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Systems and methods for suppressing parasitic plasma and reducing within-wafer non-uniformity
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Systems And Methods For Suppressing Parasitic Plasma And Reducing Within-wafer Non-uniformity
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Planar Substrate Edge Contact With Open Volume Equalization Pathways And Side Containment
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Integrated Showerhead With Thermal Control For Delivering Radical And Precursor Gas To A Downstream Chamber To Enable Remote Pla
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Systems and methods for suppressing parasitic plasma and reducing within-wafer non-uniformity
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Planar substrate edge contact with open volume equalization pathways and side containment
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Low volume showerhead with faceplate holes for improved flow uniformity
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Systems and methods enabling low defect processing via controlled separation and delivery of chemicals during atomic layer deposition
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Systems and methods for vapor delivery in a substrate processing system
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Planar Substrate Edge Contact With Open Volume Equalization Pathways And Side Containment
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Valve manifold deadleg elimination via reentrant flow path
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Systems And Methods For Suppressing Parasitic Plasma And Reducing Within-wafer Non-uniformity
App 20180068833 - Kang; Hu ; et al. | 2018-03-08 |
Systems and methods for reducing backside deposition and mitigating thickness changes at substrate edges
Grant 9,852,901 - Varadarajan , et al. December 26, 2 | 2017-12-26 |
Systems and methods for suppressing parasitic plasma and reducing within-wafer non-uniformity
Grant 9,793,096 - Kang , et al. October 17, 2 | 2017-10-17 |
Systems And Methods Enabling Low Defect Processing Via Controlled Separation And Delivery Of Chemicals During Atomic Layer Deposition
App 20170175269 - Chandrasekharan; Ramesh ; et al. | 2017-06-22 |
Systems and methods enabling low defect processing via controlled separation and delivery of chemicals during atomic layer deposition
Grant 9,631,276 - Chandrasekharan , et al. April 25, 2 | 2017-04-25 |
Methods and apparatuses for showerhead backside parasitic plasma suppression in a secondary purge enabled ALD system
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Systems And Methods Enabling Low Defect Processing Via Controlled Separation And Delivery Of Chemicals During Atomic Layer Deposition
App 20170016115 - Chandrasekharan; Ramesh ; et al. | 2017-01-19 |
Systems And Methods For Reducing Backside Deposition And Mitigating Thickness Changes At Substrate Edges
App 20160372318 - VARADARAJAN; Sesha ; et al. | 2016-12-22 |
Low Volume Showerhead With Faceplate Holes For Improved Flow Uniformity
App 20160340782 - Chandrasekharan; Ramesh ; et al. | 2016-11-24 |
Systems and methods for reducing backside deposition and mitigating thickness changes at substrate edges
Grant 9,460,915 - Varadarajan , et al. October 4, 2 | 2016-10-04 |
Valve Manifold Deadleg Elimination Via Reentrant Flow Path
App 20160147234 - Leeser; Karl ; et al. | 2016-05-26 |
Systems And Methods For Reducing Backside Deposition And Mitigatingthickness Changes At Substrate Edges
App 20160079057 - Varadarajan; Sesha ; et al. | 2016-03-17 |
Systems and Methods for Suppressing Parasitic Plasma and Reducing Within-Wafer Non-Uniformity
App 20160079036 - Kang; Hu ; et al. | 2016-03-17 |
Systems And Methods For Vapor Delivery
App 20160032453 - Qian; Jun ; et al. | 2016-02-04 |
Methods And Apparatuses For Showerhead Backside Parasitic Plasma Suppression In A Secondary Purge Enabled Ald System
App 20160035566 - LaVoie; Adrien ; et al. | 2016-02-04 |
High Pressure, High Power Plasma Activated Conformal Film Deposition
App 20140030444 - Swaminathan; Shankar ; et al. | 2014-01-30 |
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Grant 5,018,291 - Pasquale , et al. May 28, 1 | 1991-05-28 |
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