Pinchart; Audrey

Patent Applications and Registrations

Patent applications and USPTO patent grants for Pinchart; Audrey.The latest application filed is for "method of forming dielectric films, new precursors and their use in semiconductor manufacturing".

Company Profile

1.15.10

Pinchart; Audrey - Santo Domingo DM
Pinchart; Audrey - Paris FR
Pinchart; Audrey - Labege FR
Pinchart; Audrey - Antony FR
Pinchart; Audrey - Toulousse FR
Pinchart; Audrey - Toulouse N/A FR
Pinchart; Audrey - Anthony FR

*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.

Patent Activity

Patent	Date
Method of forming dielectric films, new precursors and their use in semiconductor manufacturing Grant 10,217,629 - Dussarrat , et al. Feb	2019-02-26
Method Of Forming Dielectric Films, New Precursors And Their Use In Semiconductor Manufacturing App 20180151354 - DUSSARRAT; Christian ; et al.	2018-05-31
Methods of forming dielectric films, new precursors and their use in semiconductor manufacturing Grant 9,911,590 - Dussarrat , et al. March 6, 2	2018-03-06
Methods Of Forming Dielectric Films, New Precursors And Their Use In Semiconductor Manufacturing App 20170125242 - DUSSARRAT; Christian ; et al.	2017-05-04
Method of forming dielectric films, new precursors and their use in semiconductor manufacturing Grant 9,583,335 - Dussarrat , et al. February 28, 2	2017-02-28
Method of forming a tantalum-containing layer on a substrate Grant 9,085,823 - Blasco , et al. July 21, 2	2015-07-21
Niobium and vanadium organometallic precursors for thin film deposition Grant 9,040,372 - Blasco , et al. May 26, 2	2015-05-26
Method for forming a titanium-containing layer on a substrate using an atomic layer deposition (ALD) process Grant 8,853,075 - Gatineau , et al. October 7, 2	2014-10-07
Method Of Forming Dielectric Films, New Precursors And Their Use In Semiconductor Manufacturing App 20140242812 - DUSSARRAT; Christian ; et al.	2014-08-28
Method of forming dielectric films, new precursors and their use in semiconductor manufacturing Grant 8,668,957 - Dussarrat , et al. March 11, 2	2014-03-11
Niobium And Vanadium Organometallic Precursors For Thin Film Deposition App 20130295778 - BLASCO; Nicolas ; et al.	2013-11-07
Method of depositing a metal-containing dielectric film Grant 8,470,402 - Dussarrat , et al. June 25, 2	2013-06-25
Niobium and vanadium organometallic precursors for thin film deposition Grant 8,460,989 - Blasco , et al. June 11, 2	2013-06-11
Process for depositing boron compounds by CVD or PVD Grant 8,324,014 - Pinchart , et al. December 4, 2	2012-12-04
Method For Forming A Titanium-containing Layer On A Substrate Using An Atomic Layer Deposition (ald) Process App 20110275215 - Gatineau; Satoko ; et al.	2011-11-10
Method Of Forming A Tantalum-containing Layer On A Substrate App 20110244681 - Blasco; Nicolas ; et al.	2011-10-06
Method Of Forming Dielectric Films, New Precursors And Their Use In Semiconductor Manufacturing App 20110207337 - DUSSARRAT; Christian ; et al.	2011-08-25
Niobium And Vanadium Organometallic Precursors For Thin Film Deposition App 20110195574 - Blasco; Nicolas ; et al.	2011-08-11
Process For Depositing Boron Compounds By Cvd Or Pvd App 20100227430 - Pinchart; Audrey ; et al.	2010-09-09
Method Of Forming Dielectric Films, New Precursors And Their Use In Semiconductor Manufacturing App 20090203222 - Dussarrat; Christian ; et al.	2009-08-13

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