Petrillo; Karen E.

Patent Applications and Registrations

Patent applications and USPTO patent grants for Petrillo; Karen E..The latest application filed is for "reducing line edge roughness and mitigating defects by wafer freezing".

Company Profile

4.17.14

Petrillo; Karen E. - Voorheesville NY
Petrillo; Karen E. - Mahopac NY

*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.

Patent Activity

Patent	Date
Photoresist bridging defect removal by reverse tone weak developer Grant 11,022,891 - Bi , et al. June 1, 2	2021-06-01
Photoresist bridging defect removal by reverse tone weak developer Grant 11,022,890 - Bi , et al. June 1, 2	2021-06-01
Reducing Line Edge Roughness And Mitigating Defects By Wafer Freezing App 20200357666 - Petrillo; Karen E. ; et al.	2020-11-12
Resist multilayer film-attached substrate and patterning process Grant 10,514,605 - Tachibana , et al. Dec	2019-12-24
Approach to lowering extreme ultraviolet exposure dose for inorganic hardmasks for extreme ultraviolet patterning Grant 10,254,652 - De Silva , et al.	2019-04-09
Resist Multilayer Film-attached Substrate And Patterning Process App 20190041753 - TACHIBANA; Seiichiro ; et al.	2019-02-07
Approach To Lowering Extreme Ultraviolet Exposure Dose For Inorganic Hardmasks For Extreme Ultraviolet Patterning App 20180348636 - De Silva; Ekmini A. ; et al.	2018-12-06
Approach to lowering extreme ultraviolet exposure dose for inorganic hardmasks for extreme ultraviolet patterning Grant 10,082,736 - De Silva , et al. September 25, 2	2018-09-25
Photoresist Bridging Defect Removal By Reverse Tone Weak Developer App 20180239254 - Bi; Zhenxing ; et al.	2018-08-23
Photoresist Bridging Defect Removal By Reverse Tone Weak Developer App 20180239253 - Bi; Zhenxing ; et al.	2018-08-23
Approach To Lowering Extreme Ultraviolet Exposure Dose For Inorganic Hardmasks For Extreme Ultraviolet Patterning App 20180203355 - De Silva; Ekmini A. ; et al.	2018-07-19
Microelectronic substrate having removable edge extension element Grant 8,946,866 - Koburger, III , et al. February 3, 2	2015-02-03
Microelectronic Substrate Having Removable Edge Extension Element App 20120241913 - Koburger, III; Charles W. ; et al.	2012-09-27
Microelectronic substrate having removable edge extension element Grant 8,202,460 - Koburger, III , et al. June 19, 2	2012-06-19
Use of mixed bases to enhance patterned resist profiles on chrome or sensitive substrates Grant 7,960,095 - Moreau , et al. June 14, 2	2011-06-14
Multilayered resist systems using tuned polymer films as underlayers and methods of fabrication thereof Grant 7,736,833 - Angelopoulos , et al. June 15, 2	2010-06-15
Multilayered resist systems using tuned polymer films as underlayers and methods of fabrication thereof Grant 7,709,177 - Angelopoulos , et al. May 4, 2	2010-05-04
Use of Mixed Bases to Enhance Patterned Resist Profiles on Chrome or Sensitive Substrates App 20080227030 - Moreau; Wayne M. ; et al.	2008-09-18
Multilayered resist systems using tuned polymer films as underlayers and methods of fabrication thereof App 20080124649 - Angelopoulos; Marie ; et al.	2008-05-29
Multilayered resist systems using tuned polymer films as underlayers and methods of fabrication thereof App 20080124650 - Angelopoulos; Marie ; et al.	2008-05-29
Multilayered resist systems using tuned polymer films as underlayers and methods of fabrication thereof Grant 7,361,444 - Angelopoulos , et al. April 22, 2	2008-04-22
High sensitivity resist compositions for electron-based lithography Grant 7,314,700 - Huang , et al. January 1, 2	2008-01-01
Microelectronic Substrate Having Removable Edge Extension Element App 20070063392 - Koburger III; Charles W. ; et al.	2007-03-22
High sensitivity resist compositions for electron-based lithography App 20060127800 - Huang; Wu-Song ; et al.	2006-06-15
Forming a pattern of a negative photoresist Grant 6,617,086 - Angelopoulos , et al. September 9, 2	2003-09-09
Etch improved resist systems containing acrylate (or methacrylate) silane monomers App 20030049561 - Angelopoulos, Marie ; et al.	2003-03-13
Forming a pattern of a negative photoresist App 20020123010 - Angelopoulos, Marie ; et al.	2002-09-05
Forming a pattern of a negative photoresist Grant 6,251,569 - Angelopoulos , et al. June 26, 2	2001-06-26
E-beam application to mask making using new improved KRS resist system Grant 6,043,003 - Bucchignano , et al. March 28, 2	2000-03-28
E-beam application to mask making using new improved KRS resist system Grant 6,037,097 - Bucchignano , et al. March 14, 2	2000-03-14

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