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Patent applications and USPTO patent grants for Owczarz; Aleksander A..The latest application filed is for "polishing pad ironing system and methods for implementing the same".
Patent | Date |
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Oscillating chemical mechanical planarization apparatus Grant 6,902,466 - Saldana , et al. June 7, 2 | 2005-06-07 |
Polishing pad ironing system Grant 6,896,596 - Gotkis , et al. May 24, 2 | 2005-05-24 |
Active retaining ring support Grant 6,719,874 - Gotkis , et al. April 13, 2 | 2004-04-13 |
Polishing pad ironing system and methods for implementing the same App 20030194956 - Gotkis, Yehiel ;   et al. | 2003-10-16 |
Oscillating chemical mechanical planarization apparatus App 20030134582 - Saldana, Miguel A. ;   et al. | 2003-07-17 |
Subaperture chemical mechanical polishing system Grant 6,585,572 - Saldana , et al. July 1, 2 | 2003-07-01 |
Adjustable force applying air platen and spindle system, and methods for using the same App 20020142710 - Saldana, Miguel A. ;   et al. | 2002-10-03 |
Wafer carrier with groove for decoupling retainer ring from water Grant 6,386,962 - Gotkis , et al. May 14, 2 | 2002-05-14 |
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