loadpatents
name:-0.013336896896362
name:-0.012830972671509
name:-0.0033900737762451
Paw; Witold Patent Filings

Paw; Witold

Patent Applications and Registrations

Patent applications and USPTO patent grants for Paw; Witold.The latest application filed is for "electrodeposition in ionic liquid electrolytes".

Company Profile
2.9.11
  • Paw; Witold - Sandy Hook CT
  • Paw; Witold - Aurora IL
  • Paw; Witold - New Fairfield CT
  • Paw; Witold - Danbury CT
*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.
Patent Activity
PatentDate
Electrodeposition In Ionic Liquid Electrolytes
App 20190186033 - Ruan; Shiyun ;   et al.
2019-06-20
Articles comprising an electrodeposited aluminum alloys
Grant 10,190,227 - Ruan , et al. Ja
2019-01-29
Slurry for chemical mechanical polishing of cobalt
Grant 9,944,828 - Sikma , et al. April 17, 2
2018-04-17
Slurry For Chemical Mechanical Polishing Of Cobalt
App 20160108286 - Sikma; Elise ;   et al.
2016-04-21
Electrodeposition In Ionic Liquid Electrolytes
App 20140272458 - Ruan; Shiyun ;   et al.
2014-09-18
Organic polymer coating for protection against creep corrosion
Grant 8,263,177 - Feng , et al. September 11, 2
2012-09-11
Method for Treating Metal Surfaces
App 20120061705 - Toscano; Lenora M. ;   et al.
2012-03-15
Method for Treating Metal Surfaces
App 20120061710 - Toscano; Lenora M. ;   et al.
2012-03-15
Method for Treating Metal Surfaces
App 20120061698 - Toscano; Lenora M. ;   et al.
2012-03-15
Organic polymer coating for protection against creep corrosion
App 20100243301 - FENG; KESHENG ;   et al.
2010-09-30
Method of using ultrasonics to plate silver
Grant 7,429,400 - Castaldi , et al. September 30, 2
2008-09-30
Precoat composition for organic solderability preservative
App 20070221503 - Larson; Brian ;   et al.
2007-09-27
Method of using ultrasonics to plate silver
App 20070134406 - Castaldi; Steve ;   et al.
2007-06-14
Source reagent composition for CVD formation of Zr/Hf doped gate dielectric and high dielectric constant metal oxide thin films and method of using same
Grant 6,623,656 - Baum , et al. September 23, 2
2003-09-23
MOCVD of SBT using tetrahydrofuran-based solvent system for precursor delivery
Grant 6,511,706 - Hendrix , et al. January 28, 2
2003-01-28
Source reagent composition for CVD formation of Zr/Hf doped gate dielectric and high dielectric constant metal oxide thin films and method of using same
App 20020132048 - Baum, Thomas H. ;   et al.
2002-09-19
Source reagent composition and method for chemical vapor deposition formation or ZR/HF silicate gate dielectric thin films
Grant 6,399,208 - Baum , et al. June 4, 2
2002-06-04
Tetrahydrofuran-adducted Group II beta-diketonate complexes as source reagents for chemical vapor deposition
App 20010007034 - Baum, Thomas H. ;   et al.
2001-07-05
Tetrahydrofuran-adducted group II .beta.-diketonate complexes as source reagents for chemical vapor deposition
Grant 6,218,518 - Baum , et al. April 17, 2
2001-04-17
Group II MOCVD source reagents, and method of forming Group II metal-containing films utilizing same
Grant 6,111,122 - Paw , et al. August 29, 2
2000-08-29

uspto.report is an independent third-party trademark research tool that is not affiliated, endorsed, or sponsored by the United States Patent and Trademark Office (USPTO) or any other governmental organization. The information provided by uspto.report is based on publicly available data at the time of writing and is intended for informational purposes only.

While we strive to provide accurate and up-to-date information, we do not guarantee the accuracy, completeness, reliability, or suitability of the information displayed on this site. The use of this site is at your own risk. Any reliance you place on such information is therefore strictly at your own risk.

All official trademark data, including owner information, should be verified by visiting the official USPTO website at www.uspto.gov. This site is not intended to replace professional legal advice and should not be used as a substitute for consulting with a legal professional who is knowledgeable about trademark law.

© 2024 USPTO.report | Privacy Policy | Resources | RSS Feed of Trademarks | Trademark Filings Twitter Feed