loadpatents
Patent applications and USPTO patent grants for Platzgummer; Elmar.The latest application filed is for "charged-particle source and method for cleaning a charged-particle source using back-sputtering".
Patent | Date |
---|---|
Charged-particle source and method for cleaning a charged-particle source using back-sputtering Grant 10,840,054 - Platzgummer , et al. November 17, 2 | 2020-11-17 |
Non-linear dose- and blur-dependent edge placement correction Grant 10,651,010 - Platzgummer , et al. | 2020-05-12 |
Dose-related feature reshaping in an exposure pattern to be exposed in a multi beam writing apparatus Grant 10,522,329 - Platzgummer , et al. Dec | 2019-12-31 |
Multi-beam writing using inclined exposure stripes Grant 10,410,831 - Platzgummer Sept | 2019-09-10 |
Charged-Particle Source and Method for Cleaning a Charged-Particle Source Using Back-Sputtering App 20190237288 - Platzgummer; Elmar ;   et al. | 2019-08-01 |
Non-linear Dose- and Blur-Dependent Edge Placement Correction App 20190214226 - Platzgummer; Elmar ;   et al. | 2019-07-11 |
Method for compensating pattern placement errors caused by variation of pattern exposure density in a multi-beam writer Grant 10,325,756 - Platzgummer | 2019-06-18 |
Advanced dose-level quantization of multibeam-writers Grant 10,325,757 - Platzgummer , et al. | 2019-06-18 |
Method for Irradiating a Target Using Restricted Placement Grids App 20190088448 - Platzgummer; Elmar ;   et al. | 2019-03-21 |
Dose-Related Feature Reshaping in an Exposure Pattern to be Exposed in a Multi Beam Writing Apparatus App 20190066976 - Platzgummer; Elmar ;   et al. | 2019-02-28 |
Advanced Dose-Level Quantization for Multibeam-Writers App 20180218879 - Platzgummer; Elmar ;   et al. | 2018-08-02 |
Method for Compensating Pattern Placement Errors Caused by Variation of Pattern Exposure Density in a Multi-Beam Writer App 20170357153 - Platzgummer; Elmar | 2017-12-14 |
Bi-directional double-pass multi-beam writing Grant 9,799,487 - Platzgummer October 24, 2 | 2017-10-24 |
Multi-beam writing of pattern areas of relaxed critical dimension Grant 9,653,263 - Platzgummer , et al. May 16, 2 | 2017-05-16 |
Correction of short-range dislocations in a multi-beam writer Grant 9,568,907 - Platzgummer , et al. February 14, 2 | 2017-02-14 |
Compensation of imaging deviations in a particle-beam writer using a convolution kernel Grant 9,520,268 - Platzgummer December 13, 2 | 2016-12-13 |
Multi-Beam Writing Using Inclined Exposure Stripes App 20160336147 - Platzgummer; Elmar | 2016-11-17 |
Compensation of dose inhomogeneity using overlapping exposure spots Grant 9,495,499 - Platzgummer , et al. November 15, 2 | 2016-11-15 |
Bi-Directional Double-Pass Multi-Beam Writing App 20160276131 - Platzgummer; Elmar | 2016-09-22 |
Multi-Beam Writing of Pattern Areas of Relaxed Critical Dimension App 20160276132 - Platzgummer; Elmar ;   et al. | 2016-09-22 |
Multi-beam tool for cutting patterns Grant 9,443,699 - Platzgummer , et al. September 13, 2 | 2016-09-13 |
Customizing a particle-beam writer using a convolution kernel Grant 9,373,482 - Platzgummer June 21, 2 | 2016-06-21 |
Correction of Short-Range Dislocations in a Multi-Beam Writer App 20160071684 - Platzgummer; Elmar ;   et al. | 2016-03-10 |
Compensation of defective beamlets in a charged-particle multi-beam exposure tool Grant 9,269,543 - Reiter , et al. February 23, 2 | 2016-02-23 |
Customizing a Particle-Beam Writer Using a Convolution Kernel App 20160012170 - Platzgummer; Elmar | 2016-01-14 |
Compensation of Imaging Deviations in a Particle-Beam Writer Using a Convolution Kernel App 20160013019 - Platzgummer; Elmar | 2016-01-14 |
Compensation of Dose Inhomogeneity Using Overlapping Exposure Spots App 20150347660 - Platzgummer; Elmar ;   et al. | 2015-12-03 |
Multi-Beam Tool for Cutting Patterns App 20150311030 - Platzgummer; Elmar ;   et al. | 2015-10-29 |
Multi-Beam Tool for Cutting Patterns App 20150311031 - Platzgummer; Elmar ;   et al. | 2015-10-29 |
Compensation Of Defective Beamlets In A Charged-particle Multi-beam Exposure Tool App 20150248993 - Reiter; Rafael ;   et al. | 2015-09-03 |
Pattern definition device having multiple blanking arrays Grant 9,099,277 - Platzgummer August 4, 2 | 2015-08-04 |
High-voltage insulation device for charged-particle optical apparatus Grant 9,093,201 - Platzgummer , et al. July 28, 2 | 2015-07-28 |
Method for charged-particle multi-beam exposure Grant 9,053,906 - Platzgummer June 9, 2 | 2015-06-09 |
Charged-particle Multi-beam Apparatus Having Correction Plate App 20150069260 - Platzgummer; Elmar | 2015-03-12 |
Method For Charged-particle Multi-beam Exposure App 20150028230 - Platzgummer; Elmar | 2015-01-29 |
Pattern Definition Device Having Multiple Blanking Arrays App 20150021493 - Platzgummer; Elmar | 2015-01-22 |
High-voltage Insulation Device For Charged-particle Optical Apparatus App 20140197327 - Platzgummer; Elmar ;   et al. | 2014-07-17 |
Multi-beam deflector array means with bonded electrodes Grant 8,563,942 - Platzgummer October 22, 2 | 2013-10-22 |
Pattern definition device with multiple multibeam array Grant 8,546,767 - Platzgummer , et al. October 1, 2 | 2013-10-01 |
Method for multi-beam exposure on a target Grant 8,378,320 - Platzgummer February 19, 2 | 2013-02-19 |
Particle-optical system Grant 8,368,015 - Platzgummer , et al. February 5, 2 | 2013-02-05 |
Charged particle beam exposure system and beam manipulating arrangement Grant 8,368,030 - Platzgummer , et al. February 5, 2 | 2013-02-05 |
Charged-particle exposure apparatus with electrostatic zone plate Grant 8,304,749 - Platzgummer , et al. November 6, 2 | 2012-11-06 |
Global point spreading function in multi-beam patterning Grant 8,278,635 - Platzgummer , et al. October 2, 2 | 2012-10-02 |
Compensation of dose inhomogeneity and image distortion Grant 8,258,488 - Platzgummer , et al. September 4, 2 | 2012-09-04 |
Method for maskless particle-beam exposure Grant 8,222,621 - Fragner , et al. July 17, 2 | 2012-07-17 |
Method for producing a multi-beam deflector array device having electrodes Grant 8,198,601 - Platzgummer , et al. June 12, 2 | 2012-06-12 |
Multi-beam source Grant 8,183,543 - Platzgummer May 22, 2 | 2012-05-22 |
Method for maskless particle-beam exposure Grant 8,115,183 - Platzgummer February 14, 2 | 2012-02-14 |
Constant current multi-beam patterning Grant 8,057,972 - Fragner , et al. November 15, 2 | 2011-11-15 |
Charged particle system Grant 8,049,189 - Buschbeck , et al. November 1, 2 | 2011-11-01 |
Charged particle beam exposure system Grant 8,026,495 - Platzgummer September 27, 2 | 2011-09-27 |
Method For Multi-beam Exposure On A Target App 20110226968 - Platzgummer; Elmar | 2011-09-22 |
Pattern Definition Device With Multiple Multibeam Array App 20110204253 - Platzgummer; Elmar ;   et al. | 2011-08-25 |
Multi-beam Deflector Array Means With Bonded Electrodes App 20100288938 - Platzgummer; Elmar | 2010-11-18 |
Particle-Optical System App 20100270474 - Platzgummer; Elmar ;   et al. | 2010-10-28 |
Method For Maskless Particle-beam Exposure App 20100252733 - Platzgummer; Elmar | 2010-10-07 |
Global Point Spreading Function in Multi-Beam Patterning App 20100224790 - Platzgummer; Elmar ;   et al. | 2010-09-09 |
Particle-beam exposure apparatus with overall-modulation of a patterned beam Grant 7,781,748 - Platzgummer August 24, 2 | 2010-08-24 |
Method for maskless particle-beam exposure Grant 7,777,201 - Fragner , et al. August 17, 2 | 2010-08-17 |
Method For Producing A Multi-beam Deflector Array Device Having Electrodes App 20100187434 - Platzgummer; Elmar ;   et al. | 2010-07-29 |
Particle-beam apparatus with improved wien-type filter Grant 7,763,851 - Platzgummer July 27, 2 | 2010-07-27 |
Charged-particle exposure apparatus Grant 7,737,422 - Platzgummer , et al. June 15, 2 | 2010-06-15 |
Method For Maskless Particle-beam Exposure App 20100127185 - Fragner; Heinrich ;   et al. | 2010-05-27 |
Constant Current Multi-beam Patterning App 20100124722 - Fragner; Heinrich ;   et al. | 2010-05-20 |
Pattern definition device having distinct counter-electrode array plate Grant 7,714,298 - Platzgummer May 11, 2 | 2010-05-11 |
Multi-beam deflector array device for maskless particle-beam processing Grant 7,687,783 - Platzgummer , et al. March 30, 2 | 2010-03-30 |
Compensation Of Dose Inhomogeneity And Image Distortion App 20100038554 - Platzgummer; Elmar ;   et al. | 2010-02-18 |
Charged-particle exposure apparatus Grant 7,598,499 - Platzgummer October 6, 2 | 2009-10-06 |
Charged Particle Beam Exposure System App 20090212240 - Platzgummer; Elmar ;   et al. | 2009-08-27 |
Particle-beam Exposure Apparatus With Overall-modulation Of A Patterned Beam App 20090200495 - Platzgummer; Elmar | 2009-08-13 |
Charged particle beam exposure system and beam manipulating arrangement App 20090140160 - Platzgummer; Elmar ;   et al. | 2009-06-04 |
Multi-beam Source App 20090026389 - Platzgummer; Elmar | 2009-01-29 |
Pattern Definition Device Having Distinct Counter-electrode Array Plate App 20080283767 - Platzgummer; Elmar | 2008-11-20 |
Charged-Particle Exposure Apparatus App 20080258084 - Platzgummer; Elmar ;   et al. | 2008-10-23 |
Method For Maskless Particle-beam Exposure App 20080237460 - Fragner; Heinrich ;   et al. | 2008-10-02 |
Charged-Particle Exposure Apparatus With Electrostatic Zone Plate App 20080230711 - Platzgummer; Elmar ;   et al. | 2008-09-25 |
Charged Particle System App 20080210887 - Buschbeck; Herbert ;   et al. | 2008-09-04 |
Multi-beam Deflector Array Device For Maskless Particle-beam Processing App 20080203317 - Platzgummer; Elmar ;   et al. | 2008-08-28 |
Particle-beam Apparatus With Improved Wien-type Filter App 20080149846 - Platzgummer; Elmar | 2008-06-26 |
Particle-optical projection system Grant 7,388,217 - Buschbeck , et al. June 17, 2 | 2008-06-17 |
Advanced pattern definition for particle-beam exposure Grant 7,368,738 - Platzgummer May 6, 2 | 2008-05-06 |
Charged-particle exposure apparatus App 20080099693 - Platzgummer; Elmar | 2008-05-01 |
Advanced pattern definition for particle-beam processing Grant 7,276,714 - Platzgummer , et al. October 2, 2 | 2007-10-02 |
Particle-optical projection system App 20070125956 - Buschbeck; Herbert ;   et al. | 2007-06-07 |
Charged-particle multi-beam exposure apparatus Grant 7,214,951 - Stengl , et al. May 8, 2 | 2007-05-08 |
Method of synthesising carbon nano tubes Grant 7,033,647 - Tang , et al. April 25, 2 | 2006-04-25 |
Method Of Synthesising Carbon Nano Tubes App 20060068096 - Tang; Xinhe ;   et al. | 2006-03-30 |
Particle multibeam lithography Grant 6,989,546 - Loschner , et al. January 24, 2 | 2006-01-24 |
Advanced pattern definition for particle-beam exposure App 20050242303 - Platzgummer, Elmar | 2005-11-03 |
Advanced pattern definition for particle-beam processing App 20050242302 - Platzgummer, Elmar ;   et al. | 2005-11-03 |
Particle-optical projection system App 20050201246 - Buschbeck, Herbert ;   et al. | 2005-09-15 |
Ion irradiation of a target at very high and very low kinetic ion energies Grant 6,909,103 - Platzgummer , et al. June 21, 2 | 2005-06-21 |
Charged-particle multi-beam exposure apparatus App 20050104013 - Stengl, Gerhard ;   et al. | 2005-05-19 |
Apparatus for enhancing the lifetime of stencil masks Grant 6,858,118 - Platzgummer , et al. February 22, 2 | 2005-02-22 |
Ion irradiation of a target at very high and very low kinetic ion energies App 20050012052 - Platzgummer, Elmar ;   et al. | 2005-01-20 |
Apparatus for enhancing the lifetime of stencil masks App 20040188243 - Platzgummer, Elmar ;   et al. | 2004-09-30 |
Maskless particle-beam system for exposing a pattern on a substrate Grant 6,768,125 - Platzgummer , et al. July 27, 2 | 2004-07-27 |
Method for producing a superconducting circuit App 20030236169 - Lang, Wolfgang ;   et al. | 2003-12-25 |
Maskless particle-beam system for exposing a pattern on a substrate App 20030155534 - Platzgummer, Elmar ;   et al. | 2003-08-21 |
Field ionization ion source App 20030122085 - Stengl, Gerhard ;   et al. | 2003-07-03 |
uspto.report is an independent third-party trademark research tool that is not affiliated, endorsed, or sponsored by the United States Patent and Trademark Office (USPTO) or any other governmental organization. The information provided by uspto.report is based on publicly available data at the time of writing and is intended for informational purposes only.
While we strive to provide accurate and up-to-date information, we do not guarantee the accuracy, completeness, reliability, or suitability of the information displayed on this site. The use of this site is at your own risk. Any reliance you place on such information is therefore strictly at your own risk.
All official trademark data, including owner information, should be verified by visiting the official USPTO website at www.uspto.gov. This site is not intended to replace professional legal advice and should not be used as a substitute for consulting with a legal professional who is knowledgeable about trademark law.