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Patent applications and USPTO patent grants for PARK; Hee Kwan.The latest application filed is for "alkali soluble resin polymer and negative-type photosensitive resin composition including the same".
Patent | Date |
---|---|
Alkali Soluble Resin Polymer And Negative-type Photosensitive Resin Composition Including The Same App 20120004341 - KIM; Han Soo ;   et al. | 2012-01-05 |
Photosensitive composition comprising triazine-based photoactive compound containing oxime ester Grant 7,556,910 - Kim , et al. July 7, 2 | 2009-07-07 |
Method for patterning coatings App 20070178237 - Shin; Dong Myung ;   et al. | 2007-08-02 |
Photosensitive composition comprising triazine-based photoactive compound containing oxime ester App 20070128548 - Kim; Sung Hyun ;   et al. | 2007-06-07 |
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