Patent | Date |
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Method and system for dimensional uniformity using charged particle beam lithography Grant 10,431,422 - Fujimura , et al. O | 2019-10-01 |
Method, system and program product for identifying anomalies in integrated circuit design layouts Grant 10,055,535 - Pathak , et al. August 21, 2 | 2018-08-21 |
Method And System For Dimensional Uniformity Using Charged Particle Beam Lithography App 20180108513 - Fujimura; Akira ;   et al. | 2018-04-19 |
Method, System And Program Product For Identifying Anomalies In Integrated Circuit Design Layouts App 20180089357 - PATHAK; Piyush ;   et al. | 2018-03-29 |
Method and system for dimensional uniformity using charged particle beam lithography Grant 9,859,100 - Fujimura , et al. January 2, 2 | 2018-01-02 |
Method And System For Dimensional Uniformity Using Charged Particle Beam Lithography App 20160260581 - Fujimura; Akira ;   et al. | 2016-09-08 |
Method and system for dimensional uniformity using charged particle beam lithography Grant 9,343,267 - Fujimura , et al. May 17, 2 | 2016-05-17 |
Method and system for critical dimension uniformity using charged particle beam lithography Grant 9,038,003 - Pearman , et al. May 19, 2 | 2015-05-19 |
Method and system for dimensional uniformity using charged particle beam lithography Grant 8,959,463 - Fujimura , et al. February 17, 2 | 2015-02-17 |
Method And System For Dimensional Uniformity Using Charged Particle Beam Lithography App 20140359542 - Fujimura; Akira ;   et al. | 2014-12-04 |
Method and system for forming high precision patterns using charged particle beam lithography Grant 8,745,549 - Fujimura , et al. June 3, 2 | 2014-06-03 |
Method And System For Dimensional Uniformity Using Charged Particle Beam Lithography App 20140129996 - Fujimura; Akira ;   et al. | 2014-05-08 |
Method And System For Dimensional Uniformity Using Charged Particle Beam Lithography App 20140129997 - Fujimura; Akira ;   et al. | 2014-05-08 |
Method And System For Critical Dimension Uniformity Using Charged Particle Beam Lithography App 20130283216 - Pearman; Ryan ;   et al. | 2013-10-24 |
Method And System For Forming High Precision Patterns Using Charged Particle Beam Lithography App 20130205264 - Fujimura; Akira ;   et al. | 2013-08-08 |
Modeling and simulating the impact of imperfectly patterned via arrays on integrated circuits Grant 8,468,482 - Pack , et al. June 18, 2 | 2013-06-18 |
Hierarchical variation analysis of integrated circuits Grant 8,453,102 - Pack , et al. May 28, 2 | 2013-05-28 |
Method and system for context-specific mask inspection Grant 8,407,627 - Pack , et al. March 26, 2 | 2013-03-26 |
Method and system for context-specific mask writing Grant 7,784,016 - Pack , et al. August 24, 2 | 2010-08-24 |
Method and system for context-specific mask writing Grant 7,302,672 - Pack , et al. November 27, 2 | 2007-11-27 |
Method and System for Context-Specific Mask Writing App 20070266364 - Pack; Robert C. ;   et al. | 2007-11-15 |
Method and System for Context-Specific Mask Inspection App 20070233419 - Pack; Robert C. ;   et al. | 2007-10-04 |
Method and system for context-specific mask writing Grant 7,249,342 - Pack , et al. July 24, 2 | 2007-07-24 |
Method and system for context-specific mask inspection Grant 7,231,628 - Pack , et al. June 12, 2 | 2007-06-12 |
Method for creating patterns for producing integrated circuits Grant 7,024,638 - Scheffer , et al. April 4, 2 | 2006-04-04 |
Method and system for context-specific mask writing App 20050216877 - Pack, Robert C. ;   et al. | 2005-09-29 |
Method for creating patterns for producing integrated circuits App 20050015739 - Scheffer, Louis K. ;   et al. | 2005-01-20 |
Method and system for context-specific mask inspection App 20040133369 - Pack, Robert C. ;   et al. | 2004-07-08 |
Method and system for context-specific mask writing App 20040107412 - Pack, Robert C. ;   et al. | 2004-06-03 |
Integrated scheme for predicting yield of semiconductor (MOS) devices from designed layout Grant 6,562,638 - Balasinski , et al. May 13, 2 | 2003-05-13 |