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Patent applications and USPTO patent grants for Ouattara; Tantiboro.The latest application filed is for "chemically homogeneous silicon hardmasks for lithography".
Patent | Date |
---|---|
Chemically Homogeneous Silicon Hardmasks For Lithography App 20220195238 - Chacko; Reuben T. ;   et al. | 2022-06-23 |
Assist layers for EUV lithography Grant 8,968,989 - Ouattara , et al. March 3, 2 | 2015-03-03 |
Fluorinated polyimides with fluorene cardo structure as optical materials that have low absolute thermo-optic coefficients Grant 8,668,992 - Hong , et al. March 11, 2 | 2014-03-11 |
Metal-oxide films from small molecules for lithographic applications Grant 8,647,809 - Sullivan , et al. February 11, 2 | 2014-02-11 |
Assist Layers For Euv Lithography App 20130129995 - Ouattara; Tantiboro ;   et al. | 2013-05-23 |
Metal-oxide Films From Small Molecules For Lithographic Applications App 20130011630 - Sullivan; Daniel M. ;   et al. | 2013-01-10 |
Fluorinated Polyimides With Fluorene Cardo Structure As Optical Materials That Have Low Absolute Thermo-optic Coefficients App 20120308835 - Hong; Wenbin ;   et al. | 2012-12-06 |
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