Pforr; Rainer

Patent Applications and Registrations

Patent applications and USPTO patent grants for Pforr; Rainer.The latest application filed is for "lithographic targets for uniformity control".

Company Profile

0.22.27

Pforr; Rainer - Dresden N/A DE
Pforr; Rainer - Weixdorf DE
Pforr; Rainer - Leuven Wilsele BE

*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.

Patent Activity

Patent	Date
Method and apparatus for determining a critical dimension variation of a photolithographic mask Grant 10,157,804 - Pforr Dec	2018-12-18
Lithographic targets for uniformity control Grant 8,871,409 - Pforr , et al. October 28, 2	2014-10-28
Lithographic Targets For Uniformity Control App 20130295698 - Pforr; Rainer ; et al.	2013-11-07
Method and apparatus for minimizing overlay errors in lithography Grant 8,539,394 - Pforr September 17, 2	2013-09-17
Lithographic mask and method of forming a lithographic mask Grant 8,293,431 - Rolff , et al. October 23, 2	2012-10-23
Method And Apparatus For Minimizing Overlay Errors In Lithography App 20120227014 - Pforr; Rainer	2012-09-06
Methods of compensating lens heating, lithographic projection system and photo mask Grant 7,855,776 - Kuechler , et al. December 21, 2	2010-12-21
Lithographic Mask and Method of Forming a Lithographic Mask App 20100266939 - Rolff; Haiko ; et al.	2010-10-21
Method for producing a mask for the lithographic projection of a pattern onto a substrate Grant 7,644,389 - Hennig , et al. January 5, 2	2010-01-05
Methods of Compensating Lens Heating, Lithographic Projection System and Photo Mask App 20090244502 - Kuechler; Bernd ; et al.	2009-10-01
Reflection mask, use of the reflection mask and method for fabricating the reflection mask Grant 7,588,867 - Kamm , et al. September 15, 2	2009-09-15
Method of Patterning a Substrate, Photosensitive Layer Stack and System for Lithography App 20090170024 - Hennig; Mario ; et al.	2009-07-02
System and method for projecting a pattern from a mask onto a substrate Grant 7,489,386 - Kamm , et al. February 10, 2	2009-02-10
Photosensitive Layer Stack App 20080318153 - Pforr; Rainer	2008-12-25
Method and System for Adjusting an Optical Model App 20080304029 - Pforr; Rainer ; et al.	2008-12-11
Method for reducing an overlay error and measurement mark for carrying out the same Grant 7,425,396 - Gruss , et al. September 16, 2	2008-09-16
Mask Structure for Manufacturing an Integrated Circuit by Photolithographic Patterning App 20080204686 - Henke; Wolfgang ; et al.	2008-08-28
Set of at least two masks for the projection of structure patterns Grant 7,393,613 - Dettmann , et al. July 1, 2	2008-07-01
Set of masks including a first mask and a second trimming mask with a semitransparent region having a transparency between 20% and 80% to control diffraction effects and obtain maximum depth of focus for the projection of structure patterns onto a semiconductor wafer Grant 7,393,614 - Kohle , et al. July 1, 2	2008-07-01
Lithography mask for imaging of convex structures Grant 7,354,683 - Moukara , et al. April 8, 2	2008-04-08
Apparatus for projecting a pattern into an image plane Grant 7,339,652 - Moukara , et al. March 4, 2	2008-03-04
Transistor arrangement, sense-amplifier arrangement and methods of manufacturing the same via a phase shift mask App 20080042171 - Mosler; Sebastian ; et al.	2008-02-21
Mask arrangement, optical projection system and method for obtaining grating parameters and absorption properties of a diffractive optical element App 20070287075 - Pforr; Rainer ; et al.	2007-12-13
System and Method for Projecting a Pattern from a Mask onto a Substrate App 20070263198 - Kamm; Frank-Michael ; et al.	2007-11-15
Arrangement for the transfer of structural elements of a photomask onto a substrate and method therefor App 20070229790 - Kuechler; Bernd ; et al.	2007-10-04
Method For Producing A Mask For The Lithographic Projection Of A Pattern Onto A Substrate App 20070196744 - Hennig; Mario ; et al.	2007-08-23
Method and system for photolithography App 20070009816 - Pforr; Rainer ; et al.	2007-01-11
Apparatus for projecting a pattern into an image plane App 20060181691 - Moukara; Molela ; et al.	2006-08-17
Reflection mask, use of the reflection mask and method for fabricating the reflection mask App 20050287447 - Kamm, Frank-Michael ; et al.	2005-12-29
Method for transferring a layout of an integrated circuit level to a semiconductor substrate App 20050196689 - Nolscher, Christoph ; et al.	2005-09-08
Lithography mask for imaging of convex structures App 20050095512 - Moukara, Molela ; et al.	2005-05-05
Method for reducing an overlay error and measurement mark for carrying out the same App 20050069790 - Gruss, Stefan ; et al.	2005-03-31
Photolithographic mask and methods for producing a structure and of exposing a wafer in a projection apparatus Grant 6,838,216 - Griesinger , et al. January 4, 2	2005-01-04
Set of at least two masks for the projection of structure patterns and method for producing the masks App 20040202943 - Dettmann, Wolfgang ; et al.	2004-10-14
Set of masks for the projection of structure patterns onto a semiconductor wafer App 20040197677 - Kohle, Roderick ; et al.	2004-10-07
Photolithographic mask and methods for producing a structure and of exposing a wafer in a projection apparatus App 20040038135 - Griesinger, Uwe ; et al.	2004-02-26
Mask for optical projection systems, and a process for its production Grant 6,692,875 - Fischer , et al. February 17, 2	2004-02-17
Alternating phase mask Grant 6,660,437 - Friedrich , et al. December 9, 2	2003-12-09
Contact hole fabrication with the aid of mutually crossing sudden phase shift edges of a single phase shift mask Grant 6,635,388 - Friedrich , et al. October 21, 2	2003-10-21
Method of transferring a pattern of high structure density by multiple exposure of less dense partial patterns Grant 6,627,392 - Pforr , et al. September 30, 2	2003-09-30
Alternating phase mask App 20030008218 - Friedrich, Christoph ; et al.	2003-01-09
Method of transferring a pattern of high structure density by multiple exposure of less dense partial patterns App 20020110753 - Pforr, Rainer ; et al.	2002-08-15
Mask for optical projection systems, and a process for its production App 20020006554 - Fischer, Werner ; et al.	2002-01-17
Phase mask App 20010021476 - Gans, Fritz ; et al.	2001-09-13
Resolution-enhancing optical phase structure for a projection illumination system Grant 5,624,773 - Pforr , et al. April 29, 1	1997-04-29

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