Pang; Ben
Patent Applications and Registrations
Patent applications and USPTO patent grants for Pang; Ben.The latest application filed is for "method and apparatus for cleaning a vacuum line in a cvd system".
- Pang; Ben - Oakland CA
| Patent | Date |
|---|---|
| Method and apparatus for cleaning an exhaust line in a semiconductor processing system Grant 6,689,930 - Pang , et al. February 10, 2 | 2004-02-10 |
| Apparatus for cleaning an exhaust line in a semiconductor processing system Grant 6,680,420 - Pang , et al. January 20, 2 | 2004-01-20 |
| Method and apparatus for cleaning a vacuum line in a CVD system App 20010016674 - Pang, Ben ; et al. | 2001-08-23 |
| Method and apparatus for cleaning a vacuum line in a CVD system Grant 6,194,628 - Pang , et al. February 27, 2 | 2001-02-27 |
| Parallel plate apparatus for in-situ vacuum line cleaning for substrate processing equipment Grant 6,193,802 - Pang , et al. February 27, 2 | 2001-02-27 |
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