaneshwar | 2005-05-12 |
| Multi-layer polishing pad material for CMP Grant 6,884,156 - Prasad , et al. April 26, 2 | 2005-04-26 |
| Polishing pad with oriented pore structure App 20040258882 - Prasad, Abaneshwar | 2004-12-23 |
| Multi-layer polishing pad material for CMP App 20040259484 - Prasad, Abaneshwar ; et al. | 2004-12-23 |
| Microporous polishing pads App 20040177563 - Prasad, Abaneshwar | 2004-09-16 |
| Microporous polishing pads App 20040171339 - Prasad, Abaneshwar | 2004-09-02 |
| Microporous polishing pads App 20040171338 - Prasad, Abaneshwar | 2004-09-02 |
| Microporous polishing pads App 20040171340 - Prasad, Abaneshwar | 2004-09-02 |
| CMP pad with composite transparent window App 20040157533 - Prasad, Abaneshwar | 2004-08-12 |
| Transparent microporous materials for CMP App 20040082276 - Prasad, Abaneshwar | 2004-04-29 |
| Microporous polishing pads App 20030220061 - Prasad, Abaneshwar | 2003-11-27 |
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