Park; Seok-Bong

Patent Applications and Registrations

Patent applications and USPTO patent grants for Park; Seok-Bong.The latest application filed is for "colored photosensitive resin composition and light shielding spacer prepared therefrom".

Company Profile

6.6.11

Park; Seok-Bong - Yongin KR
PARK; SEOK BONG - Gwangwon-do KR
Park; Seok-Bong - Gyeonggi-do KR
Park; Seok-Bong - Yongin-si KR
Park, Seok Bong - Yongin-City KR

*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.

Patent Activity

Patent	Date
Black photosensitive resin composition and black column spacer prepared therefrom Grant 10,884,335 - Jeong , et al. January 5, 2	2021-01-05
Method for preparing column spacer Grant 10,859,907 - Kim , et al. December 8, 2	2020-12-08
Colored Photosensitive Resin Composition And Light Shielding Spacer Prepared Therefrom App 20200299236 - Park; Seok-Bong ; et al.	2020-09-24
Photosensitive resin composition and cured film prepared therefrom Grant 10,656,520 - Jeon , et al.	2020-05-19
Colored photosensitive resin composition and light shielding spacer prepared therefrom Grant 10,534,261 - Jeon , et al. Ja	2020-01-14
Black Photosensitive Resin Composition And Black Column Spacer Prepared Therefrom App 20190018318 - Jeong; Hyung Gu ; et al.	2019-01-17
Photosensitive Resin Composition And Cured Film Prepared Therefrom App 20180373144 - Jeon; Hyung-Tak ; et al.	2018-12-27
Method For Preparing Column Spacer App 20180321535 - Kim; Yeonok ; et al.	2018-11-08
Colored Photosensitive Resin Composition And Light Shielding Spacer Prepared Therefrom App 20180305313 - Park; Seok-Bong ; et al.	2018-10-25
Colored Photosensitive Resin Composition And Light Shielding Spacer Prepared Therefrom App 20180120699 - Jeon; Hyung-Tak ; et al.	2018-05-03
High Strength Synthetic Bone For Bone Replacement For Increasing Ompressive Strength And Facilitating Blood Circulation, And Manufacturing Method Therefor App 20170065740 - PARK; KYEONG JUN ; et al.	2017-03-09
Resin solution and method of forming a protection layer Grant 7,528,188 - Park , et al. May 5, 2	2009-05-05
Composition for forming a polymer layer and method of forming a pattern using the same App 20060186086 - Kim; Myungsun ; et al.	2006-08-24
Photoresist composition, method of forming a photoresist pattern and method of forming a protection layer in a semiconductor device using the photoresist composition App 20060154176 - Park; Seok-Bong ; et al.	2006-07-13
Method of fabricating a semiconductor device having a photo-sensitive polyimide layer and a device fabricated in accordance with the method Grant 7,026,240 - Kim , et al. April 11, 2	2006-04-11
Resin solution and method of forming a protection layer App 20050085587 - Park, Seok Bong ; et al.	2005-04-21
Method of fabricating a semiconductor device having a photo-sensitive polyimide layer and a device fabricated in accordance with the method App 20050029631 - Kim, Jae-Hyun ; et al.	2005-02-10

uspto.report is an independent third-party trademark research tool that is not affiliated, endorsed, or sponsored by the United States Patent and Trademark Office (USPTO) or any other governmental organization. The information provided by uspto.report is based on publicly available data at the time of writing and is intended for informational purposes only.

While we strive to provide accurate and up-to-date information, we do not guarantee the accuracy, completeness, reliability, or suitability of the information displayed on this site. The use of this site is at your own risk. Any reliance you place on such information is therefore strictly at your own risk.

All official trademark data, including owner information, should be verified by visiting the official USPTO website at www.uspto.gov. This site is not intended to replace professional legal advice and should not be used as a substitute for consulting with a legal professional who is knowledgeable about trademark law.