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Patent applications and USPTO patent grants for Park; Stephen K..The latest application filed is for "planarization of a polysilicon layer surface by chemical mechanical polish to improve lithography and silicide formation".
Patent | Date |
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Bit-line oxidation by removing ONO oxide prior to bit-line implant Grant 6,562,683 - Wang , et al. May 13, 2 | 2003-05-13 |
Process for fabricating high density memory cells using a polysilicon hard mask Grant 6,436,766 - Rangarajan , et al. August 20, 2 | 2002-08-20 |
Process for optimizing pocket implant profile by RTA implant annealing for a non-volatile semiconductor device Grant 6,410,388 - Kluth , et al. June 25, 2 | 2002-06-25 |
Planarization of a polysilicon layer surface by chemical mechanical polish to improve lithography and silicide formation App 20020072219 - Avanzino, Steven C. ;   et al. | 2002-06-13 |
Process for fabricating high density memory cells using a metallic hard mask Grant 6,399,446 - Rangarajan , et al. June 4, 2 | 2002-06-04 |
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