Ouye; Alan

Patent Applications and Registrations

Patent applications and USPTO patent grants for Ouye; Alan.The latest application filed is for "high purity aluminum coating hard anodization".

Company Profile

0.13.15

Ouye; Alan - San Mateo CA US

*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.

Patent Activity

Patent	Date
Gas delivery apparatus and method for atomic layer deposition Grant 8,668,776 - Chen , et al. March 11, 2	2014-03-11
High Purity Aluminum Coating Hard Anodization App 20120103526 - Ouye; Alan ; et al.	2012-05-03
Method and apparatus for generating a precursor for a semiconductor processing system Grant 8,062,422 - Chen , et al. November 22, 2	2011-11-22
Gas Delivery Apparatus And Method For Atomic Layer Deposition App 20100247767 - CHEN; LING ; et al.	2010-09-30
Gas delivery apparatus for atomic layer deposition Grant 7,780,785 - Chen , et al. August 24, 2	2010-08-24
Gas delivery apparatus for atomic layer deposition Grant 7,780,788 - Chen , et al. August 24, 2	2010-08-24
Gas delivery apparatus for atomic layer deposition Grant 7,699,023 - Chen , et al. April 20, 2	2010-04-20
Chemical precursor ampoule for vapor deposition processes Grant 7,597,758 - Chen , et al. October 6, 2	2009-10-06
Apparatus and method for generating a chemical precursor Grant 7,588,736 - Chen , et al. September 15, 2	2009-09-15
Method And Apparatus For Generating A Precursor For A Semiconductor Processing System App 20090151633 - Chen; Ling ; et al.	2009-06-18
Method and apparatus for generating a precursor for a semiconductor processing system Grant 7,524,374 - Chen , et al. April 28, 2	2009-04-28
Chemical Precursor Ampoule For Vapor Deposition Processes App 20080216743 - CHEN; LING ; et al.	2008-09-11
Gas Delivery Apparatus For Atomic Layer Deposition App 20080041313 - CHEN; LING ; et al.	2008-02-21
Atomic Layer Deposition Process App 20080038463 - Chen; Ling ; et al.	2008-02-14
Method and apparatus of generating PDMAT precursor Grant 7,270,709 - Chen , et al. September 18, 2	2007-09-18
Integration Process Of Tungsten Atomic Layer Deposition For Metallization Application App 20070099415 - Chen; Ling ; et al.	2007-05-03
Method and apparatus for generating a precursor for a semiconductor processing system App 20070067609 - Chen; Ling ; et al.	2007-03-22
Apparatus And Method For Generating A Chemical Precursor App 20060257295 - Chen; Ling ; et al.	2006-11-16
Method and apparatus of generating PDMAT precursor App 20050189072 - Chen, Ling ; et al.	2005-09-01
Gas delivery apparatus and method for atomic layer deposition App 20050173068 - Chen, Ling ; et al.	2005-08-11
Gas delivery apparatus and method for atomic layer deposition Grant 6,916,398 - Chen , et al. July 12, 2	2005-07-12
Method and apparatus of generating PDMAT precursor Grant 6,905,541 - Chen , et al. June 14, 2	2005-06-14
Method and apparatus of generating PDMAT precursor App 20040014320 - Chen, Ling ; et al.	2004-01-22
Gas delivery apparatus for atomic layer deposition App 20030121608 - Chen, Ling ; et al.	2003-07-03
Integration of ALD tantalum nitride and alpha-phase tantalum for copper metallization application App 20030124262 - Chen, Ling ; et al.	2003-07-03
Gas delivery apparatus and method for atomic layer deposition App 20030079686 - Chen, Ling ; et al.	2003-05-01
Plasma density and etch rate enhancing semiconductor processing chamber Grant 6,228,208 - Lill , et al. May 8, 2	2001-05-08

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