loadpatents
name:-0.019424915313721
name:-0.019225835800171
name:-0.00043606758117676
Pack; Robert C. Patent Filings

Pack; Robert C.

Patent Applications and Registrations

Patent applications and USPTO patent grants for Pack; Robert C..The latest application filed is for "method and system for dimensional uniformity using charged particle beam lithography".

Company Profile
0.20.15
  • Pack; Robert C. - Morgan Hill CA
  • Pack; Robert C. - Foster City CA
*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.
Patent Activity
PatentDate
Method and system for dimensional uniformity using charged particle beam lithography
Grant 10,431,422 - Fujimura , et al. O
2019-10-01
Method, system and program product for identifying anomalies in integrated circuit design layouts
Grant 10,055,535 - Pathak , et al. August 21, 2
2018-08-21
Method And System For Dimensional Uniformity Using Charged Particle Beam Lithography
App 20180108513 - Fujimura; Akira ;   et al.
2018-04-19
Method, System And Program Product For Identifying Anomalies In Integrated Circuit Design Layouts
App 20180089357 - PATHAK; Piyush ;   et al.
2018-03-29
Method and system for dimensional uniformity using charged particle beam lithography
Grant 9,859,100 - Fujimura , et al. January 2, 2
2018-01-02
Method And System For Dimensional Uniformity Using Charged Particle Beam Lithography
App 20160260581 - Fujimura; Akira ;   et al.
2016-09-08
Method and system for dimensional uniformity using charged particle beam lithography
Grant 9,343,267 - Fujimura , et al. May 17, 2
2016-05-17
Method and system for critical dimension uniformity using charged particle beam lithography
Grant 9,038,003 - Pearman , et al. May 19, 2
2015-05-19
Method and system for dimensional uniformity using charged particle beam lithography
Grant 8,959,463 - Fujimura , et al. February 17, 2
2015-02-17
Method And System For Dimensional Uniformity Using Charged Particle Beam Lithography
App 20140359542 - Fujimura; Akira ;   et al.
2014-12-04
Method and system for forming high precision patterns using charged particle beam lithography
Grant 8,745,549 - Fujimura , et al. June 3, 2
2014-06-03
Method And System For Dimensional Uniformity Using Charged Particle Beam Lithography
App 20140129996 - Fujimura; Akira ;   et al.
2014-05-08
Method And System For Dimensional Uniformity Using Charged Particle Beam Lithography
App 20140129997 - Fujimura; Akira ;   et al.
2014-05-08
Method And System For Critical Dimension Uniformity Using Charged Particle Beam Lithography
App 20130283216 - Pearman; Ryan ;   et al.
2013-10-24
Method And System For Forming High Precision Patterns Using Charged Particle Beam Lithography
App 20130205264 - Fujimura; Akira ;   et al.
2013-08-08
Modeling and simulating the impact of imperfectly patterned via arrays on integrated circuits
Grant 8,468,482 - Pack , et al. June 18, 2
2013-06-18
Hierarchical variation analysis of integrated circuits
Grant 8,453,102 - Pack , et al. May 28, 2
2013-05-28
Method and system for context-specific mask inspection
Grant 8,407,627 - Pack , et al. March 26, 2
2013-03-26
Method and system for context-specific mask writing
Grant 7,784,016 - Pack , et al. August 24, 2
2010-08-24
Method and system for context-specific mask writing
Grant 7,302,672 - Pack , et al. November 27, 2
2007-11-27
Method and System for Context-Specific Mask Writing
App 20070266364 - Pack; Robert C. ;   et al.
2007-11-15
Method and System for Context-Specific Mask Inspection
App 20070233419 - Pack; Robert C. ;   et al.
2007-10-04
Method and system for context-specific mask writing
Grant 7,249,342 - Pack , et al. July 24, 2
2007-07-24
Method and system for context-specific mask inspection
Grant 7,231,628 - Pack , et al. June 12, 2
2007-06-12
Method for creating patterns for producing integrated circuits
Grant 7,024,638 - Scheffer , et al. April 4, 2
2006-04-04
Method and system for context-specific mask writing
App 20050216877 - Pack, Robert C. ;   et al.
2005-09-29
Method for creating patterns for producing integrated circuits
App 20050015739 - Scheffer, Louis K. ;   et al.
2005-01-20
Method and system for context-specific mask inspection
App 20040133369 - Pack, Robert C. ;   et al.
2004-07-08
Method and system for context-specific mask writing
App 20040107412 - Pack, Robert C. ;   et al.
2004-06-03
Integrated scheme for predicting yield of semiconductor (MOS) devices from designed layout
Grant 6,562,638 - Balasinski , et al. May 13, 2
2003-05-13

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