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Composition of spin-on materials containing metal oxide nanoparticles and an organic polymer
Grant 11,421,128 - Rahman , et al. August 23, 2 | 2022-08-23 |
Aromatic amino siloxane functionalized materials for use in capping porous dielectrics
Grant 11,031,237 - Bobade , et al. June 8, 2 | 2021-06-08 |
Aromatic Amino Siloxane Functionalized Materials For Use In Capping Porous Dielectrics
App 20200273701 - BOBADE; Sachin ; et al. | 2020-08-27 |
Composition Of Spin-on Materials Containing Metal Oxide Nanoparticles And An Organic Polymer
App 20200087534 - RAHMAN; M. Dalil ; et al. | 2020-03-19 |
Polyoxometalate and heteropolyoxometalate compositions and methods for their use
Grant 9,418,836 - Chada , et al. August 16, 2 | 2016-08-16 |
Spin coatable metallic hard mask compositions and processes thereof
Grant 9,409,793 - Chada , et al. August 9, 2 | 2016-08-09 |
Stable metal compounds, their compositions and methods
Grant 9,315,636 - Yao , et al. April 19, 2 | 2016-04-19 |
Stable metal compounds as hardmasks and filling materials, their compositions and methods of use
Grant 9,296,922 - Yao , et al. March 29, 2 | 2016-03-29 |
Antireflective coating compositions and processes thereof
Grant 9,274,426 - Rahman , et al. March 1, 2 | 2016-03-01 |
Antireflective Coating Compositions And Processes Thereof
App 20150309403 - RAHMAN; M. Dalil ; et al. | 2015-10-29 |
Antireflective Coating Compositions And Processes Thereof
App 20150309410 - RAHMAN; M. Dalil ; et al. | 2015-10-29 |
Spin Coatable Metallic Hard Mask Compositions And Processes Thereof
App 20150200090 - CHADA; Venkata Gopal Reddy ; et al. | 2015-07-16 |
Polyoxometalate And Heteropolyoxometalate Compositions And Methods For Their Use
App 20150200091 - CHADA; Venkata Gopal Reddy ; et al. | 2015-07-16 |
Stable Metal Compounds As Hardmasks And Filling Materials, Their Compositions And Methods Of Use
App 20150064904 - YAO; Huirong ; et al. | 2015-03-05 |
Developable bottom anti-reflective coating
Grant 8,900,797 - Nakasugi , et al. December 2, 2 | 2014-12-02 |
Superfine pattern mask, method for production thereof, and method employing the same for forming superfine pattern
Grant 8,796,398 - Padmanaban , et al. August 5, 2 | 2014-08-05 |
Composition For Forming A Developable Bottom Antireflective Coating
App 20140193753 - NAKASUGI; Shigemasa ; et al. | 2014-07-10 |
Stable Metal Compounds, Their Compositions And Methods
App 20140159278 - YAO; Huirong ; et al. | 2014-06-12 |
Composition for forming a developable bottom antireflective coating
Grant 8,697,336 - Nakasugi , et al. April 15, 2 | 2014-04-15 |
Developable Bottom Anti-reflective Coating
App 20140087311 - NAKASUGI; Shigemasa ; et al. | 2014-03-27 |
Positive-working photoimageable bottom antireflective coating
Grant 8,632,948 - Padmanaban , et al. January 21, 2 | 2014-01-21 |
Bottom antireflective coating compositions and processes thereof
Grant 8,623,589 - Kudo , et al. January 7, 2 | 2014-01-07 |
Composition For Forming A Developable Bottom Antireflective Coating
App 20130157196 - Nakasugi; Shigemasa ; et al. | 2013-06-20 |
Bottom Antireflective Coating Compositions And Processes Thereof
App 20120308939 - Kudo; Takanori ; et al. | 2012-12-06 |
Photoresist compositions
Grant 8,252,503 - Chakrapani , et al. August 28, 2 | 2012-08-28 |
Superfine Pattern Mask, Method for Production Thereof, and Method Employing the Same for forming Superfine Pattern
App 20120160801 - Padmanaban; Munirathna ; et al. | 2012-06-28 |
Underlayer Developable Coating Compositions and Processes Thereof
App 20120122029 - Kudo; Takanori ; et al. | 2012-05-17 |
Edge Bead Remover For Coatings
App 20120108067 - Neisser; Mark O. ; et al. | 2012-05-03 |
Positive-Working Photoimageable Bottom Antireflective Coating
App 20110086312 - Dammel; Ralph R. ; et al. | 2011-04-14 |
Positive-Working Photoimageable Bottom Antireflective Coating
App 20110076626 - Padmanaban; Munirathna ; et al. | 2011-03-31 |
Photoactive compounds
Grant 7,833,693 - Rahman , et al. November 16, 2 | 2010-11-16 |
Photosensitive Composition
App 20100136477 - Ng; Edward W. ; et al. | 2010-06-03 |
Photoactive compounds
Grant 7,678,528 - Rahman , et al. March 16, 2 | 2010-03-16 |
Photoresist Image-Forming Process Using Double Patterning
App 20090253080 - Dammel; Ralph R. ; et al. | 2009-10-08 |
Composition for coating over a photoresist pattern
Grant 7,595,141 - Kudo , et al. September 29, 2 | 2009-09-29 |
Photoresist composition for deep UV and process thereof
Grant 7,537,879 - Houlihan , et al. May 26, 2 | 2009-05-26 |
Photoactive compounds
Grant 7,521,170 - Rahman , et al. April 21, 2 | 2009-04-21 |
Photoactive Compounds
App 20090087782 - Rahman; M. Dalil ; et al. | 2009-04-02 |
Photoresist Compositions
App 20090053652 - Chakrapani; Srinivasan ; et al. | 2009-02-26 |
Photoactive compounds
Grant 7,491,482 - Padmanaban , et al. February 17, 2 | 2009-02-17 |
Photoresist Composition for Deep UV and Process Thereof
App 20090042148 - Padmanaban; Munirathna ; et al. | 2009-02-12 |
Photoactive Compounds
App 20080187868 - Padmanaban; Munirathna ; et al. | 2008-08-07 |
Polymers Useful in Photoresist Compositions and Compositions Thereof
App 20080171270 - Padmanaban; Munirathna ; et al. | 2008-07-17 |
Photoactive Compounds
App 20080131811 - Padmanaban; Munirathna ; et al. | 2008-06-05 |
Process For Producing Film Forming Resins For Photoresist Compositions
App 20080035556 - Padmanaban; Munirathna ; et al. | 2008-02-14 |
Photoactive compounds
App 20070111138 - Rahman; M. Dalil ; et al. | 2007-05-17 |
Photoactive compounds
App 20070015084 - Rahman; M. Dalil ; et al. | 2007-01-18 |
Photoresist compositions
Grant 7,122,291 - Padmanaban , et al. October 17, 2 | 2006-10-17 |
Photoresist composition for deep UV and process thereof
App 20060110677 - Houlihan; Francis M. ; et al. | 2006-05-25 |
Process for producing film forming resins for photoresist compositions
App 20060102554 - Padmanaban; Munirathna ; et al. | 2006-05-18 |
Composition for coating over a photoresist pattern
App 20060088788 - Kudo; Takanori ; et al. | 2006-04-27 |
Photoresist compositions
App 20060024610 - Padmanaban; Munirathna ; et al. | 2006-02-02 |
Photoresist composition for deep ultraviolet lithography comprising a mixture of photoactive compounds
Grant 6,991,888 - Padmanaban , et al. January 31, 2 | 2006-01-31 |
Photoactive compounds
App 20050271974 - Rahman, M. Dalil ; et al. | 2005-12-08 |
Composition for anti-reflective coating or radiation absorbing coating and compounds used in the composition
Grant 6,803,168 - Padmanaban , et al. October 12, 2 | 2004-10-12 |
Negative deep ultraviolet photoresist
Grant 6,800,416 - Kudo , et al. October 5, 2 | 2004-10-05 |
Radiation absorbing polymer, composition for radiation absorbing coating, radiation absorbing coating and application thereof as anti-reflective coating
Grant 6,737,492 - Kang , et al. May 18, 2 | 2004-05-18 |
Photoresist composition for deep UV radiation containing an additive
Grant 6,723,488 - Kudo , et al. April 20, 2 | 2004-04-20 |
Photoresist composition for deep ultraviolet lithography comprising a mixture of photoactive compounds
App 20030235782 - Padmanaban, Munirathna ; et al. | 2003-12-25 |
Photoresist composition for deep ultraviolet lithography comprising a mixture of photoactive compounds
App 20030235775 - Padmanaban, Munirathna ; et al. | 2003-12-25 |
Process for producing film forming resins for photoresist compositions
Grant 6,610,465 - Rahman , et al. August 26, 2 | 2003-08-26 |
Negative deep ultraviolet photoresist
App 20030129527 - Kudo, Takanori ; et al. | 2003-07-10 |
Photoresist composition for deep UV radiation containing an additive
App 20030087180 - Kudo, Takanori ; et al. | 2003-05-08 |
Radiation absorbing polymer, composition for radiation absorbing coating, radiation absorbing coating and application thereof as anti-reflective coating
App 20030065119 - Kang, Wen-Bing ; et al. | 2003-04-03 |
Process for producing film forming resins for photoresist compositions
App 20020197555 - Rahman, M. Dalil ; et al. | 2002-12-26 |
Radiation absorbing polymer, composition for radiation absorbing coating, radiation absorbing coating and application thereof as anti-reflective coating
Grant 6,468,718 - Kang , et al. October 22, 2 | 2002-10-22 |
Photoresist composition for deep UV radiation
Grant 6,365,322 - Padmanaban , et al. April 2, 2 | 2002-04-02 |
Antireflection or light-absorbing coating composition and polymer therefor
Grant 6,329,117 - Padmanaban , et al. December 11, 2 | 2001-12-11 |
Acid-labile group protected hydroxystyrene polymers or copolymers thereof and their application to radiation sensitive materials
Grant 5,852,128 - Padmanaban , et al. December 22, 1 | 1998-12-22 |
Radiation-sensitive mixture comprising a basic iodonium compound
Grant 5,663,035 - Masuda , et al. September 2, 1 | 1997-09-02 |
Radiation sensitive composition
Grant 5,595,855 - Padmanaban , et al. January 21, 1 | 1997-01-21 |
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