loadpatents
name:-0.011054992675781
name:-0.0097360610961914
name:-0.0013821125030518
Paunescu; Margareta Patent Filings

Paunescu; Margareta

Patent Applications and Registrations

Patent applications and USPTO patent grants for Paunescu; Margareta.The latest application filed is for "block copolymers with surface-active junction groups, compositions and processes thereof".

Company Profile
1.14.12
  • Paunescu; Margareta - Clinton NJ
*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.
Patent Activity
PatentDate
Block copolymers with surface-active junction groups, compositions and processes thereof
Grant 10,259,907 - Vora , et al.
2019-04-16
Silicon containing block copolymers for direct self-assembly application
Grant 9,505,945 - Wu , et al. November 29, 2
2016-11-29
Block Copolymers With Surface-active Junction Groups, Compositions And Processes Thereof
App 20160244557 - VORA; Ankit ;   et al.
2016-08-25
Silicon Containing Block Copolymers For Direct Self-assembly Application
App 20160122579 - WU; Hengpeng ;   et al.
2016-05-05
Composition comprising a polymeric thermal acid generator and processes thereof
Grant 9,291,909 - Wu , et al. March 22, 2
2016-03-22
Compositions of neutral layer for directed self assembly block copolymers and processes thereof
Grant 9,052,598 - Wu , et al. June 9, 2
2015-06-09
Composition Comprising A Polymeric Thermal Acid Generator And Processes Thereof
App 20140342290 - WU; Hengpeng ;   et al.
2014-11-20
Composition for coating over a photoresist pattern
Grant 8,852,848 - Wu , et al. October 7, 2
2014-10-07
Neutral layer polymer composition for directed self assembly and processes thereof
Grant 8,835,581 - Wu , et al. September 16, 2
2014-09-16
Compositions Of Neutral Layer For Directed Self Assembly Block Copolymers And Processes Thereof
App 20140193754 - WU; Hengpeng ;   et al.
2014-07-10
Thick film resists
Grant 8,715,918 - Toukhy , et al. May 6, 2
2014-05-06
Compositions of neutral layer for directed self assembly block copolymers and processes thereof
Grant 8,691,925 - Wu , et al. April 8, 2
2014-04-08
Neutral Layer Polymer Composition For Directed Self Assembly And Processes Thereof
App 20130330668 - WU; Hengpeng ;   et al.
2013-12-12
Compositions Of Neutral Layer For Directed Self Assembly Block Copolymers And Processes Thereof
App 20130078576 - WU; Hengpeng ;   et al.
2013-03-28
Composition for Coating over a Photoresist Pattern
App 20120028195 - Wu; Hengpeng ;   et al.
2012-02-02
Thick Film Resists
App 20090081589 - Toukhy; Medhat A. ;   et al.
2009-03-26

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