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Patent applications and USPTO patent grants for Ott; Andrew W..The latest application filed is for "selective deposition of a dielectric on a self-assembled monolayer-adsorbed metal".
Patent | Date |
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Selective deposition of a dielectric on a self-assembled monolayer-adsorbed metal Grant 7,790,631 - Sharma , et al. September 7, 2 | 2010-09-07 |
Selective deposition of a dielectric on a self-assembled monolayer-adsorbed metal App 20080116481 - Sharma; Ajay K. ;   et al. | 2008-05-22 |
Integrated low-k hard mask Grant 7,199,473 - King , et al. April 3, 2 | 2007-04-03 |
Forming a dielectric layer using a hydrocarbon-containing precursor App 20070032675 - Meagley; Robert P. ;   et al. | 2007-02-08 |
Forming a dielectric layer using porogens Grant 7,169,715 - Ott , et al. January 30, 2 | 2007-01-30 |
Forming a dielectric layer using a hydrocarbon-containing precursor Grant 7,138,158 - Meagley , et al. November 21, 2 | 2006-11-21 |
Enhancement of an interconnect Grant 7,135,775 - Chambers , et al. November 14, 2 | 2006-11-14 |
Integrated Low-k Hard Mask App 20060038296 - King; Sean W. ;   et al. | 2006-02-23 |
Integrated low-k hard mask Grant 6,974,772 - King , et al. December 13, 2 | 2005-12-13 |
Forming a dielectric layer using porogens App 20040185679 - Ott, Andrew W. ;   et al. | 2004-09-23 |
Forming a dielectric layer using a hydrocarbon-containing precursor App 20040170760 - Meagley, Robert P. ;   et al. | 2004-09-02 |
Method of making semiconductor devices using carbon nitride, a low-dielectric-constant hard mask and/or etch stop App 20040119163 - Wong, Lawrence ;   et al. | 2004-06-24 |
Adhesion between dielectric materials App 20040101667 - O'Loughlin, Jennifer ;   et al. | 2004-05-27 |
Adhesion between dielectric materials Grant 6,713,873 - O'Loughlin , et al. March 30, 2 | 2004-03-30 |
Enhancement of an interconnect App 20030137050 - Chambers, Stephen T. ;   et al. | 2003-07-24 |
Modified zeolite membrane Grant 6,051,517 - Funke , et al. April 18, 2 | 2000-04-18 |
Modification of zeolite or molecular sieve membranes using atomic layer controlled chemical vapor deposition Grant 6,043,177 - Falconer , et al. March 28, 2 | 2000-03-28 |
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