Park; Kwang Han

Patent Applications and Registrations

Patent applications and USPTO patent grants for Park; Kwang Han.The latest application filed is for "cardo-based binder resin, photosensitive resin composition comprising same, black matrix, color filter, and display device".

Company Profile

2.9.8

Park; Kwang Han - Daejeon KR
Park; Kwang Han - Yuseong-gu KR
Park; Kwang-Han - Daejeon Metropolitan City KR

*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.

Patent Activity

Patent	Date
Cardo-based binder resin, photosensitive resin composition comprising same, black matrix, color filter, and display device Grant 11,130,838 - Lee , et al. September 28, 2	2021-09-28
Cardo-based Binder Resin, Photosensitive Resin Composition Comprising Same, Black Matrix, Color Filter, And Display Device App 20200181322 - LEE; Doyun ; et al.	2020-06-11
Photomask and method for manufacturing column spacer for color filter using the same Grant 10,642,150 - Seo , et al.	2020-05-05
Photomask And Method For Manufacturing Column Spacer For Color Filter Using The Same App 20170285459 - SEO; Dae Han ; et al.	2017-10-05
Photosensitive resin composition and touch panel or display device including bezel pattern prepared by using same Grant 9,470,975 - Choi , et al. October 18, 2	2016-10-18
Photosensitive resin composition, pattern formed using same and display panel comprising same Grant 9,341,946 - Park , et al. May 17, 2	2016-05-17
Photosensitive Resin Composition, Pattern Formed Using Same And Display Panel Comprising Same App 20150125789 - Park; Kwang Han ; et al.	2015-05-07
Photosensitive Resin Composition And Touch Panel Or Display Device Including Bezel Pattern Prepared By Using Same App 20150111009 - Choi; Dongchang ; et al.	2015-04-23
Alkali-soluble resin and negative-type photosensitive resin composition comprising the same Grant 8,951,713 - Kim , et al. February 10, 2	2015-02-10
Fluorene-based resin polymer and photo-sensitive resin composition comprising the same Grant 8,791,169 - Heo , et al. July 29, 2	2014-07-29
Alkali-soluble Resin And Negative-type Photosensitive Resin Composition Comprising The Same App 20130130176 - Kim; Han Soo ; et al.	2013-05-23
Photosensitive resin composition comprising a polymer prepared by using macromonomer as alkali soluble resin Grant 8,357,483 - Kim , et al. January 22, 2	2013-01-22
Fluorene-based Resin Polymer And Photo-sensitive Resin Composition Comprising The Same App 20120196949 - HEO; Yoon Hee ; et al.	2012-08-02
Alkali-soluble Resin And Negative-type Photosensitive Resin Composition Comprising The Same App 20100196824 - Kim; Han Soo ; et al.	2010-08-05
Photosensitive Resin Composition Comprising A Polymer Prepared By Using Macromonomer As Alkali Soluble Resin App 20100081089 - Kim; Han-Soo ; et al.	2010-04-01

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