| Patent | Date |
|---|
Semiconductor devices including enlarged contact hole and methods of forming the same
Grant 11,329,053 - Son , et al. May 10, 2 | 2022-05-10 |
Semiconductor Devices Including Enlarged Contact Hole And Methods Of Forming The Same
App 20210134809 - Son; Yoon Ho ; et al. | 2021-05-06 |
Semiconductor devices including enlarged contact hole and methods of forming the same
Grant 10,916,549 - Son , et al. February 9, 2 | 2021-02-09 |
Semiconductor Devices Including Enlarged Contact Hole And Methods Of Forming The Same
App 20200013782 - SON; Yoon Ho ; et al. | 2020-01-09 |
Semiconductor devices including enlarged contact hole and methods of forming the same
Grant 10,418,366 - Son , et al. Sept | 2019-09-17 |
Semiconductor Devices Including Enlarged Contact Hole And Methods Of Forming The Same
App 20180342521 - Son; Yoon Ho ; et al. | 2018-11-29 |
Integrated circuit capacitors having sidewall supports
Grant 8,766,343 - Kang , et al. July 1, 2 | 2014-07-01 |
Integrated Circuit Capacitors Having Sidewall Supports
App 20120112317 - Kang; Dae-Hyuk ; et al. | 2012-05-10 |
Methods Of Forming A Capacitor Structure And Methods Of Manufacturing Semiconductor Devices Using The Same
App 20120064680 - Oh; Jung-Min ; et al. | 2012-03-15 |
Methods of forming integrated circuit capacitors having sidewall supports and capacitors formed thereby
Grant 8,119,476 - Kang , et al. February 21, 2 | 2012-02-21 |
Methods of Manufacturing Semiconductor Devices
App 20110306197 - Kim; Young-Hoo ; et al. | 2011-12-15 |
Methods of fabricating a semiconductor device using a dilute aqueous solution of an ammonia and peroxide mixture
Grant 8,058,180 - Kwon , et al. November 15, 2 | 2011-11-15 |
Semiconductor device having capacitor
Grant 7,985,999 - Oh , et al. July 26, 2 | 2011-07-26 |
Methods of Forming Integrated Circuit Capacitors Having Sidewall Supports and Capacitors Formed Thereby
App 20110159660 - Kang; Dae-Hyuk ; et al. | 2011-06-30 |
Semiconductor device having capacitor and method of fabricating the same
Grant 7,820,508 - Oh , et al. October 26, 2 | 2010-10-26 |
Semiconductor device having capacitor and method of fabricating the same
App 20100187654 - Oh; Jung-Min ; et al. | 2010-07-29 |
Method of removing oxide layer and semiconductor manufacturing apparatus for removing oxide layer
Grant 7,488,688 - Chung , et al. February 10, 2 | 2009-02-10 |
Methods Of Fabricating A Semiconductor Device Using A Dilute Aqueous Solution Of An Ammonia And Peroxide Mixture
App 20080194110 - Kwon; Doo-Won ; et al. | 2008-08-14 |
Methods of fabricating a semiconductor device using a dilute aqueous solution of an ammonia and peroxide mixture
Grant 7,354,868 - Kwon , et al. April 8, 2 | 2008-04-08 |
Method For Fabricating A Semiconductor Device Having A Capacitor
App 20080044971 - KANG; Dae-Hyuk ; et al. | 2008-02-21 |
Apparatus for cleaning semiconductor wafer including heating using a light source and method for cleaning wafer using the same
Grant 7,237,561 - Park , et al. July 3, 2 | 2007-07-03 |
Semiconductor device having capacitor and method of fabricating the same
App 20070111432 - Oh; Jung-Min ; et al. | 2007-05-17 |
Cleaning solution for removing damaged portion of ferroelectric layer and cleaning method using the same
Grant 7,135,413 - Lee , et al. November 14, 2 | 2006-11-14 |
Cleaning solution and method of forming a metal pattern for a semiconductor device using the same
App 20060228890 - Lee; Hyo-san ; et al. | 2006-10-12 |
Methods of fabricating a semiconductor device using a dilute aqueous solution of an ammonia and peroxide mixture
App 20050260830 - Kwon, Doo-Won ; et al. | 2005-11-24 |
Method of removing oxide layer and semiconductor manufacturing apparatus for removing oxide layer
App 20050087893 - Chung, Seung-pil ; et al. | 2005-04-28 |
Apparatus for cleaning semiconductor wafer and method for cleaning wafer using the same
App 20040173236 - Park, Im-soo ; et al. | 2004-09-09 |
Cleaning solution for removing damaged portion of ferroelectric layer and cleaning method using the same
App 20040112870 - Lee, Kwang-Wook ; et al. | 2004-06-17 |
Apparatus for cleaning semiconductor wafer and method for cleaning wafer using the same
Grant 6,712,078 - Park , et al. March 30, 2 | 2004-03-30 |
Wet Process For Semiconductor Device Fabrication Using Anode Water Containing Oxidative Substances And Cathode Water Containing Reductive Substances, And Anode Water And Cathode Water Used In The Wet Process
Grant 6,565,736 - Park , et al. May 20, 2 | 2003-05-20 |
Method of and system for cleaning a semiconductor wafer simultaneously using electrolytically ionized water and diluted hydrofluoric acid
App 20030062068 - Ko, Hyung-Ho ; et al. | 2003-04-03 |
Apparatus for cleaning semiconductor wafer and method for cleaning wafer using the same
App 20020092542 - Park, Im-Soo ; et al. | 2002-07-18 |
Wet process for semiconductor device fabrication using anode water containing oxidative substances and cathode water containing reductive substances, and anode water and cathode water used in the wet process
App 20020027084 - Park, Im-Soo ; et al. | 2002-03-07 |
Cleaning solution for removing damaged portion of ferroelectric layer and cleaning method using the same
App 20020003123 - Lee, Kwang-wook ; et al. | 2002-01-10 |
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