Patent | Date |
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Method For Coating Surfaces App 20160254125 - HUANG; Lihua Li ;   et al. | 2016-09-01 |
Sequential station tool for wet processing of semiconductor wafers Grant 8,883,640 - Patton , et al. November 11, 2 | 2014-11-11 |
Sequential station tool for wet processing of semiconductor wafers Grant 8,450,210 - Patton , et al. May 28, 2 | 2013-05-28 |
Process For Electroplating Metals Into Microscopic Recessed Features App 20120279864 - Mayer; Steven T. ;   et al. | 2012-11-08 |
Process for electroplating metals into microscopic recessed features Grant 8,048,280 - Mayer , et al. November 1, 2 | 2011-11-01 |
Sequential station tool for wet processing of semiconductor wafers Grant 8,026,174 - Patton , et al. September 27, 2 | 2011-09-27 |
Sensor for measuring liquid contaminants in a semiconductor wafer fabrication process Grant 7,696,538 - Lee , et al. April 13, 2 | 2010-04-13 |
Methods and apparatus for controlled-angle wafer positioning Grant 7,686,927 - Reid , et al. March 30, 2 | 2010-03-30 |
Sequential station tool for wet processing of semiconductor wafers Grant 7,189,647 - Patton , et al. March 13, 2 | 2007-03-13 |
Methods and apparatus for controlled-angle wafer positioning Grant 7,097,410 - Reid , et al. August 29, 2 | 2006-08-29 |
Liquid detection end effector sensor and method of using the same App 20060169977 - Lee; Won ;   et al. | 2006-08-03 |
Liquid detection end effector sensor and method of using the same Grant 7,084,466 - Lee , et al. August 1, 2 | 2006-08-01 |
Clamshell apparatus with crystal shielding and in-situ rinse-dry Grant 7,033,465 - Patton , et al. April 25, 2 | 2006-04-25 |
Process for electroplating metals into microscopic recessed features App 20060011483 - Mayer; Steven T. ;   et al. | 2006-01-19 |
Sequential station tool for wet processing of semiconductor wafers App 20050282371 - Patton, Evan E. ;   et al. | 2005-12-22 |
Methods and apparatus for controlling electrolyte flow for uniform plating Grant 6,964,792 - Mayer , et al. November 15, 2 | 2005-11-15 |
Process for electroplating metal into microscopic recessed features Grant 6,946,065 - Mayer , et al. September 20, 2 | 2005-09-20 |
Copper electroplating method and apparatus Grant 6,890,416 - Mayer , et al. May 10, 2 | 2005-05-10 |
Clamshell apparatus for electrochemically treating wafers Grant 6,800,187 - Reid , et al. October 5, 2 | 2004-10-05 |
Method and apparatus for uniform electroplating of thin metal seeded wafers using multiple segmented virtual anode sources Grant 6,773,571 - Mayer , et al. August 10, 2 | 2004-08-10 |
Clamshell apparatus with dynamic uniformity control Grant 6,755,946 - Patton , et al. June 29, 2 | 2004-06-29 |
Electroplating process chamber and method with pre-wetting and rinsing capability Grant 6,716,334 - Reid , et al. April 6, 2 | 2004-04-06 |
Apparatus for electroplating copper onto semiconductor wafer Grant 6,589,401 - Patton , et al. July 8, 2 | 2003-07-08 |
Methods and apparatus for controlled-angle wafer immersion Grant 6,551,487 - Reid , et al. April 22, 2 | 2003-04-22 |
Copper electroplating apparatus Grant 6,527,920 - Mayer , et al. March 4, 2 | 2003-03-04 |
Clamshell apparatus for electrochemically treating semiconductor wafers Grant 6,436,249 - Patton , et al. August 20, 2 | 2002-08-20 |
Electroplating process including pre-wetting and rinsing Grant 6,214,193 - Reid , et al. April 10, 2 | 2001-04-10 |
Method of electroplating semiconductor wafer using variable currents and mass transfer to obtain uniform plated layer Grant 6,162,344 - Reid , et al. December 19, 2 | 2000-12-19 |
Clamshell apparatus for electrochemically treating semiconductor wafers Grant 6,156,167 - Patton , et al. December 5, 2 | 2000-12-05 |
Method of depositing metal layer Grant 6,139,712 - Patton , et al. October 31, 2 | 2000-10-31 |
Method of electroplating semicoductor wafer using variable currents and mass transfer to obtain uniform plated layer Grant 6,110,346 - Reid , et al. August 29, 2 | 2000-08-29 |
Electroplating chamber with rotatable wafer holder and pre-wetting and rinsing capability Grant 6,099,702 - Reid , et al. August 8, 2 | 2000-08-08 |
Method of electroplating semiconductor wafer using variable currents and mass transfer to obtain uniform plated layer Grant 6,074,544 - Reid , et al. June 13, 2 | 2000-06-13 |
Method and apparatus for active pyrometry Grant 5,029,117 - Patton July 2, 1 | 1991-07-02 |
Method of fabricating a semiconductor device using a tri-layer structure and conductive sidewalls Grant 4,994,400 - Yamaguchi , et al. February 19, 1 | 1991-02-19 |