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Patent applications and USPTO patent grants for Pieters; Marco Johannes Annemarie.The latest application filed is for "inspection method, lithographic apparatus, mask and substrate".
Patent | Date |
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Inspection method, lithographic apparatus, mask and substrate Grant 10,394,137 - Van Dommelen , et al. A | 2019-08-27 |
Inspection Method, Lithographic Apparatus, Mask And Substrate App 20180253018 - VAN DOMMELEN; Youri Johannes Laurentius Maria ;   et al. | 2018-09-06 |
Inspection method, lithographic apparatus, mask and substrate Grant 10,001,711 - Van Dommelen , et al. June 19, 2 | 2018-06-19 |
Inspection Method, Lithographic Apparatus, Mask And Substrate App 20160313656 - VAN DOMMELEN; Youri Johannes Laurentius Maria ;   et al. | 2016-10-27 |
Method for measuring information about a substrate, and a substrate for use in a lithographic apparatus Grant 7,355,675 - Lalbahadoersing , et al. April 8, 2 | 2008-04-08 |
Method for measuring information about a substrate, and a substrate for use in a lithographic apparatus App 20060138410 - Lalbahadoersing; Sanjay ;   et al. | 2006-06-29 |
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