Park; Kiejin
Patent Applications and Registrations
Patent applications and USPTO patent grants for Park; Kiejin.The latest application filed is for "method to deposit cvd ruthenium".
- Park; Kiejin - San Jose CA
| Patent | Date |
|---|---|
| Method to deposit CVD ruthenium Grant 9,938,622 - Ha , et al. April 10, 2 | 2018-04-10 |
| Method To Deposit Cvd Ruthenium App 20160160350 - HA; Tae Hong ; et al. | 2016-06-09 |
| Tungsten growth modulation by controlling surface composition Grant 9,169,556 - Wu , et al. October 27, 2 | 2015-10-27 |
| Low temperature high pressure high H.sub.2/WF.sub.6 ratio W process for 3D NAND application Grant 8,900,999 - Wu , et al. December 2, 2 | 2014-12-02 |
| Method To Deposit Cvd Ruthenium App 20140134351 - Ha; Tae Hong ; et al. | 2014-05-15 |
| Tungsten Growth Modulation By Controlling Surface Composition App 20140106083 - WU; KAI ; et al. | 2014-04-17 |
| High density plasma etchback process for advanced metallization applications Grant 8,431,033 - Zhou , et al. April 30, 2 | 2013-04-30 |
| High Density Plasma Etchback Process For Advanced Metallization Applications App 20120152896 - Zhou; Chunming ; et al. | 2012-06-21 |
uspto.report is an independent third-party trademark research tool that is not affiliated, endorsed, or sponsored by the United States Patent and Trademark Office (USPTO) or any other governmental organization. The information provided by uspto.report is based on publicly available data at the time of writing and is intended for informational purposes only.
While we strive to provide accurate and up-to-date information, we do not guarantee the accuracy, completeness, reliability, or suitability of the information displayed on this site. The use of this site is at your own risk. Any reliance you place on such information is therefore strictly at your own risk.
All official trademark data, including owner information, should be verified by visiting the official USPTO website at www.uspto.gov. This site is not intended to replace professional legal advice and should not be used as a substitute for consulting with a legal professional who is knowledgeable about trademark law.
| 