Otsuki; Hayashi

Patent Applications and Registrations

Patent applications and USPTO patent grants for Otsuki; Hayashi.The latest application filed is for "particle-measuring system and particle-measuring method".

Company Profile

0.22.26

Otsuki; Hayashi - Nakakoma-gun JP
Otsuki; Hayashi - Nirasaki JP
Otsuki; Hayashi - Naka-koma-gun JP
Otsuki; Hayashi - Nirasaki-Shi JP
OTSUKI; Hayashi - Nakagoma-gun JP
Otsuki; Hayashi - Kousai-Machi JP
Otsuki; Hayashi - Tokyo-To JP
Otsuki, Hayashi - Yamanashi-Ken JP
OTSUKI, HAYASHI - NAKAKOMA JP

*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.

Patent Activity

Patent	Date
Particle-measuring system and particle-measuring method Grant 8,100,147 - Otsuki , et al. January 24, 2	2012-01-24
Film forming method Grant 7,931,945 - Otsuki , et al. April 26, 2	2011-04-26
Film formation processing apparatus and method for determining an end-point of a cleaning process Grant 7,894,059 - Otsuki , et al. February 22, 2	2011-02-22
Processing apparatus with a chamber having therein a high-corrosion-resistant sprayed film Grant 7,879,179 - Otsuki February 1, 2	2011-02-01
Processing apparatus with a chamber having therein a high-corrosion-resistant sprayed film Grant 7,846,291 - Otsuki December 7, 2	2010-12-07
Method of forming a metal film for electrode Grant 7,829,144 - Matsuse , et al. November 9, 2	2010-11-09
Gas processing apparatus, gas processing method and integrated valve unit for gas processing apparatus Grant 7,828,016 - Otsuki , et al. November 9, 2	2010-11-09
Particle-measuring System And Particle-measuring Method App 20100139565 - OTSUKI; Hayashi ; et al.	2010-06-10
Particle-measuring system and particle-measuring method Grant 7,667,840 - Otsuki , et al. February 23, 2	2010-02-23
Particle-measuring system and particle-measuring method Grant 7,515,264 - Otsuki , et al. April 7, 2	2009-04-07
Particle-measuring system and particle-measuring method Grant 7,511,814 - Otsuki , et al. March 31, 2	2009-03-31
Method of forming titanium film by CVD App 20090071404 - Tada; Kunihiro ; et al.	2009-03-19
Method of forming titanium film by CVD Grant 7,484,513 - Tada , et al. February 3, 2	2009-02-03
Gas processing apparatus, gas processing method and integrated valve unit for gas processing apparatus App 20080282977 - Otsuki; Hayashi ; et al.	2008-11-20
Particle-measuring System And Particle-measuring Method App 20080264338 - OTSUKI; Hayashi ; et al.	2008-10-30
SiC material, semiconductor device fabricating system and SiC material forming method Grant 7,410,923 - Otsuki , et al. August 12, 2	2008-08-12
Processing apparatus with a chamber having therein a high-corrosion-resistant sprayed film App 20080070032 - Otsuki; Hayashi	2008-03-20
Particle-measuring System And Particle-measuring Method App 20080069671 - OTSUKI; Hayashi ; et al.	2008-03-20
Processing apparatus with a chamber having therein a high-corrosion-resistant sprayed film App 20080069966 - Otsuki; Hayashi	2008-03-20
Particle-measuring System And Particle-measuring Method App 20080065340 - OTSUKI; Hayashi ; et al.	2008-03-13
Particle-measuring System And Particle-measuring Method App 20070264444 - Otsuki; Hayashi ; et al.	2007-11-15
Particle-measuring System And Particle-measuring Method App 20070263217 - Otsuki; Hayashi ; et al.	2007-11-15
Particle-measuring System And Particle-measuring Method App 20070261740 - Otsuki; Hayashi ; et al.	2007-11-15
TiSiN film forming method, diffusion barrier TiSiN film, semiconductor device, method of fabricating the same and TiSiN film forming system Grant 7,153,773 - Otsuki , et al. December 26, 2	2006-12-26
Method for depositing metallic nitride series thin film App 20060231028 - Otsuki; Hayashi	2006-10-19
SiC material, semiconductor device fabricating system and SiC material forming method App 20060011131 - Otsuki; Hayashi ; et al.	2006-01-19
Method of forming a metal film for electrode App 20050191803 - Matsuse, Kimihiro ; et al.	2005-09-01
SiC material, semiconductor processing equipment and method of preparing SiC material therefor Grant 6,936,102 - Otsuki , et al. August 30, 2	2005-08-30
Method for forming TiSiN film, diffusion preventive film comprising TiSiN film, semiconductor device and its production method, and apparatus for forming TiSiN film Grant 6,919,273 - Otsuki , et al. July 19, 2	2005-07-19
Method of forming titanium film by CVD App 20050136660 - Tada, Kunihiro ; et al.	2005-06-23
Method for depositing metallic nitride series thin film App 20050089634 - Otsuki, Hayashi	2005-04-28
Gas processing apparatus, gas processing method and integrated valve unit for gas processing apparatus App 20050061377 - Otsuki, Hayashi ; et al.	2005-03-24
Method of forming a barrier film and method of forming wiring structure and electrodes of semiconductor device having a barrier film Grant 6,861,356 - Matsuse , et al. March 1, 2	2005-03-01
Method of forming titanium film by CVD Grant 6,841,203 - Tada , et al. January 11, 2	2005-01-11
Method of forming semiconductor wiring structures Grant 6,838,376 - Matsuse , et al. January 4, 2	2005-01-04
Method for depositing metallic nitride series thin film Grant 6,824,825 - Otsuki November 30, 2	2004-11-30
TiSiN film forming method, diffusion barrier TiSiN film, semiconductor device, method of fabricating the same and TiSiN film forming system App 20040232467 - Otsuki, Hayashi ; et al.	2004-11-25
Gas processing apparatus, gas processing method and integrated valve unit for gas processing apparatus Grant 6,817,381 - Otsuki , et al. November 16, 2	2004-11-16
Processing apparatus with a chamber having therein a high-corrosion-resistant sprayed film App 20030200929 - Otsuki, Hayashi	2003-10-30
Gas processing appauratus, gas processing method and integrated valve unit for gas processing apparatus App 20030192608 - Otsuki, Hayashi ; et al.	2003-10-16
Particle-measuring system and particle-measuring method App 20030147075 - Otsuki, Hayashi ; et al.	2003-08-07
Method for depositing metallic nitride series thin film App 20030129309 - Otsuki, Hayashi	2003-07-10
Particle-measuring system and particle-measuring method Grant 6,532,069 - Otsuki , et al. March 11, 2	2003-03-11
Wiring Structure Of Semiconductor Device, Electrode, And Method For Forming Them App 20030034560 - MATSUSE, KIMIHIRO ; et al.	2003-02-20
Method of forming titanium film by CVD App 20030031794 - Tada, Kunihiro ; et al.	2003-02-13
Method of forming a barrier film and method of forming wiring structure and electrodes of semiconductor device having a barrier film App 20020197856 - Matsuse, Kimihiro ; et al.	2002-12-26
Processing apparatus with a chamber having therein a high-corrosion-resistant sprayed film App 20010003271 - Otsuki, Hayashi	2001-06-14
Processing method and apparatus thereof Grant 5,474,641 - Otsuki , et al. December 12, 1	1995-12-12

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