loadpatents
name:-0.022787094116211
name:-0.015833854675293
name:-0.0072369575500488
Ouyang; Christine Y. Patent Filings

Ouyang; Christine Y.

Patent Applications and Registrations

Patent applications and USPTO patent grants for Ouyang; Christine Y..The latest application filed is for "method for removing resist layer, method of forming a pattern and method of manufacturing a package".

Company Profile
7.14.20
  • Ouyang; Christine Y. - Hsinchu TW
  • Ouyang; Christine Y - Hsinchu TW
  • Ouyang; Christine Y. - Santa Clara CA
  • Ouyang; Christine Y - Santa Clara CA
*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.
Patent Activity
PatentDate
Method For Removing Resist Layer, Method Of Forming A Pattern And Method Of Manufacturing A Package
App 20220229369 - Ouyang; Christine Y.
2022-07-21
Ultraviolet Radiation Activated Atomic Layer Deposition
App 20220199403 - OUYANG; Christine Y. ;   et al.
2022-06-23
Method for removing photoresistor layer, method of forming a pattern and method of manufacturing a package
Grant 11,307,500 - Ouyang April 19, 2
2022-04-19
Ultraviolet radiation activated atomic layer deposition
Grant 11,211,244 - Ouyang , et al. December 28, 2
2021-12-28
Structure and formation method of semiconductor device with metal gate stack
Grant 11,201,060 - Ouyang , et al. December 14, 2
2021-12-14
Selective deposition by laser heating for forming a semiconductor structure
Grant 11,087,984 - Ouyang August 10, 2
2021-08-10
Ultraviolet Radiation Activated Atomic Layer Deposition
App 20210225644 - OUYANG; Christine Y. ;   et al.
2021-07-22
Extreme Ultraviolet Photolithography Method with Infiltration for Enhanced Sensitivity and Etch Resistance
App 20210080832 - Ouyang; Christine Y
2021-03-18
Etch selectivity improved by laser beam
Grant 10,861,706 - Ouyang , et al. December 8, 2
2020-12-08
Extreme ultraviolet photolithography method with infiltration for enhanced sensitivity and etch resistance
Grant 10,845,704 - Ouyang November 24, 2
2020-11-24
Structure And Formation Method Of Semiconductor Device With Metal Gate Stack
App 20200335346 - OUYANG; Christine Y ;   et al.
2020-10-22
Extreme Ultraviolet Photolithography Method with Infiltration for Enhanced Sensitivity and Etch Resistance
App 20200133131 - Ouyang; Christine Y.
2020-04-30
Etch Selectivity Improved By Laser Beam
App 20200135483 - OUYANG; Christine Y. ;   et al.
2020-04-30
Method For Forming Pattern And Manufacturing Method Of Package
App 20200135496 - Ouyang; Christine Y
2020-04-30
Method For Removing Photoresistor Layer, Method Of Forming A Pattern And Method Of Manufacturing A Package
App 20200133132 - Ouyang; Christine Y
2020-04-30
Selective Deposition By Laser Heating
App 20200135465 - OUYANG; Christine Y
2020-04-30
Apparatus for field guided acid profile control in a photoresist layer
Grant 10,615,058 - Godet , et al.
2020-04-07
Selective Deposition Process Utilizing Polymer Structure Deactivation Process
App 20180366318 - OUYANG; Christine Y. ;   et al.
2018-12-20
Selective deposition process utilizing polymer structure deactivation process
Grant 10,157,740 - Ouyang , et al. Dec
2018-12-18
Field guided post exposure bake application for photoresist microbridge defects
Grant 10,048,589 - Godet , et al. August 14, 2
2018-08-14
Apparatus For Field Guided Acid Profile Control In A Photoresist Layer
App 20180190518 - GODET; Ludovic ;   et al.
2018-07-05
Methods And Apparatus For Selective Removal Of Self-assembled Monolayers Using Laser Annealing
App 20180171476 - GODET; Ludovic ;   et al.
2018-06-21
Resist sensitivity and profile improvement via acid anion control during field-guided post exposure bake
Grant 9,996,006 - Ouyang , et al. June 12, 2
2018-06-12
Resist Sensitivity And Profile Improvement Via Acid Anion Control During Field-guided Post Exposure Bake
App 20180107117 - OUYANG; Christine Y. ;   et al.
2018-04-19
Resist sensitivity and profile improvement via acid anion control during field-guided post exposure bake
Grant 9,927,709 - Ouyang , et al. March 27, 2
2018-03-27
Field Guided Post Exposure Bake Application For Photoresist Microbridge Defects
App 20180046085 - GODET; Ludovic ;   et al.
2018-02-15
Laser annealing and electric field
Grant 9,864,276 - Ouyang , et al. January 9, 2
2018-01-09
Immersion field guided exposure and post-exposure bake process
Grant 9,829,790 - Buchberger, Jr. , et al. November 28, 2
2017-11-28
Field guided post exposure bake application for photoresist microbridge defects
Grant 9,823,570 - Godet , et al. November 21, 2
2017-11-21
Rtp Process For Directed Self-aligned Patterns
App 20170221701 - HUNTER; Aaron Muir ;   et al.
2017-08-03
Resist Sensitivity And Profile Improvement Via Acid Anion Control During Field-guided Post Exposure Bake
App 20170184976 - OUYANG; Christine Y. ;   et al.
2017-06-29
Immersion Field Guided Exposure And Post-exposure Bake Process
App 20160357107 - BUCHBERGER, JR.; Douglas A. ;   et al.
2016-12-08
Laser Annealing And Electric Field
App 20160299435 - OUYANG; Christine Y. ;   et al.
2016-10-13
Field Guided Post Exposure Bake Application For Photoresist Microbridge Defects
App 20160291476 - GODET; Ludovic ;   et al.
2016-10-06

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