Poon; Tze Wing

Patent Applications and Registrations

Patent applications and USPTO patent grants for Poon; Tze Wing.The latest application filed is for "semiconductor devices suitable for narrow pitch applications and methods of fabrication thereof".

Company Profile

0.15.8

Poon; Tze Wing - Sunnyvale CA
Poon; Tze Wing - San Francisco CA

*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.

Patent Activity

Patent	Date
Semiconductor devices suitable for narrow pitch applications and methods of fabrication thereof Grant 9,530,898 - Ganguly , et al. December 27, 2	2016-12-27
Semiconductor Devices Suitable For Narrow Pitch Applications And Methods Of Fabrication Thereof App 20150102396 - GANGULY; UDAYAN ; et al.	2015-04-16
Semiconductor devices suitable for narrow pitch applications and methods of fabrication thereof Grant 8,871,645 - Ganguly , et al. October 28, 2	2014-10-28
Modification of charge trap silicon nitride with oxygen plasma Grant 8,198,671 - Olsen , et al. June 12, 2	2012-06-12
Modification of charge trap silicon nitride with oxygen plasma App 20100270609 - Olsen; Christopher Sean ; et al.	2010-10-28
Semiconductor Devices Suitable For Narrow Pitch Applications And Methods Of Fabrication Thereof App 20100062603 - Ganguly; Udayan ; et al.	2010-03-11
Plasma processes for depositing low dielectric constant films Grant 7,560,377 - Cheung , et al. July 14, 2	2009-07-14
Biased H.sub.2 etch process in deposition-etch-deposition gap fill Grant 7,163,896 - Zhu , et al. January 16, 2	2007-01-16
Plasma processes for depositing low dielectric constant films App 20050191846 - Cheung, David ; et al.	2005-09-01
Plasma processes for depositing low dielectric constant films Grant 6,930,061 - Cheung , et al. August 16, 2	2005-08-16
Plasma processes for depositing low dielectric constant films Grant 6,869,896 - Cheung , et al. March 22, 2	2005-03-22
Plasma processes for depositing low dielectric constant films Grant 6,734,115 - Cheung , et al. May 11, 2	2004-05-11
Plasma processes for depositing low dielectric constant films App 20040082199 - Cheung, David ; et al.	2004-04-29
Plasma processes for depositing low dielectric constant films App 20040038545 - Cheung, David ; et al.	2004-02-26
Plasma processes for depositing low dielectric constant films Grant 6,660,656 - Cheung , et al. December 9, 2	2003-12-09
Plasma processes for depositing low dielectric constant films Grant 6,596,655 - Cheung , et al. July 22, 2	2003-07-22
Plasma processes for depositing low dielectric constant films Grant 6,562,690 - Cheung , et al. May 13, 2	2003-05-13
Plasma processes for depositing low dielectric constant films App 20030064610 - Cheung, David ; et al.	2003-04-03
Plasma processes for depositing low dielectric constant films Grant 6,541,282 - Cheung , et al. April 1, 2	2003-04-01
Plasma processes for depositing low dielectric constant films App 20020045361 - Cheung, David ; et al.	2002-04-18
Plasma processes for depositing low dielectric constant films Grant 6,348,725 - Cheung , et al. February 19, 2	2002-02-19
Plasma processes for depositing low dielectric constant films Grant 6,303,523 - Cheung , et al. October 16, 2	2001-10-16

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