| Patent | Date |
|---|
Batch curing chamber with gas distribution and individual pumping
Grant 11,408,075 - Khan , et al. August 9, 2 | 2022-08-09 |
Magnetic-material Shield Around Plasma Chambers Near Pedestal
App 20220139679 - KONNOTH JOSEPH; Job George ; et al. | 2022-05-05 |
Plasma processing using multiple radio frequency power feeds for improved uniformity
Grant 11,276,562 - Ye , et al. March 15, 2 | 2022-03-15 |
Showerhead Design To Control Stray Deposition
App 20220064797 - DHANAKSHIRUR; Akshay ; et al. | 2022-03-03 |
Plasma Cleaning Methods For Processing Chambers
App 20210384015 - WANG; Huiyuan ; et al. | 2021-12-09 |
An Advanced Ceramic Lid With Embedded Heater Elements And Embedded Rf Coil For Hdp Cvd And Inductively Coupled Plasma Treatment Chambers
App 20210375586 - KANGUDE; Abhijit ; et al. | 2021-12-02 |
Electrode assembly
Grant 10,984,990 - Bokka , et al. April 20, 2 | 2021-04-20 |
Integration of dual remote plasmas sources for flowable CVD
Grant 10,934,620 - Ma , et al. March 2, 2 | 2021-03-02 |
Conditioning remote plasma source for enhanced performance having repeatable etch and deposition rates
Grant 10,916,407 - Khaja , et al. February 9, 2 | 2021-02-09 |
Recursive Coils For Inductively Coupled Plasmas
App 20200219698 - YE; Zheng John ; et al. | 2020-07-09 |
Plasma Processing Using Multiple Radio Frequency Power Feeds For Improved Uniformity
App 20200203132 - YE; Zheng John ; et al. | 2020-06-25 |
Voltage-current probe for measuring radio-frequency electrical power in a high-temperature environment and method of calibrating the same
Grant 10,663,491 - Ye , et al. | 2020-05-26 |
Integrated Substrate Temperature Measurement On High Temperature Ceramic Heater
App 20200118850 - ZHANG; Yizhen ; et al. | 2020-04-16 |
Plasma processing using multiple radio frequency power feeds for improved uniformity
Grant 10,580,623 - Ye , et al. | 2020-03-03 |
Integrated substrate temperature measurement on high temperature ceramic heater
Grant 10,510,567 - Zhang , et al. Dec | 2019-12-17 |
Method and apparatus to prevent deposition rate/thickness drift, reduce particle defects and increase remote plasma system lifetime
Grant 10,428,426 - Raj , et al. October 1, 2 | 2019-10-01 |
Method and apparatus of processing wafers with compressive or tensile stress at elevated temperatures in a plasma enhanced chemical vapor deposition system
Grant 10,403,535 - Ye , et al. Sep | 2019-09-03 |
On-board metrology (OBM) design and implication in process tool
Grant 10,388,549 - Paul , et al. A | 2019-08-20 |
Conditioning Remote Plasma Source For Enhanced Performance Having Repeatable Etch And Deposition Rates
App 20190074163 - KHAJA; Abdul Aziz ; et al. | 2019-03-07 |
Batch Curing Chamber With Gas Distribution And Individual Pumping
App 20190048470 - KHAN; Adib ; et al. | 2019-02-14 |
Conditioning remote plasma source for enhanced performance having repeatable etch and deposition rates
Grant 10,192,717 - Khaja , et al. Ja | 2019-01-29 |
Integrated Substrate Temperature Measurement On High Temperature Ceramic Heater
App 20180323093 - ZHANG; Yizhen ; et al. | 2018-11-08 |
Batch curing chamber with gas distribution and individual pumping
Grant 10,113,236 - Khan , et al. October 30, 2 | 2018-10-30 |
Electrode Assembly
App 20180308669 - BOKKA; Ramesh ; et al. | 2018-10-25 |
Auto frequency tuned remote plasma source
Grant 10,083,818 - Khaja , et al. September 25, 2 | 2018-09-25 |
Method And Apparatus Of Remote Plasmas Flowable Cvd Chamber
App 20180230597 - MA; Ying ; et al. | 2018-08-16 |
Voltage-current Probe For Measuring Radio-frequency Electrical Power In A High-temperature Environment And Method Of Calibrating The Same
App 20180231587 - YE; Zheng John ; et al. | 2018-08-16 |
Integration Of Dual Remote Plasmas Sources For Flowable Cvd
App 20180148840 - MA; Ying ; et al. | 2018-05-31 |
Method & Apparatus To Prevent Deposition Rate/thickness Drift, Reduce Particle Defects & Increase Remote Plasma System Lifetime
App 20170306493 - RAJ; Daemian ; et al. | 2017-10-26 |
On-board Metrology (obm) Design And Implication In Process Tool
App 20170148654 - PAUL; Khokan C. ; et al. | 2017-05-25 |
Remote plasma source for controlling plasma skew
Grant 9,466,469 - Khaja , et al. October 11, 2 | 2016-10-11 |
Remote Plasma Source For Controlling Plasma Skew
App 20160268103 - KHAJA; Abdul Aziz ; et al. | 2016-09-15 |
Methods of directing magnetic fields in a plasma source, and associated systems
Grant 9,305,749 - Ye , et al. April 5, 2 | 2016-04-05 |
Auto Frequency Tuned Remote Plasma Source
App 20160086772 - KHAJA; Abdul Aziz ; et al. | 2016-03-24 |
Module for ozone cure and post-cure moisture treatment
Grant 9,285,168 - Lubomirsky , et al. March 15, 2 | 2016-03-15 |
Method And Apparatus Of Processing Wafers With Compressive Or Tensile Stress At Elevated Temperatures In A Plasma Enhanced Chemical Vapor Deposition System
App 20160049323 - YE; Zheng John ; et al. | 2016-02-18 |
Conditioning Remote Plasma Source For Enhanced Performance Having Repeatable Etch And Deposition Rates
App 20160020071 - KHAJA; Abdul Aziz ; et al. | 2016-01-21 |
Batch Curing Chamber With Gas Distribution And Individual Pumping
App 20150329970 - KHAN; Adib ; et al. | 2015-11-19 |
Methods Of Directing Magnetic Fields In A Plasma Source, And Associated Systems
App 20150228456 - YE; ZHENG JOHN ; et al. | 2015-08-13 |
Plasma Processing Using Multiple Radio Frequency Power Feeds For Improved Uniformity
App 20150136325 - YE; Zheng John ; et al. | 2015-05-21 |
Loadlock batch ozone cure
Grant 8,524,004 - Lubomirsky , et al. September 3, 2 | 2013-09-03 |
Loadlock Batch Ozone Cure
App 20120145079 - Lubomirsky; Dmitry ; et al. | 2012-06-14 |
Module For Ozone Cure And Post-cure Moisture Treatment
App 20120079982 - Lubomirsky; Dmitry ; et al. | 2012-04-05 |
Method of polishing and cleaning substrates
Grant 6,887,124 - Pinson, II , et al. May 3, 2 | 2005-05-03 |
Plasma reactor using inductive RF coupling, and processes
Grant 6,545,420 - Collins , et al. April 8, 2 | 2003-04-08 |
Plasma reactor using inductive RF coupling, and processes
Grant 6,518,195 - Collins , et al. February 11, 2 | 2003-02-11 |
Magnetic confinement in a plasma reactor having an RF bias electrode
Grant 6,488,807 - Collins , et al. December 3, 2 | 2002-12-03 |
Plasma etch processes
Grant 6,251,792 - Collins , et al. June 26, 2 | 2001-06-26 |
Process used in an RF coupled plasma reactor
Grant 6,068,784 - Collins , et al. May 30, 2 | 2000-05-30 |
Electronically tuned matching networks using adjustable inductance elements and resonant tank circuits
Grant 5,574,410 - Collins , et al. November 12, 1 | 1996-11-12 |
Electronically tuned matching networks using adjustable inductance elements and resonant tank circuits
Grant 5,572,170 - Collins , et al. November 5, 1 | 1996-11-05 |
Silicon scavenger in an inductively coupled RF plasma reactor
Grant 5,556,501 - Collins , et al. September 17, 1 | 1996-09-17 |
Electronically tuned matching networks using adjustable inductance elements and resonant tank circuits
Grant 5,392,018 - Collins , et al. February 21, 1 | 1995-02-21 |
Electronically tuned matching network using predictor-corrector control system
Grant 5,187,454 - Collins , et al. February 16, 1 | 1993-02-16 |
| 