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Patent applications and USPTO patent grants for Payyapilly; Jairaj.The latest application filed is for "etching oxide-nitride stacks using c4f6h2".
Patent | Date |
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Etching oxide-nitride stacks using C.sub.4F.sub.6H.sub.2 Grant 9,748,366 - Kim , et al. August 29, 2 | 2017-08-29 |
Etching Oxide-nitride Stacks Using C4f6h2 App 20150097276 - Kim; Jong Mun ;   et al. | 2015-04-09 |
Plasma etch processes for boron-doped carbonaceous mask layers Grant 8,778,207 - Kim , et al. July 15, 2 | 2014-07-15 |
Methods For Etching Oxide Layers Using Process Gas Pulsing App 20130224960 - Payyapilly; Jairaj ;   et al. | 2013-08-29 |
Method Of Etching High Aspect Ratio Features In A Dielectric Layer App 20130122712 - KIM; Jong Mun ;   et al. | 2013-05-16 |
Plasma Etch Processes For Boron-doped Carbonaceous Mask Layers App 20130109188 - KIM; Jong Mun ;   et al. | 2013-05-02 |
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