Park; Jong-Rak

Patent Applications and Registrations

Patent applications and USPTO patent grants for Park; Jong-Rak.The latest application filed is for "somatic sensation induction system using pulse laser and medium of high absorption coefficient".

Company Profile

0.7.6

Park; Jong-Rak - Gwangju KR
Park; Jong-Rak - Chungju KR
Park; Jong-Rak - Cheongju KR
Park, Jong-Rak - Chungju-City KR
Park, Jong-Rak - Cheongju-city KR
Park; Jong Rak - Taejon KR

*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.

Patent Activity

Patent	Date
Somatic sensation induction system using pulse laser and medium of high absorption coefficient Grant 10,058,712 - Chung , et al. August 28, 2	2018-08-28
Somatic Sensation Induction System Using Pulse Laser And Medium Of High Absorption Coefficient App 20160367835 - CHUNG; Soon-Cheol ; et al.	2016-12-22
Photobioreactor for microalgae cultivation having arc-type partition structure for forming vortices Grant 9,523,069 - Jeong , et al. December 20, 2	2016-12-20
Laser apparatus capable of controlling a photo-mechanical effect and method using the same Grant 9,092,955 - Chung , et al. July 28, 2	2015-07-28
Photobioreactor For Microalgae Cultivation Having Arc-type Partition Structure For Forming Vortices App 20150175946 - Jeong; Sang Hwa ; et al.	2015-06-25
Laser Apparatus Capable Of Controlling A Photo-mechanical Effect And Method Using The Same App 20140285328 - CHUNG; Soon Cheol ; et al.	2014-09-25
Photomask having a transparency-adjusting layer, method of manufacturing the photomask, and exposure method using the photomask Grant 7,001,697 - Park , et al. February 21, 2	2006-02-21
Method of designing phase grating pattern for use in modifying illumination in an exposure process, and method of manufacturing a photo mask system having the phase grating pattern Grant 6,933,083 - Park August 23, 2	2005-08-23
Method of designing phase grating pattern providing modified illumination optimum for producing a target pattern and method of manufacturing a photo mask system comprising the phase grating pattern Grant 6,911,286 - Kang , et al. June 28, 2	2005-06-28
Photomask having a transparency-adjusting layer, method of manufacturing the photomask, and exposure method using the photomask App 20040067422 - Park, Jong-Rak ; et al.	2004-04-08
Method of designing phase grating pattern providing modified illumination optimum for producing a target pattern and method of manufacturing a photo mask system comprising the phase grating pattern App 20040013950 - Kang, Young-Seog ; et al.	2004-01-22
Method of designing phase grating pattern for use in modifying illumination in an exposure process, and method of manufacturing a photo mask system having the phase grating pattern App 20030235766 - Park, Jong-Rak	2003-12-25
Unidirectionally operating laser apparatus using semimonolithic ring cavity Grant 6,064,684 - Yoon , et al. May 16, 2	2000-05-16

uspto.report is an independent third-party trademark research tool that is not affiliated, endorsed, or sponsored by the United States Patent and Trademark Office (USPTO) or any other governmental organization. The information provided by uspto.report is based on publicly available data at the time of writing and is intended for informational purposes only.

While we strive to provide accurate and up-to-date information, we do not guarantee the accuracy, completeness, reliability, or suitability of the information displayed on this site. The use of this site is at your own risk. Any reliance you place on such information is therefore strictly at your own risk.

All official trademark data, including owner information, should be verified by visiting the official USPTO website at www.uspto.gov. This site is not intended to replace professional legal advice and should not be used as a substitute for consulting with a legal professional who is knowledgeable about trademark law.