Phyzchemix Corporation
Patent Applications and Registrations
Patent applications and USPTO patent grants for Phyzchemix Corporation.The latest application filed is for "etching method, method for producing dielectric film of low dielectric constant, method for producing porous member, etching system and thin film forming equipment".
- Phyzchemix Corporation - Minato-ku, Tokyo JP
- PHYZCHEMIX CORPORATION - Minato-ku JP
- Phyzchemix Corporation - Tokyo JP
| Patent | Date |
|---|---|
| Etching method, method for producing dielectric film of low dielectric constant, method for producing porous member, etching system and thin film forming equipment App 20100062602 - Sakamoto; Hitoshi ; et al. | 2010-03-11 |
| Apparatus For The Formation Of A Metal Film App 20090095425 - SAKAMOTO; Hitoshi ; et al. | 2009-04-16 |
| Interconnection structure Grant 7,262,500 - Sakamoto , et al. August 28, 2 | 2007-08-28 |
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