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Patent applications and USPTO patent grants for Penner; Klaus.The latest application filed is for "etching composition and use thereof with feedback control of hf in beol clean".
Patent | Date |
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Etching composition and use thereof with feedback control of HF in BEOL clean App 20060118522 - Ramachandran; Ravikumar ;   et al. | 2006-06-08 |
Etching composition and use thereof with feedback control of HF in BEOL clean App 20030209514 - Ramachandran, Ravikumar ;   et al. | 2003-11-13 |
Method for increasing the trench capacitance App 20020018377 - Morhard, Klaus-Dieter ;   et al. | 2002-02-14 |
Method for fabricating a semiconductor structure Grant 6,245,640 - Claussen , et al. June 12, 2 | 2001-06-12 |
Control of gas content in process liquids for improved megasonic cleaning of semiconductor wafers and microelectronics substrates Grant 5,800,626 - Cohen , et al. September 1, 1 | 1998-09-01 |
Uniform trench fill recess by means of isotropic etching Grant 5,683,945 - Penner , et al. November 4, 1 | 1997-11-04 |
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