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Patent applications and USPTO patent grants for Ozasa; Ryuto.The latest application filed is for "dressing apparatus and dressing method for substrate rear surface polishing member".
Patent | Date |
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Dressing Apparatus And Dressing Method For Substrate Rear Surface Polishing Member App 20210308828 - Okamoto; Yoshiki ;   et al. | 2021-10-07 |
Dressing apparatus and dressing method for substrate rear surface polishing member Grant 11,059,145 - Okamoto , et al. July 13, 2 | 2021-07-13 |
Substrate processing apparatus, substrate processing method and storage medium Grant 10,840,079 - Takiguchi , et al. November 17, 2 | 2020-11-17 |
Dressing Apparatus And Dressing Method For Substrate Rear Surface Polishing Member App 20190047118 - Okamoto; Yoshiki ;   et al. | 2019-02-14 |
Substrate Processing Apparatus, Substrate Processing Method and Storage Medium App 20180151343 - TAKIGUCHI; Yasushi ;   et al. | 2018-05-31 |
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