Park; You-Jung

Patent Applications and Registrations

Patent applications and USPTO patent grants for Park; You-Jung.The latest application filed is for "organic layer composition, organic layer, and method of forming patterns".

Company Profile

3.13.14

Park; You-Jung - Uiwang-si N/A KR
Park; You-Jung - Suwon-si KR

*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.

Patent Activity

Patent	Date
Monomer for hardmask composition and hardmask composition including the monomer and method of forming patterns using the hardmask composition Grant 10,345,706 - Song , et al. July 9, 2	2019-07-09
Monomer, organic layer composition, organic layer, and method of forming patterns Grant 10,332,751 - Choi , et al.	2019-06-25
Organic layer composition, organic layer, and method of forming patterns Grant 10,066,057 - Park , et al. September 4, 2	2018-09-04
Hardmask composition and method of forming patterns using the hardmask composition Grant 10,018,914 - Nam , et al. July 10, 2	2018-07-10
Organic layer composition, organic layer, and method of forming patterns Grant 9,908,990 - Kang , et al. March 6, 2	2018-03-06
Monomer, hardmask composition comprising monomer, and pattern forming method using hardmask composition Grant 9,823,566 - Yoon , et al. November 21, 2	2017-11-21
Hardmask composition, method of forming patterns using the hardmask composition and semiconductor integrated circuit device including the patterns Grant 9,665,003 - Choi , et al. May 30, 2	2017-05-30
Hard mask composition and method for forming pattern using same Grant 9,529,257 - Lee , et al. December 27, 2	2016-12-27
Monomer, hard mask composition comprising said monomer, and method for forming pattern using said hard mask composition Grant 9,513,546 - Park , et al. December 6, 2	2016-12-06
Organic Layer Composition, Organic Layer, And Method Of Forming Patterns App 20160304700 - KANG; Sun-Hae ; et al.	2016-10-20
Organic Layer Composition, Organic Layer, And Method Of Forming Patterns App 20160297932 - PARK; Yu-Shin ; et al.	2016-10-13
Monomer, Organic Layer Composition, Organic Layer, And Method Of Forming Patterns App 20160237306 - Choi; Yoo-Jeong ; et al.	2016-08-18
Monomer, Hardmask Composition Comprising Monomer, And Pattern Forming Method Using Hardmask Composition App 20150362837 - YOON; Yong-Woon ; et al.	2015-12-17
Hardmask Composition And Method Of Forming Patterns Using The Hardmask Composition App 20150332931 - NAM; Youn-Hee ; et al.	2015-11-19
Monomer, Hard Mask Composition Comprising Said Monomer, And Method For Forming Pattern Using Said Hard Mask Composition App 20150301448 - Park; You-Jung ; et al.	2015-10-22
Hard Mask Composition And Method For Forming Pattern Using Same App 20150205198 - Lee; Chul-Ho ; et al.	2015-07-23
Hardmask Composition, Method Of Forming Patterns Using The Hardmask Composition And Semiconductor Integrated Circuit Device Including The Patterns App 20150187566 - PARK; Yu-Shin ; et al.	2015-07-02
Monomer For Hardmask Composition And Hardmask Composition Including The Monomer And Method Of Forming Patterns Using The Hardmask Composition App 20150001178 - SONG; Hyun-Ji ; et al.	2015-01-01
Hardmask Composition, Method Of Forming Patterns Using The Hardmask Composition And Semiconductor Integrated Circuit Device Including The Patterns App 20150004531 - CHOI; Yoo-Jeong ; et al.	2015-01-01
Method for forming a dual damascene structure of a semiconductor device, and a semiconductor device therewith Grant 8,900,997 - Moon , et al. December 2, 2	2014-12-02
Method For Forming A Dual Damascene Structure Of A Semiconductor Device, And A Semiconductor Device Therewith App 20140175669 - MOON; Joon-Young ; et al.	2014-06-26

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