Plat; Marina

Patent Applications and Registrations

Patent applications and USPTO patent grants for Plat; Marina.The latest application filed is for "method and apparatus to prevent pattern collapse of photoresist layer due to capillary forces".

Company Profile

0.8.1

Plat; Marina - San Jose CA

*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.

Patent Activity

Patent	Date
Analytical model for predicting the operating process window for lithographic patterning techniques based on photoresist trim technology Grant 6,606,738 - Bell , et al. August 12, 2	2003-08-12
Method and apparatus to prevent pattern collapse of photoresist layer due to capillary forces App 20030003402 - Plat, Marina	2003-01-02
T-gate formation using a modified conventional poly process Grant 6,417,084 - Singh , et al. July 9, 2	2002-07-09
T-gate formation using modified damascene processing with two masks Grant 6,319,802 - Subramanian , et al. November 20, 2	2001-11-20
Y-gate formation using damascene processing Grant 6,313,019 - Subramanian , et al. November 6, 2	2001-11-06
Use of dual patterning masks for printing holes of small dimensions Grant 6,306,769 - Subramanian , et al. October 23, 2	2001-10-23
Damascene T-gate using a relacs flow Grant 6,270,929 - Lyons , et al. August 7, 2	2001-08-07
Damascene T-gate using a spacer flow Grant 6,255,202 - Lyons , et al. July 3, 2	2001-07-03
Mark protection scheme with no masking Grant 6,057,206 - Nguyen , et al. May 2, 2	2000-05-02

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