loadpatents
name:-0.011996030807495
name:-0.0057249069213867
name:-0.00045514106750488
Persing; Harold Patent Filings

Persing; Harold

Patent Applications and Registrations

Patent applications and USPTO patent grants for Persing; Harold.The latest application filed is for "closed loop process control of plasma processed materials".

Company Profile
0.5.7
  • Persing; Harold - Westbrook ME US
  • Persing; Harold - Rockport MA
*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.
Patent Activity
PatentDate
Pulsed plasma to affect conformal processing
Grant 8,877,654 - Maynard , et al. November 4, 2
2014-11-04
Closed loop process control of plasma processed materials
Grant 8,728,587 - Papasouliotis , et al. May 20, 2
2014-05-20
Closed Loop Process Control Of Plasma Processed Materials
App 20120328771 - Papasouliotis; George ;   et al.
2012-12-27
Pulsed Plasma to Affect Conformal Processing
App 20110256732 - Maynard; Helen ;   et al.
2011-10-20
Conformal Doping Apparatus And Method
App 20070084564 - Gupta; Atul ;   et al.
2007-04-19
Faraday dose and uniformity monitor for plasma based ion implantation
Grant 7,132,672 - Walther , et al. November 7, 2
2006-11-07
Ion implanter having enhanced low energy ion beam transport
App 20060043316 - Liebert; Reuel B. ;   et al.
2006-03-02
Etch and deposition control for plasma implantation
App 20050287307 - Singh, Vikram ;   et al.
2005-12-29
Faraday dose and uniformity monitor for plasma based ion implantation
App 20050223991 - Walther, Steven R. ;   et al.
2005-10-13
RF Plasma Source With Conductive Top Section
App 20050205212 - Singh, Vikram ;   et al.
2005-09-22

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