Pipitone; John A.

Patent Applications and Registrations

Patent applications and USPTO patent grants for Pipitone; John A..The latest application filed is for "substrate cleaning chamber and cleaning and conditioning methods".

Company Profile

2.12.13

Pipitone; John A. - Livermore CA US
- Livermore CA US

*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.

Patent Activity

Patent	Date
Apparatus for controlling radial distribution of plasma ion density and ion energy at a workpiece surface by multi-frequency RF impedance tuning Grant 9,017,533 - Forster , et al. April 28, 2	2015-04-28
Method for controlling radial distribution of plasma ion density and ion energy at a workpiece surface by multi-frequency RF impedance tuning Grant 08920611 -	2014-12-30
Method for controlling radial distribution of plasma ion density and ion energy at a workpiece surface by multi-frequency RF impedance tuning Grant 8,920,611 - Forster , et al. December 30, 2	2014-12-30
Substrate Cleaning Chamber And Cleaning And Conditioning Methods App 20130192629 - Mehta; Vineet ; et al.	2013-08-01
RF impedance matching network with secondary frequency and sub-harmonic variant Grant 8,491,759 - Pipitone , et al. July 23, 2	2013-07-23
Substrate cleaning chamber and cleaning and conditioning methods Grant 8,435,379 - Mehta , et al. May 7, 2	2013-05-07
Rf Impedance Matching Network With Secondary Dc Input App 20120097104 - Pipitone; John A. ; et al.	2012-04-26
Rf Impedance Matching Network With Secondary Frequency And Sub-harmonic Variant App 20120097524 - Pipitone; John A. ; et al.	2012-04-26
Process for removing high stressed film using LF or HF bias power and capacitively coupled VHF source power with enhanced residue capture Grant 8,123,969 - Brown , et al. February 28, 2	2012-02-28
Ionized Physical Vapor Deposition for Microstructure Controlled Thin Film Deposition App 20100314245 - Brown; Karl ; et al.	2010-12-16
Ionized Physical Vapor Deposition for Microstructure Controlled Thin Film Deposition App 20100314244 - Brown; Karl ; et al.	2010-12-16
Physical vapor deposition plasma reactor with arcing suppression Grant 7,804,040 - Brown , et al. September 28, 2	2010-09-28
Wafer pre-clean reactor cable termination for selective suppression/reflection of source and bias frequency cross products Grant 7,780,814 - Pipitone , et al. August 24, 2	2010-08-24
Control Of Erosion Profile On A Dielectric Rf Sputter Target App 20100089748 - C.FORSTER; JOHN ; et al.	2010-04-15
Method For Controlling Radial Distribution Of Plasma Ion Density And Ion Energy At A Workpiece Surface By Multi-frequency Rf Impedance Tuning App 20100012480 - Forster; John C. ; et al.	2010-01-21
Apparatus For Controlling Radial Distribution Of Plasma Ion Density And Ion Energy At A Workpiece Surface By Multi-frequency Rf Impedance Tuning App 20100012029 - FORSTER; John C. ; et al.	2010-01-21
Process For Removing High Stressed Film Using Lf Or Hf Bias Power And Capacitively Coupled Vhf Source Power With Enhanced Residue Capture App 20090197419 - BROWN; KARL M. ; et al.	2009-08-06
Process for removing high stressed film using LF or HF bias power and capacitively coupled VHF source power with enhanced residue capture Grant 7,541,289 - Brown , et al. June 2, 2	2009-06-02
Substrate Cleaning Chamber And Cleaning And Conditioning Methods App 20080276958 - Mehta; Vineet ; et al.	2008-11-13
Process For Removing High Stressed Film Using Lf Or Hf Bias Power And Capacitively Coupled Vhf Source Power With Enhanced Residue Capture App 20080014747 - BROWN; KARL M. ; et al.	2008-01-17
Physical vapor deposition plasma reactor with arcing suppression App 20070193982 - Brown; Karl M. ; et al.	2007-08-23

uspto.report is an independent third-party trademark research tool that is not affiliated, endorsed, or sponsored by the United States Patent and Trademark Office (USPTO) or any other governmental organization. The information provided by uspto.report is based on publicly available data at the time of writing and is intended for informational purposes only.

While we strive to provide accurate and up-to-date information, we do not guarantee the accuracy, completeness, reliability, or suitability of the information displayed on this site. The use of this site is at your own risk. Any reliance you place on such information is therefore strictly at your own risk.

All official trademark data, including owner information, should be verified by visiting the official USPTO website at www.uspto.gov. This site is not intended to replace professional legal advice and should not be used as a substitute for consulting with a legal professional who is knowledgeable about trademark law.