Patent | Date |
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Photoresist bridging defect removal by reverse tone weak developer Grant 11,022,891 - Bi , et al. June 1, 2 | 2021-06-01 |
Photoresist bridging defect removal by reverse tone weak developer Grant 11,022,890 - Bi , et al. June 1, 2 | 2021-06-01 |
Reducing Line Edge Roughness And Mitigating Defects By Wafer Freezing App 20200357666 - Petrillo; Karen E. ;   et al. | 2020-11-12 |
Resist multilayer film-attached substrate and patterning process Grant 10,514,605 - Tachibana , et al. Dec | 2019-12-24 |
Approach to lowering extreme ultraviolet exposure dose for inorganic hardmasks for extreme ultraviolet patterning Grant 10,254,652 - De Silva , et al. | 2019-04-09 |
Resist Multilayer Film-attached Substrate And Patterning Process App 20190041753 - TACHIBANA; Seiichiro ;   et al. | 2019-02-07 |
Approach To Lowering Extreme Ultraviolet Exposure Dose For Inorganic Hardmasks For Extreme Ultraviolet Patterning App 20180348636 - De Silva; Ekmini A. ;   et al. | 2018-12-06 |
Approach to lowering extreme ultraviolet exposure dose for inorganic hardmasks for extreme ultraviolet patterning Grant 10,082,736 - De Silva , et al. September 25, 2 | 2018-09-25 |
Photoresist Bridging Defect Removal By Reverse Tone Weak Developer App 20180239254 - Bi; Zhenxing ;   et al. | 2018-08-23 |
Photoresist Bridging Defect Removal By Reverse Tone Weak Developer App 20180239253 - Bi; Zhenxing ;   et al. | 2018-08-23 |
Approach To Lowering Extreme Ultraviolet Exposure Dose For Inorganic Hardmasks For Extreme Ultraviolet Patterning App 20180203355 - De Silva; Ekmini A. ;   et al. | 2018-07-19 |
Microelectronic substrate having removable edge extension element Grant 8,946,866 - Koburger, III , et al. February 3, 2 | 2015-02-03 |
Microelectronic Substrate Having Removable Edge Extension Element App 20120241913 - Koburger, III; Charles W. ;   et al. | 2012-09-27 |
Microelectronic substrate having removable edge extension element Grant 8,202,460 - Koburger, III , et al. June 19, 2 | 2012-06-19 |
Use of mixed bases to enhance patterned resist profiles on chrome or sensitive substrates Grant 7,960,095 - Moreau , et al. June 14, 2 | 2011-06-14 |
Multilayered resist systems using tuned polymer films as underlayers and methods of fabrication thereof Grant 7,736,833 - Angelopoulos , et al. June 15, 2 | 2010-06-15 |
Multilayered resist systems using tuned polymer films as underlayers and methods of fabrication thereof Grant 7,709,177 - Angelopoulos , et al. May 4, 2 | 2010-05-04 |
Use of Mixed Bases to Enhance Patterned Resist Profiles on Chrome or Sensitive Substrates App 20080227030 - Moreau; Wayne M. ;   et al. | 2008-09-18 |
Multilayered resist systems using tuned polymer films as underlayers and methods of fabrication thereof App 20080124649 - Angelopoulos; Marie ;   et al. | 2008-05-29 |
Multilayered resist systems using tuned polymer films as underlayers and methods of fabrication thereof App 20080124650 - Angelopoulos; Marie ;   et al. | 2008-05-29 |
Multilayered resist systems using tuned polymer films as underlayers and methods of fabrication thereof Grant 7,361,444 - Angelopoulos , et al. April 22, 2 | 2008-04-22 |
High sensitivity resist compositions for electron-based lithography Grant 7,314,700 - Huang , et al. January 1, 2 | 2008-01-01 |
Microelectronic Substrate Having Removable Edge Extension Element App 20070063392 - Koburger III; Charles W. ;   et al. | 2007-03-22 |
High sensitivity resist compositions for electron-based lithography App 20060127800 - Huang; Wu-Song ;   et al. | 2006-06-15 |
Forming a pattern of a negative photoresist Grant 6,617,086 - Angelopoulos , et al. September 9, 2 | 2003-09-09 |
Etch improved resist systems containing acrylate (or methacrylate) silane monomers App 20030049561 - Angelopoulos, Marie ;   et al. | 2003-03-13 |
Forming a pattern of a negative photoresist App 20020123010 - Angelopoulos, Marie ;   et al. | 2002-09-05 |
Forming a pattern of a negative photoresist Grant 6,251,569 - Angelopoulos , et al. June 26, 2 | 2001-06-26 |
E-beam application to mask making using new improved KRS resist system Grant 6,043,003 - Bucchignano , et al. March 28, 2 | 2000-03-28 |
E-beam application to mask making using new improved KRS resist system Grant 6,037,097 - Bucchignano , et al. March 14, 2 | 2000-03-14 |