Pant; Anil K.

Patent Applications and Registrations

Patent applications and USPTO patent grants for Pant; Anil K..The latest application filed is for "integrated pad and belt for chemical mechanical polishing".

Company Profile

0.12.4

Pant; Anil K. - Santa Clara CA
Pant, Anil K. - Santa Cruz CA

*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.

Patent Activity

Patent	Date
Fabrication of an ion exchange polish pad Grant 6,905,526 - Dabral , et al. June 14, 2	2005-06-14
Integrated pad and belt for chemical mechanical polishing App 20050118936 - Pant, Anil K. ; et al.	2005-06-02
Chemical mechanical planarization method and apparatus for improved process uniformity, reduced topography and reduced defects App 20040235398 - Thornton, Brian S. ; et al.	2004-11-25
Method and apparatus to recondition an ion exchange polish pad Grant 6,773,337 - Dabral , et al. August 10, 2	2004-08-10
Method and apparatus for electrodialytic chemical mechanical polishing and deposition Grant 6,722,950 - Dabral , et al. April 20, 2	2004-04-20
Integrated pad and belt for chemical mechanical polishing Grant 6,656,025 - Pant , et al. December 2, 2	2003-12-02
System and method for creating and navigating a linear hypermedia resource program App 20020031988 - Pant, Anil K. ; et al.	2002-03-14
Integrated pad and belt for chemical mechanical polishing Grant 6,328,642 - Pant , et al. December 11, 2	2001-12-11
Use of zeta potential during chemical mechanical polishing for end point detection Grant 6,325,706 - Krusell , et al. December 4, 2	2001-12-04
Method and apparatus for polishing semiconductor wafers App 20010036792 - Ferri, Edward T. JR. ; et al.	2001-11-01
Method and apparatus for stabilizing the process temperature during chemical mechanical polishing Grant 6,224,461 - Boehm, Jr. , et al. May 1, 2	2001-05-01
Apparatus and method for performing end point detection on a linear planarization tool Grant 6,186,865 - Thornton , et al. February 13, 2	2001-02-13
Control of chemical-mechanical polishing rate across a substrate surface for a linear polisher Grant 5,916,012 - Pant , et al. June 29, 1	1999-06-29
Method and apparatus for aligning and tensioning a pad/belt used in linear planarization for chemical mechanical polishing Grant 5,871,390 - Pant , et al. February 16, 1	1999-02-16
Control of chemical-mechanical polishing rate across a substrate surface Grant 5,800,248 - Pant , et al. September 1, 1	1998-09-01
Sensors for a linear polisher Grant 5,762,536 - Pant , et al. June 9, 1	1998-06-09

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