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Patent applications and USPTO patent grants for Persing; Harold.The latest application filed is for "closed loop process control of plasma processed materials".
Patent | Date |
---|---|
Pulsed plasma to affect conformal processing Grant 8,877,654 - Maynard , et al. November 4, 2 | 2014-11-04 |
Closed loop process control of plasma processed materials Grant 8,728,587 - Papasouliotis , et al. May 20, 2 | 2014-05-20 |
Closed Loop Process Control Of Plasma Processed Materials App 20120328771 - Papasouliotis; George ;   et al. | 2012-12-27 |
Pulsed Plasma to Affect Conformal Processing App 20110256732 - Maynard; Helen ;   et al. | 2011-10-20 |
Conformal Doping Apparatus And Method App 20070084564 - Gupta; Atul ;   et al. | 2007-04-19 |
Faraday dose and uniformity monitor for plasma based ion implantation Grant 7,132,672 - Walther , et al. November 7, 2 | 2006-11-07 |
Ion implanter having enhanced low energy ion beam transport App 20060043316 - Liebert; Reuel B. ;   et al. | 2006-03-02 |
Etch and deposition control for plasma implantation App 20050287307 - Singh, Vikram ;   et al. | 2005-12-29 |
Faraday dose and uniformity monitor for plasma based ion implantation App 20050223991 - Walther, Steven R. ;   et al. | 2005-10-13 |
RF Plasma Source With Conductive Top Section App 20050205212 - Singh, Vikram ;   et al. | 2005-09-22 |
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