Phi; Justin

Patent Applications and Registrations

Patent applications and USPTO patent grants for Phi; Justin.The latest application filed is for "radio frequency (rf) pulsing impedance tuning with multiplier mode".

Company Profile

5.6.10

Phi; Justin - Milpitas CA

*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.

Patent Activity

Patent	Date
Radio frequency (RF) pulsing impedance tuning with multiplier mode Grant 10,854,427 - Kawasaki , et al. December 1, 2	2020-12-01
Radio Frequency (rf) Pulsing Impedance Tuning With Multiplier Mode App 20200075290 - KAWASAKI; KATSUMASA ; et al.	2020-03-05
Substrate Carrier Using A Proportional Thermal Fluid Delivery System App 20200051839 - Criminale; Phillip ; et al.	2020-02-13
Substrate carrier using a proportional thermal fluid delivery system Grant 10,490,429 - Criminale , et al. Nov	2019-11-26
RF power delivery regulation for processing substrates Grant 10,468,233 - Kawasaki , et al. No	2019-11-05
Smart multi-level RF pulsing methods Grant 9,872,373 - Shimizu , et al. January 16, 2	2018-01-16
Rf Power Delivery Regulation For Processing Substrates App 20170358428 - KAWASAKI; Katsumasa ; et al.	2017-12-14
RF power delivery with approximated saw tooth wave pulsing Grant 9,788,405 - Kawasaki , et al. October 10, 2	2017-10-10
RF power delivery regulation for processing substrates Grant 9,741,539 - Kawasaki , et al. August 22, 2	2017-08-22
Rf Power Delivery Regulation For Processing Substrates App 20170098527 - KAWASAKI; Katsumasa ; et al.	2017-04-06
Rf Power Delivery With Approximated Saw Tooth Wave Pulsing App 20170099722 - KAWASAKI; KATSUMASA ; et al.	2017-04-06
Substrate Carrier Using A Proportional Thermal Fluid Delivery System App 20160148822 - Criminale; Phillip ; et al.	2016-05-26
Etch Process Having Adaptive Control With Etch Depth Of Pressure And Power App 20140342570 - Doan; Kenny Linh ; et al.	2014-11-20
Automated Algorithm For Tuning Of Feedforward Control Parameters In Plasma Processing System App 20140224767 - MERRY; Walter R. ; et al.	2014-08-14

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