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Semiconductor Devices Suitable For Narrow Pitch Applications And Methods Of Fabrication Thereof App 20150102396 - GANGULY; UDAYAN ;   et al. | 2015-04-16 |
Semiconductor devices suitable for narrow pitch applications and methods of fabrication thereof Grant 8,871,645 - Ganguly , et al. October 28, 2 | 2014-10-28 |
Modification of charge trap silicon nitride with oxygen plasma Grant 8,198,671 - Olsen , et al. June 12, 2 | 2012-06-12 |
Modification of charge trap silicon nitride with oxygen plasma App 20100270609 - Olsen; Christopher Sean ;   et al. | 2010-10-28 |
Semiconductor Devices Suitable For Narrow Pitch Applications And Methods Of Fabrication Thereof App 20100062603 - Ganguly; Udayan ;   et al. | 2010-03-11 |
Plasma processes for depositing low dielectric constant films Grant 7,560,377 - Cheung , et al. July 14, 2 | 2009-07-14 |
Biased H.sub.2 etch process in deposition-etch-deposition gap fill Grant 7,163,896 - Zhu , et al. January 16, 2 | 2007-01-16 |
Plasma processes for depositing low dielectric constant films App 20050191846 - Cheung, David ;   et al. | 2005-09-01 |
Plasma processes for depositing low dielectric constant films Grant 6,930,061 - Cheung , et al. August 16, 2 | 2005-08-16 |
Plasma processes for depositing low dielectric constant films Grant 6,869,896 - Cheung , et al. March 22, 2 | 2005-03-22 |
Plasma processes for depositing low dielectric constant films Grant 6,734,115 - Cheung , et al. May 11, 2 | 2004-05-11 |
Plasma processes for depositing low dielectric constant films App 20040082199 - Cheung, David ;   et al. | 2004-04-29 |
Plasma processes for depositing low dielectric constant films App 20040038545 - Cheung, David ;   et al. | 2004-02-26 |
Plasma processes for depositing low dielectric constant films Grant 6,660,656 - Cheung , et al. December 9, 2 | 2003-12-09 |
Plasma processes for depositing low dielectric constant films Grant 6,596,655 - Cheung , et al. July 22, 2 | 2003-07-22 |
Plasma processes for depositing low dielectric constant films Grant 6,562,690 - Cheung , et al. May 13, 2 | 2003-05-13 |
Plasma processes for depositing low dielectric constant films App 20030064610 - Cheung, David ;   et al. | 2003-04-03 |
Plasma processes for depositing low dielectric constant films Grant 6,541,282 - Cheung , et al. April 1, 2 | 2003-04-01 |
Plasma processes for depositing low dielectric constant films App 20020045361 - Cheung, David ;   et al. | 2002-04-18 |
Plasma processes for depositing low dielectric constant films Grant 6,348,725 - Cheung , et al. February 19, 2 | 2002-02-19 |
Plasma processes for depositing low dielectric constant films Grant 6,303,523 - Cheung , et al. October 16, 2 | 2001-10-16 |