PARK; Hyeon Woo

Patent Applications and Registrations

Patent applications and USPTO patent grants for PARK; Hyeon Woo.The latest application filed is for "silicon nitride film etching composition and etching method using the same".

Company Profile

6.4.8

PARK; Hyeon Woo - Yongin-si KR
Park; Hyeon-Woo - Daejeon-City KR

*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.

Patent Activity

Patent	Date
Silicon Nitride Film Etching Composition And Etching Method Using The Same App 20220089951 - KIM; Dong Hyun ; et al.	2022-03-24
Silicon Nitride Film Etching Composition And Etching Method Using The Same App 20220089953 - KIM; Dong Hyun ; et al.	2022-03-24
Silicon Nitride Film Etching Composition And Etching Method Using The Same App 20220089952 - KIM; Dong Hyun ; et al.	2022-03-24
Silicon nitride layer etching composition Grant 11,149,201 - Kim , et al. October 19, 2	2021-10-19
Etching composition and etching method using the same Grant 11,091,695 - Lee , et al. August 17, 2	2021-08-17
Silicon nitride layer etching composition and etching method using the same Grant 10,982,144 - Kim , et al. April 20, 2	2021-04-20
Polysiloxane-based compound, silicon nitride layer etching composition including the same Grant 10,920,142 - Kim , et al. February 16, 2	2021-02-16
Etching Composition And Etching Method Using The Same App 20200339879 - LEE; Hye Hee ; et al.	2020-10-29
Silicon Nitride Layer Etching Composition And Etching Method Using The Same App 20200071614 - KIM; Dong Hyun ; et al.	2020-03-05
Silicon Nitride Layer Etching Composition App 20190390110 - KIM; Dong Hyun ; et al.	2019-12-26
Polysiloxane-based Compound, Silicon Nitride Layer Etching Composition Including The Same App 20190382659 - KIM; Dong Hyun ; et al.	2019-12-19
Iontophoresis device App 20100191171 - Park; Hyeon-Woo	2010-07-29

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