| Patent | Date |
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Method And System For Inspecting An Euv Mask
App 20210172891 - Weng; Guochong ; et al. | 2021-06-10 |
Method and system for inspecting an EUV mask
Grant 10,775,325 - Weng , et al. Sept | 2020-09-15 |
Method And System For Inspecting An Euv Mask
App 20190170671 - WENG; Guochong ; et al. | 2019-06-06 |
Method and system for inspecting an EUV mask
Grant 10,088,438 - Weng , et al. October 2, 2 | 2018-10-02 |
Structure electron beam inspection system for inspecting extreme ultraviolet mask and structure for discharging extreme ultraviolet mask
Grant 10,054,556 - Wang , et al. August 21, 2 | 2018-08-21 |
Method and system for inspecting and grounding an EUV mask
Grant 9,859,089 - Weng , et al. January 2, 2 | 2018-01-02 |
Method And System For Inspecting An Euv Mask
App 20170052129 - Weng; Guochong ; et al. | 2017-02-23 |
Structure Electron Beam Inspection System For Inspecting Extreme Ultraviolet Mask And Structure For Discharging Extreme Ultraviolet Mask
App 20170053774 - WANG; You-Jin ; et al. | 2017-02-23 |
Structure electron beam inspection system for inspecting extreme ultraviolet mask and structure for discharging extreme ultraviolet mask
Grant 9,572,237 - Wang , et al. February 14, 2 | 2017-02-14 |
Discharging method for charged particle beam imaging
Grant 9,460,887 - Wang , et al. October 4, 2 | 2016-10-04 |
Method and System for Inspecting an EUV Mask
App 20150325402 - Weng; Guochong ; et al. | 2015-11-12 |
Structure Electron Beam Inspection System For Inspecting Extreme Ultraviolet Mask And Structure For Discharging Extreme Ultraviolet Mask
App 20150305131 - WANG; You-Jin ; et al. | 2015-10-22 |
Reticle operation system
Grant 9,164,399 - Wang , et al. October 20, 2 | 2015-10-20 |
Structure electron beam inspection system for inspecting extreme ultraviolet mask and structure for discharging extreme ultraviolet mask
Grant 9,113,538 - Wang , et al. August 18, 2 | 2015-08-18 |
Method And System For Inspecting An Euv Mask
App 20150102220 - Weng; Guoching ; et al. | 2015-04-16 |
Structure For Discharging Extreme Ultraviolet Mask
App 20140027634 - WANG; You-Jin ; et al. | 2014-01-30 |
Method of controlling particle absorption on a wafer sample being inspected by a charged particle beam imaging system
Grant 8,604,428 - Wang , et al. December 10, 2 | 2013-12-10 |
Structure for discharging extreme ultraviolet mask
Grant 8,575,573 - Wang , et al. November 5, 2 | 2013-11-05 |
Charged particle system for reticle/wafer defects inspection and review
Grant 8,519,333 - Kuan , et al. August 27, 2 | 2013-08-27 |
Reticle Operation System
App 20130176549 - Wang; Youjin ; et al. | 2013-07-11 |
Structure For Discharging Extreme Ultraviolet Mask
App 20120292509 - WANG; You-Jin ; et al. | 2012-11-22 |
Charged Particle System For Reticle / Wafer Defects Inspection And Review
App 20120280125 - KUAN; CHIYAN ; et al. | 2012-11-08 |
Method of controlling particle absorption on a wafer sample being inspected by a charged particle beam imaging system
Grant 8,110,818 - Wang , et al. February 7, 2 | 2012-02-07 |
Method Of Controlling Particle Absorption On A Wafer Sample Being Inspected By A Charged Particle Beam Imaging System
App 20120006984 - WANG; You-Jin ; et al. | 2012-01-12 |
E-beam defect review system
Grant 8,094,924 - Jau , et al. January 10, 2 | 2012-01-10 |
Z-stage configuration and application thereof
Grant 8,031,344 - Wang , et al. October 4, 2 | 2011-10-04 |
Z-stage Configuration And Application Thereof
App 20110101222 - WANG; YOU-JIN ; et al. | 2011-05-05 |
Method and handling apparatus for placing patterning device on support member for charged particle beam imaging
Grant 7,868,303 - Wang , et al. January 11, 2 | 2011-01-11 |
Patterning device holding apparatus and application thereof
Grant 7,838,848 - Huang , et al. November 23, 2 | 2010-11-23 |
Dischaging Method For Charged Particle Beam Imaging
App 20100288923 - Wang; You-Jin ; et al. | 2010-11-18 |
E-beam Defect Review System
App 20100150429 - JAU; Jack ; et al. | 2010-06-17 |
Patterning Device Holding Apparatus And Application Thereof
App 20100102226 - HUANG; Hsuan-Bin ; et al. | 2010-04-29 |
Method And Handling Apparatus For Placing Patterning Device On Support Member For Charged Particle Beam Imaging
App 20100090107 - WANG; You-Jin ; et al. | 2010-04-15 |
Method Of Controlling Particle Absorption On A Wafer Sample Being Inspected By A Charged Particle Beam Imaging System
App 20100084554 - Wang; You-Jin ; et al. | 2010-04-08 |
Cluster E-beam Lithography System
App 20090121159 - HWANG; ARCHI ; et al. | 2009-05-14 |
Method and system of using a scanning electron microscope in semiconductor wafer inspection with Z-stage focus
Grant 6,791,095 - Pan , et al. September 14, 2 | 2004-09-14 |
Method and system of using a scanning electron microscope in semiconductor wafer inspection with Z-stage focus
App 20030178576 - Pan, Chung-Shih ; et al. | 2003-09-25 |
Electron beam inspection system and method
Grant 5,502,306 - Meisburger , et al. March 26, 1 | 1996-03-26 |
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