| Patent | Date |
|---|
Method and System for Automated Frequency Tuning of Radiofrequency (RF) Signal Generator for Multi-Level RF Power Pulsing
App 20220189738 - Evans; Mathew ; et al. | 2022-06-16 |
Selective Silicon Dioxide Removal Using Low Pressure Low Bias Deuterium Plasma
App 20220148852 - Shoeb; Juline ; et al. | 2022-05-12 |
Fischer-tropsch Process Using Reduced Cobalt Catalyst
App 20210001322 - FERGUSON; Ewen ; et al. | 2021-01-07 |
Direct drive RF circuit for substrate processing systems
Grant 10,847,345 - Long , et al. November 24, 2 | 2020-11-24 |
Fischer-Tropsch process using reduced cobalt catalyst
Grant 10,717,075 - Ferguson , et al. | 2020-07-21 |
Systems and methods for tuning to reduce reflected power in multiple states
Grant 10,651,013 - McChesney , et al. | 2020-05-12 |
Direct Drive Rf Circuit For Substrate Processing Systems
App 20200111644 - LONG; Maolin ; et al. | 2020-04-09 |
Direct drive RF circuit for substrate processing systems
Grant 10,515,781 - Long , et al. Dec | 2019-12-24 |
Direct Drive Rf Circuit For Substrate Processing Systems
App 20190385821 - LONG; Maolin ; et al. | 2019-12-19 |
Systems And Methods For Tuning To Reduce Reflected Power In Multiple States
App 20190371571 - McChesney; Jon ; et al. | 2019-12-05 |
Systems and methods for tuning to reduce reflected power in multiple states
Grant 10,410,836 - McChesney , et al. Sept | 2019-09-10 |
Multi-Zone Cooling Of Plasma Heated Window
App 20190148118 - ZHANG; Yiting ; et al. | 2019-05-16 |
Fast-gas switching for etching
Grant 10,262,867 - Sriraman , et al. | 2019-04-16 |
Ceramic showerhead including central gas injector for tunable convective-diffusive gas flow in semiconductor substrate processing apparatus
Grant 10,249,511 - Sriraman , et al. | 2019-04-02 |
Process For Preparation Of A Supported Cobalt-containing Fishcer-tropsch Synthesis
App 20190046960 - FERGUSON; Ewen ; et al. | 2019-02-14 |
Extreme edge sheath and wafer profile tuning through edge-localized ion trajectory control and plasma operation
Grant 10,163,610 - Sriraman , et al. Dec | 2018-12-25 |
Systems And Methods For Tuning To Reduce Reflected Power In Multiple States
App 20180240647 - McChesney; Jon ; et al. | 2018-08-23 |
Fischer-tropsch Process Using Reductively-activated Cobalt Catalyst
App 20180037825 - FERGUSON; Ewen ; et al. | 2018-02-08 |
Fischer-tropsch Process Using Reduced Cobalt Catalyst
App 20170368546 - FERGUSON; Ewen ; et al. | 2017-12-28 |
Detection System for Tunable/Replaceable Edge Coupling Ring
App 20170263478 - McCHESNEY; Jon ; et al. | 2017-09-14 |
Fast-gas switching for etching
Grant 9,640,408 - Sriraman , et al. May 2, 2 | 2017-05-02 |
Extreme Edge Sheath And Wafer Profile Tuning Through Edge-localized Ion Trajectory Control And Plasma Operation
App 20170018411 - Sriraman; Saravanapriyan ; et al. | 2017-01-19 |
Fast-gas Switching For Etching
App 20160172206 - SRIRAMAN; Saravanapriyan ; et al. | 2016-06-16 |
Fast-gas Switching For Etching
App 20160141150 - SRIRAMAN; Saravanapriyan ; et al. | 2016-05-19 |
Fast-gas switching for etching
Grant 9,275,869 - Sriraman , et al. March 1, 2 | 2016-03-01 |
Ceramic Showerhead Including Central Gas Injector For Tunable Convective-diffusive Gas Flow In Semiconductor Substrate Processing Apparatus
App 20150380281 - Sriraman; Saravanapriyan ; et al. | 2015-12-31 |
Method and apparatus for controlling substrate DC-bias and ion energy and angular distribution during substrate etching
Grant 9,053,908 - Sriraman , et al. June 9, 2 | 2015-06-09 |
Method and Apparatus for Controlling Substrate DC-Bias and Ion Energy and Angular Distribution During Substrate Etching
App 20150076112 - Sriraman; Saravanapriyan ; et al. | 2015-03-19 |
Fast-gas Switching For Etching
App 20150037981 - SRIRAMAN; Saravanapriyan ; et al. | 2015-02-05 |
Apparatus for etching high aspect ratio features
Grant 8,475,625 - Pamarthy , et al. July 2, 2 | 2013-07-02 |
Plasma control using dual cathode frequency mixing
Grant 7,838,430 - Shannon , et al. November 23, 2 | 2010-11-23 |
Process using combined capacitively and inductively coupled plasma sources for controlling plasma ion radial distribution
Grant 7,780,864 - Paterson , et al. August 24, 2 | 2010-08-24 |
High AC current high RF power AC-RF decoupling filter for plasma reactor heated electrostatic chuck
Grant 7,777,152 - Todorov , et al. August 17, 2 | 2010-08-17 |
Pulsed-plasma system with pulsed reaction gas replenish for etching semiconductors structures
Grant 7,771,606 - Kim , et al. August 10, 2 | 2010-08-10 |
Pulsed-plasma system for etching semiconductor structures
Grant 7,737,042 - Kim , et al. June 15, 2 | 2010-06-15 |
Dual plasma source process using a variable frequency capacitively coupled source to control plasma ion density
Grant 7,727,413 - Paterson , et al. June 1, 2 | 2010-06-01 |
Pulsed-plasma system with pulsed sample bias for etching semiconductor substrates
Grant 7,718,538 - Kim , et al. May 18, 2 | 2010-05-18 |
Plasma process for inductively coupling power through a gas distribution plate while adjusting plasma distribution
Grant 7,674,394 - Paterson , et al. March 9, 2 | 2010-03-09 |
Plasma reactor apparatus with a VHF capacitively coupled plasma source of variable frequency
Grant 7,645,357 - Paterson , et al. January 12, 2 | 2010-01-12 |
Method And Apparatus For Controlling Gas Injection In Process Chamber
App 20090236447 - PANAGOPOULOS; THEODOROS ; et al. | 2009-09-24 |
Plasma generation and control using dual frequency RF signals
Grant 7,510,665 - Shannon , et al. March 31, 2 | 2009-03-31 |
Trajectory Based Control Of Plasma Processing
App 20090061544 - HOLLAND; JOHN P. ; et al. | 2009-03-05 |
Plasma Reactor With An Overhead Inductive Antenna And An Overhead Gas Distribution Showerhead
App 20080236490 - PATERSON; ALEXANDER ; et al. | 2008-10-02 |
Plasma Species And Uniformity Control Through Pulsed Vhf Operation
App 20080230008 - Paterson; Alexander ; et al. | 2008-09-25 |
Pulsed-plasma System With Pulsed Reaction Gas Replenish For Etching Semiconductor Structures
App 20080206901 - KIM; TAE WON ; et al. | 2008-08-28 |
Plasma Process For Inductively Coupling Power Through A Gas Distribution Plate While Adjusting Plasma Distribution
App 20080206483 - PATERSON; ALEXANDER ; et al. | 2008-08-28 |
Pulsed-plasma System For Etching Semiconductor Structures
App 20080206900 - KIM; TAE WON ; et al. | 2008-08-28 |
Pulsed-plasma System With Pulsed Sample Bias For Etching Semiconductor Substrates
App 20080197110 - Kim; Tae Won ; et al. | 2008-08-21 |
Mask etch plasma reactor with backside optical sensors and multiple frequency control of etch distribution
App 20080099450 - Lewington; Richard ; et al. | 2008-05-01 |
Alternating Asymmetrical Plasma Generation In A Process Chamber
App 20080023443 - Paterson; Alexander ; et al. | 2008-01-31 |
High Ac Current High Rf Power Ac-rf Decoupling Filter For Plasma Reactor Heated Electrostatic Chuck
App 20070284344 - Todorov; Valentin N. ; et al. | 2007-12-13 |
Apparatus For Etching High Aspect Ratio Features
App 20070256785 - Pamarthy; Sharma ; et al. | 2007-11-08 |
Dual plasma source process using a variable frequency capacitively coupled source for controlling plasma ion dissociation
App 20070245961 - Paterson; Alexander ; et al. | 2007-10-25 |
Plasma reactor apparatus with a toroidal plasma source and a VHF capacitively coupled plasma source with variable frequency
App 20070246161 - Paterson; Alexander ; et al. | 2007-10-25 |
Plasma reactor apparatus with independent capacitive and inductive plasma sources
App 20070246163 - Paterson; Alexander ; et al. | 2007-10-25 |
Process using combined capacitively and inductively coupled plasma process for controlling plasma ion dissociation
App 20070246443 - Paterson; Alexander ; et al. | 2007-10-25 |
Dual plasma source process using a variable frequency capacitively coupled source for controlling ion radial distribution
App 20070245958 - Paterson; Alexander ; et al. | 2007-10-25 |
Dual plasma source process using a variable frequency capacitively coupled source to control plasma ion density
App 20070245959 - Paterson; Alexander ; et al. | 2007-10-25 |
Process using combined capacitively and inductively coupled plasma sources for controlling plasma ion density
App 20070245960 - Paterson; Alexander ; et al. | 2007-10-25 |
Process using combined capacitively and inductively coupled plasma sources for controlling plasma ion radial distribution
App 20070247074 - Paterson; Alexander ; et al. | 2007-10-25 |
Plasma reactor apparatus with a VHF capacitively coupled plasma source of variable frequency
App 20070247073 - Paterson; Alexander ; et al. | 2007-10-25 |
Plasma reactor apparatus with an inductive plasma source and a VHF capacitively coupled plasma source with variable frequency
App 20070246162 - Paterson; Alexander ; et al. | 2007-10-25 |
Plasma reactor apparatus with independent capacitive and toroidal plasma sources
Grant 7,264,688 - Paterson , et al. September 4, 2 | 2007-09-04 |
Plasma Control Using Dual Cathode Frequency Mixing
App 20070000611 - Shannon; Steven C. ; et al. | 2007-01-04 |
Plasma generation and control using dual frequency RF signals
App 20060266735 - Shannon; Steven C. ; et al. | 2006-11-30 |
Tandem etch chamber plasma processing system
Grant 6,962,644 - Paterson , et al. November 8, 2 | 2005-11-08 |
Alternating asymmetrical plasma generation in a process chamber
App 20050241762 - Paterson, Alexander ; et al. | 2005-11-03 |
Plasma control using dual cathode frequency mixing
App 20050090118 - Shannon, Steven C. ; et al. | 2005-04-28 |
Adjustable dual frequency voltage dividing plasma reactor
Grant 6,706,138 - Barnes , et al. March 16, 2 | 2004-03-16 |
Tandem etch chamber plasma processing system
App 20030176074 - Paterson, Alexander ; et al. | 2003-09-18 |
Method for controlling etch uniformity
Grant 6,617,794 - Barnes , et al. September 9, 2 | 2003-09-09 |
Adjustable dual frequency voltage dividing plasma reactor
App 20030037881 - Barnes, Michael S. ; et al. | 2003-02-27 |
Method for controlling etch uniformity
App 20020041160 - Barnes, Michael ; et al. | 2002-04-11 |
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